GB1353366A - Integrated semiconductor read-only storage cell matrices - Google Patents
Integrated semiconductor read-only storage cell matricesInfo
- Publication number
- GB1353366A GB1353366A GB4055471A GB4055471A GB1353366A GB 1353366 A GB1353366 A GB 1353366A GB 4055471 A GB4055471 A GB 4055471A GB 4055471 A GB4055471 A GB 4055471A GB 1353366 A GB1353366 A GB 1353366A
- Authority
- GB
- United Kingdom
- Prior art keywords
- regions
- columns
- discrete
- mask
- areas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 210000000352 storage cell Anatomy 0.000 title abstract 3
- 239000011159 matrix material Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 2
- 238000012986 modification Methods 0.000 abstract 1
- 230000004048 modification Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
- H01L29/0638—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for preventing surface leakage due to surface inversion layer, e.g. with channel stopper
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B20/00—Read-only memory [ROM] devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Memories (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
1353366 Semi-conductor devices INTERNATIONAL BUSINESS MACHINES CORP 31 Aug 1971 [2 Sept 1970] 40554/71 Heading H1K Individual storage cells of a semi-conductor read-only memory matrix are in a P-type substrate formed at the intersections of N<SP>+</SP> columns D 1-3 and metallized rows M 1 , M 2 overlying an insulating layer of uniform thickness overlying the entire substrate. The columns D 1 -D 3 provide common drain regions for IGFETs constituting the storage cells of each column of the matrix, source regions being provided by discrete N<SP>+</SP> regions S 11 -S 23 between the columns D 1 -D 3 Discrete metallized areas G 11 -G 23 in lines between the rows M 1 , M 2 form the gates of the IGFETs. Personalization of the memory matrix is effected by design of the contact opening mask, only selected contact areas such as 21-25 being opened. In modifications the same effect is obtained by appropriate design of the gate metallisative mask (certain of the areas G 11 -G 23 being omitted) and/or the source region diffusive mask (selected of the discrete regions S 11 -S 23 being restricted to the area below the corresponding row M 1 , M 2 ).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19702043405 DE2043405A1 (en) | 1970-09-02 | 1970-09-02 | Semiconductor arrangement with monolithically integrated insulating layer field effect transistors |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1353366A true GB1353366A (en) | 1974-05-15 |
Family
ID=5781308
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB4055471A Expired GB1353366A (en) | 1970-09-02 | 1971-08-31 | Integrated semiconductor read-only storage cell matrices |
Country Status (8)
Country | Link |
---|---|
AU (1) | AU3180371A (en) |
BE (1) | BE770898A (en) |
CH (1) | CH534431A (en) |
DE (1) | DE2043405A1 (en) |
ES (1) | ES394706A1 (en) |
FR (1) | FR2105176B1 (en) |
GB (1) | GB1353366A (en) |
NL (1) | NL7112058A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2572851B1 (en) * | 1984-11-08 | 1987-07-31 | Matra Harris Semiconducteurs | PREDIFFUSED NETWORK WITH INTERCONNECTABLE BASE CELLS |
-
1970
- 1970-09-02 DE DE19702043405 patent/DE2043405A1/en active Pending
-
1971
- 1971-07-20 FR FR7127187A patent/FR2105176B1/fr not_active Expired
- 1971-07-29 AU AU31803/71A patent/AU3180371A/en not_active Expired
- 1971-08-03 BE BE770898A patent/BE770898A/en unknown
- 1971-08-31 GB GB4055471A patent/GB1353366A/en not_active Expired
- 1971-09-01 CH CH1286271A patent/CH534431A/en not_active IP Right Cessation
- 1971-09-01 NL NL7112058A patent/NL7112058A/xx unknown
- 1971-09-01 ES ES394706A patent/ES394706A1/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE2043405A1 (en) | 1972-03-16 |
FR2105176A1 (en) | 1972-04-28 |
BE770898A (en) | 1971-12-16 |
AU3180371A (en) | 1973-02-01 |
NL7112058A (en) | 1972-03-06 |
ES394706A1 (en) | 1975-11-01 |
FR2105176B1 (en) | 1974-10-31 |
CH534431A (en) | 1973-02-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed [section 19, patents act 1949] | ||
PCNP | Patent ceased through non-payment of renewal fee |