GB1332791A - Sputtering - Google Patents

Sputtering

Info

Publication number
GB1332791A
GB1332791A GB1332791DA GB1332791A GB 1332791 A GB1332791 A GB 1332791A GB 1332791D A GB1332791D A GB 1332791DA GB 1332791 A GB1332791 A GB 1332791A
Authority
GB
United Kingdom
Prior art keywords
electrodes
sputtering
substrates
centre
edges
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ELECTRICAL RESEARCH ASS
Original Assignee
ELECTRICAL RESEARCH ASS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ELECTRICAL RESEARCH ASS filed Critical ELECTRICAL RESEARCH ASS
Publication of GB1332791A publication Critical patent/GB1332791A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

1332791 RF Sputtering ELECTRICAL RESEARCH ASSOCIATION 19 April 1971 [6 March 1970] 10923/70 Heading C7F R. F. Sputtering electrodes are wider at the edges than at the centre or the spacing between the electrodes and the substrates is less at the edges than at the centre to give a uniform deposit. Either the electrodes or the substrate may be curved. A magnetic field may be applied. The substrates may be stationary during sputtering. Preferably a preliminary coating is sputtered using rectangular electrodes and flat substrates, the variation in thickness of coating measured and the results used to determine the degree of compensation required.
GB1332791D 1971-04-19 1971-04-19 Sputtering Expired GB1332791A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1092370 1971-04-19

Publications (1)

Publication Number Publication Date
GB1332791A true GB1332791A (en) 1973-10-03

Family

ID=9976803

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1332791D Expired GB1332791A (en) 1971-04-19 1971-04-19 Sputtering

Country Status (1)

Country Link
GB (1) GB1332791A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7282261B2 (en) 2003-02-13 2007-10-16 National University Of Singapore Method of enhancing the stability of electroactive polymers and redox active materials
CN108277464A (en) * 2018-02-05 2018-07-13 信利光电股份有限公司 A kind of coating apparatus, film plating process and the readable storage medium storing program for executing of curved surface cover board

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7282261B2 (en) 2003-02-13 2007-10-16 National University Of Singapore Method of enhancing the stability of electroactive polymers and redox active materials
SG135943A1 (en) * 2003-02-13 2007-10-29 Univ Singapore Method of enhancing the stability of electroactive polymers and redox active materials
CN108277464A (en) * 2018-02-05 2018-07-13 信利光电股份有限公司 A kind of coating apparatus, film plating process and the readable storage medium storing program for executing of curved surface cover board
CN108277464B (en) * 2018-02-05 2019-09-10 信利光电股份有限公司 A kind of coating apparatus, film plating process and the readable storage medium storing program for executing of curved surface cover board

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees