GB1318771A - Apparatus for and method of cleaning an article and coating the article by sputtering - Google Patents

Apparatus for and method of cleaning an article and coating the article by sputtering

Info

Publication number
GB1318771A
GB1318771A GB2673470A GB2673470A GB1318771A GB 1318771 A GB1318771 A GB 1318771A GB 2673470 A GB2673470 A GB 2673470A GB 2673470 A GB2673470 A GB 2673470A GB 1318771 A GB1318771 A GB 1318771A
Authority
GB
United Kingdom
Prior art keywords
blades
article
shroud
target
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2673470A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Warner Lambert Co LLC
Original Assignee
Warner Lambert Co LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Warner Lambert Co LLC filed Critical Warner Lambert Co LLC
Publication of GB1318771A publication Critical patent/GB1318771A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/36—Gas-filled discharge tubes for cleaning surfaces while plating with ions of materials introduced into the discharge, e.g. introduced by evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
GB2673470A 1969-06-03 1970-06-03 Apparatus for and method of cleaning an article and coating the article by sputtering Expired GB1318771A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US82990669A 1969-06-03 1969-06-03

Publications (1)

Publication Number Publication Date
GB1318771A true GB1318771A (en) 1973-05-31

Family

ID=25255867

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2673470A Expired GB1318771A (en) 1969-06-03 1970-06-03 Apparatus for and method of cleaning an article and coating the article by sputtering

Country Status (8)

Country Link
US (1) US3723276A (de)
JP (2) JPS5136236B1 (de)
CA (1) CA949021A (de)
DE (1) DE2027301C3 (de)
ES (1) ES380347A1 (de)
FR (1) FR2049889A5 (de)
GB (1) GB1318771A (de)
NL (1) NL169349C (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2154249A (en) * 1984-02-11 1985-09-04 Glyco Metall Werke Cathode sputtering

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4151059A (en) * 1977-12-27 1979-04-24 Coulter Stork U.S.A., Inc. Method and apparatus for sputtering multiple cylinders simultaneously
US4896813A (en) * 1989-04-03 1990-01-30 Toyo Kohan Co., Ltd. Method and apparatus for cold rolling clad sheet
US5961798A (en) * 1996-02-13 1999-10-05 Diamond Black Technologies, Inc. System and method for vacuum coating of articles having precise and reproducible positioning of articles

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2154249A (en) * 1984-02-11 1985-09-04 Glyco Metall Werke Cathode sputtering

Also Published As

Publication number Publication date
NL169349B (nl) 1982-02-01
DE2027301B2 (de) 1980-09-11
NL7008076A (de) 1970-12-07
DE2027301C3 (de) 1981-05-27
DE2027301A1 (de) 1970-12-10
JPS5136236B1 (de) 1976-10-07
ES380347A1 (es) 1973-04-16
JPS5313591B1 (de) 1978-05-11
NL169349C (nl) 1982-07-01
FR2049889A5 (de) 1971-03-26
US3723276A (en) 1973-03-27
CA949021A (en) 1974-06-11

Similar Documents

Publication Publication Date Title
US3931789A (en) Vapor deposition apparatus
AU567918B2 (en) Magnetron cathode sputtering
CA998888A (en) Process and apparatus for depositing pyrolytic carbon coatings
GB2028380B (en) Method and apparatus for regulating the evaporation rate in reactive vacuum deposition processes
GB1318771A (en) Apparatus for and method of cleaning an article and coating the article by sputtering
GB1240700A (en) Apparatus for the coating of objects
EP0291113A3 (en) Process for preparing metallizable polyolefin films
US4290877A (en) Sputtering apparatus for coating elongated tubes and strips
CA994709A (en) Apparatus for the sputtering deposition of thin films with labyrinth heat exchanger
CA1022279A (en) Process and apparatus for controlling metal thickness, and deposition and degradation rates
US3625180A (en) Evaporation sources
US3894926A (en) In-out transporter for an enclosed chamber
GB1428702A (en) System for vapour deposition of thin films
JPS54127877A (en) Preparation of thin film
US3039952A (en) Apparatus for depositing films on article surfaces
GB988592A (en) Rotary compartmented treating unit
FR2230167A5 (en) Metal-coated glass - e.g. dichroic windows, using molecular-bonded metal layer
JPS5435176A (en) Depositing method by vacuum evaporation
GB1440500A (en) Rotary barrel diffusion coating in molten lead
GB1448518A (en) Continuous ly metallising films
GB592655A (en) Improvements in apparatus for coating articles
Vigdorovich et al. The Thermal Width of the Forbidden Band in Thin Tellurium Films
JPS5881970A (ja) スパツタ装置
JPS6210267A (ja) イオンプレーティング装置
JPS537584A (en) Sputtering apparatus

Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee