GB1315298A - Growing crystals on a substrate - Google Patents

Growing crystals on a substrate

Info

Publication number
GB1315298A
GB1315298A GB2403371*A GB2403371A GB1315298A GB 1315298 A GB1315298 A GB 1315298A GB 2403371 A GB2403371 A GB 2403371A GB 1315298 A GB1315298 A GB 1315298A
Authority
GB
United Kingdom
Prior art keywords
substrate
melt
crucible
plate
growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2403371*A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of GB1315298A publication Critical patent/GB1315298A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00Liquid-phase epitaxial-layer growth
    • C30B19/06Reaction chambers; Boats for supporting the melt; Substrate holders
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00Liquid-phase epitaxial-layer growth
    • C30B19/06Reaction chambers; Boats for supporting the melt; Substrate holders
    • C30B19/061Tipping system, e.g. by rotation
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00Liquid-phase epitaxial-layer growth
    • C30B19/08Heating of the reaction chamber or the substrate
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B19/00Liquid-phase epitaxial-layer growth
    • C30B19/10Controlling or regulating
    • C30B19/106Controlling or regulating adding crystallising material or reactants forming it in situ to the liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

1315298 Crystallizing from a melt WESTERN ELECTRIC CO Inc 19 April 1971 [16 March 1970] 24033/71 Headings B1G and B1S In order to improve crystal growth, e.g. of an epitaxial layer of Ga P from a solution in a mixture of Ga, Ga 2 O 3 and Zn, on the surface 73 of a substrate 64, the substrate is shielded from impurities, by a cover plate 72, which is held down over it, while the melt is being heated and only raised at the crystal growing temperature. During crystal growth a heat sink 79, through which cooling gas may be passed, maintains a vertical temperature gradient in crucible 61, having horizontal isotherms, so that a uniform crystal layer is produced. When the desired thickness has been reached growth may be stopped by returning the plate 72 on tilting the furnace 74, thereby tipping the melt off the substrate. Confining the substrate in a closely fitting recess (62) out of contact with the melt, is stated to limit thermal degradation (by volatilization of an element) to one monolayer of the surface 73. This effect may be enhanced by making plate 72 of the same material as the substrate, whereby it also serves to maintain saturation of the melt. Alternatively, it may be made of an inert material, which may be the same as that from which the crucible 61 is made, e.g. pure graphite, alumina, quartz, boronitride or an inert ceramic material.
GB2403371*A 1970-03-16 1971-04-19 Growing crystals on a substrate Expired GB1315298A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US1992970A 1970-03-16 1970-03-16

Publications (1)

Publication Number Publication Date
GB1315298A true GB1315298A (en) 1973-05-02

Family

ID=21795814

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2403371*A Expired GB1315298A (en) 1970-03-16 1971-04-19 Growing crystals on a substrate

Country Status (8)

Country Link
US (1) US3648654A (en)
JP (1) JPS528796B1 (en)
BE (1) BE764314A (en)
DE (1) DE2111946C3 (en)
FR (1) FR2084643A5 (en)
GB (1) GB1315298A (en)
NL (1) NL144496B (en)
SE (1) SE377054B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3036317A1 (en) * 1980-09-26 1982-05-19 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Liquid phase epitaxy appts. for mfg. semiconductor devices - where molten phase flows from cup shaped vessel into cell contg. substrates
JPS58148426A (en) * 1982-03-01 1983-09-03 Semiconductor Res Found Growth device
JP2001160540A (en) * 1999-09-22 2001-06-12 Canon Inc Producing device for semiconductor device, liquid phase growing method, liquid phase growing device and solar battery
JP4827107B2 (en) * 2006-03-24 2011-11-30 日本碍子株式会社 Method for producing nitride single crystal

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1422545A (en) * 1920-06-01 1922-07-11 Ernest L Dayton Coating apparatus
US3206322A (en) * 1960-10-31 1965-09-14 Morgan John Robert Vacuum deposition means and methods for manufacture of electronic components
BE624740A (en) * 1961-11-15
DE1287047B (en) * 1965-02-18 1969-01-16 Siemens Ag Method and device for depositing a monocrystalline semiconductor layer
US3491720A (en) * 1965-07-29 1970-01-27 Monsanto Co Epitaxial deposition reactor
US3382843A (en) * 1965-10-23 1968-05-14 Optical Coating Laboratory Inc Vacuum coating apparatus utilizing rotating sources
US3524426A (en) * 1968-02-29 1970-08-18 Libbey Owens Ford Glass Co Apparatus for coating by thermal evaporation
US3551219A (en) * 1968-05-09 1970-12-29 Bell Telephone Labor Inc Epitaxial growth technique
US3560276A (en) * 1968-12-23 1971-02-02 Bell Telephone Labor Inc Technique for fabrication of multilayered semiconductor structure
US3565702A (en) * 1969-02-14 1971-02-23 Rca Corp Depositing successive epitaxial semiconductive layers from the liquid phase

Also Published As

Publication number Publication date
SE377054B (en) 1975-06-23
DE2111946C3 (en) 1974-03-07
NL144496B (en) 1975-01-15
DE2111946A1 (en) 1971-09-30
US3648654A (en) 1972-03-14
NL7103418A (en) 1971-09-20
JPS528796B1 (en) 1977-03-11
DE2111946B2 (en) 1973-08-02
BE764314A (en) 1971-09-16
FR2084643A5 (en) 1971-12-17

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee