GB1300410A - Electrodeposition of copper foil - Google Patents
Electrodeposition of copper foilInfo
- Publication number
- GB1300410A GB1300410A GB4120069A GB4120069A GB1300410A GB 1300410 A GB1300410 A GB 1300410A GB 4120069 A GB4120069 A GB 4120069A GB 4120069 A GB4120069 A GB 4120069A GB 1300410 A GB1300410 A GB 1300410A
- Authority
- GB
- United Kingdom
- Prior art keywords
- polyoxyethylene
- cuso
- copper foil
- foil
- amps
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
Abstract
1300410 Electro-deposition of copper foil BRITISH NON-FERROUS METALS RESEARCH ASSOCIATION 18 Aug.1970 [18 Aug 1969] 41209/69 Heading C7B Copper foil is electro-deposited from an electrolyte comprising an aqueous solution of CuSO 4 together with a non-ionic surface-active agent selected from polyoxyalkylene glycols and their terminal derivatives. Thereby pinhole-free foil as thin as one thousandth of an inch can be produced. The foil is deposited on, and then removed from an inert cathode which may have a matt or polished surface. Specified agents based on polyoxyethylene glycol are polyoxyethylene (50) tributyl phenol ether, polyethylene glycol 1000 laurate, polyoxyethylene (10) lanolate, polyglycol 600 distearate and polyoxyethylene (6) coconut alkylotamide. Alternatively, agents based on polyoxypropylene glycol can be used. Specified baths to which the surface-active agent can be added and the electrolysis conditions are:- (a) an aqueous bath containing 120-200 g/l CuSO 4 SH 2 O at 50-60‹C with an impure Cu anode and a current density of 15-20 amps/ sq ft giving a cell voltage of 0À25v and (b) an aqueous bath containing 30-60 g/l CuSO 4 5H 2 O at 50‹C with an inert anode and a current density of 15-20 amps/sq ft giving a cell voltage of 2À5 V.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB4120969 | 1969-08-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1300410A true GB1300410A (en) | 1972-12-20 |
Family
ID=10418624
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB4120069A Expired GB1300410A (en) | 1969-08-18 | 1969-08-18 | Electrodeposition of copper foil |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1300410A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI683930B (en) * | 2014-10-04 | 2020-02-01 | 日商三菱綜合材料股份有限公司 | High purity copper electrolytic refining additive and high purity copper manufacturing method |
-
1969
- 1969-08-18 GB GB4120069A patent/GB1300410A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI683930B (en) * | 2014-10-04 | 2020-02-01 | 日商三菱綜合材料股份有限公司 | High purity copper electrolytic refining additive and high purity copper manufacturing method |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |