GB1290502A - - Google Patents

Info

Publication number
GB1290502A
GB1290502A GB1290502DA GB1290502A GB 1290502 A GB1290502 A GB 1290502A GB 1290502D A GB1290502D A GB 1290502DA GB 1290502 A GB1290502 A GB 1290502A
Authority
GB
United Kingdom
Prior art keywords
oct
carrier
switch contacts
contacts
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1290502A publication Critical patent/GB1290502A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01HELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00Contacts
    • H01H1/02Contacts characterised by the material thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/33Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332Coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacture Of Switches (AREA)
  • Contacts (AREA)
  • Conductive Materials (AREA)
GB1290502D 1968-10-14 1969-10-14 Expired GB1290502A (US07860544-20101228-C00003.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1802932A DE1802932B2 (de) 1968-10-14 1968-10-14 Verfahren zur Herstellung eines elektrischen Schaltkontaktes

Publications (1)

Publication Number Publication Date
GB1290502A true GB1290502A (US07860544-20101228-C00003.png) 1972-09-27

Family

ID=5710475

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1290502D Expired GB1290502A (US07860544-20101228-C00003.png) 1968-10-14 1969-10-14

Country Status (5)

Country Link
US (1) US3630872A (US07860544-20101228-C00003.png)
JP (1) JPS4813789B1 (US07860544-20101228-C00003.png)
DE (1) DE1802932B2 (US07860544-20101228-C00003.png)
FR (1) FR2020681B1 (US07860544-20101228-C00003.png)
GB (1) GB1290502A (US07860544-20101228-C00003.png)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2130795A (en) * 1982-11-17 1984-06-06 Standard Telephones Cables Ltd Electrical contacts
GB2190399A (en) * 1986-05-02 1987-11-18 Nat Res Dev Multi-metal electrode

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4013539A (en) * 1973-01-12 1977-03-22 Coulter Information Systems, Inc. Thin film deposition apparatus
US3884787A (en) * 1973-01-12 1975-05-20 Coulter Information Systems Sputtering method for thin film deposition on a substrate
JPS5915449B2 (ja) * 1975-03-24 1984-04-10 イグロ カツジ 屋内電気配線のユニツト化工法
DE3011694C2 (de) * 1980-03-26 1986-01-16 Mengelberg, Hans, Dr., 8000 München Verfahren zur Beschichtung von Verschleißflächen, z.B. Kontaktflächen für die Schwachstromtechnik
DE3203037C2 (de) * 1982-01-29 1984-03-08 Siemens AG, 1000 Berlin und 8000 München Kontaktelement und Verfahren zu dessen Herstellung
FR2529022A1 (fr) * 1982-06-22 1983-12-23 Doloise Metallurgique Procede de fabrication d'un organe de contact electrique, contact et connecteur electriques obtenus par ce procede et dispositif pour la mise en oeuvre de ce procede
US4774151A (en) * 1986-05-23 1988-09-27 International Business Machines Corporation Low contact electrical resistant composition, substrates coated therewith, and process for preparing such
US4849079A (en) * 1986-05-23 1989-07-18 International Business Machines Corp. Process for preparing low electrical contact resistance composition
DE3708158C2 (de) * 1987-03-13 1997-02-06 Aeg Vakuumschalttechnik Gmbh Schaltkontakt für einen Vakuumschalter und Verfahren zur Herstellung eines derartigen Schaltkontakts
DE3813142A1 (de) * 1988-04-20 1989-11-09 Duerrwaechter E Dr Doduco Bandfoermiges oder plattenfoermiges halbzeug fuer elektrische kontakte
US4911810A (en) * 1988-06-21 1990-03-27 Brown University Modular sputtering apparatus
RU2546650C2 (ru) * 2013-05-31 2015-04-10 Открытое акционерное общество "Рязанский завод металлокерамических приборов" (ОАО РЗМКП) Магнитоуправляемый герметизированный контакт
KR101786675B1 (ko) * 2015-12-08 2017-10-18 현대자동차 주식회사 전기 접점 코팅용 조성물, 및 이를 이용한 전기 접점 코팅 방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2130795A (en) * 1982-11-17 1984-06-06 Standard Telephones Cables Ltd Electrical contacts
GB2190399A (en) * 1986-05-02 1987-11-18 Nat Res Dev Multi-metal electrode

Also Published As

Publication number Publication date
JPS4813789B1 (US07860544-20101228-C00003.png) 1973-04-28
FR2020681A1 (US07860544-20101228-C00003.png) 1970-07-17
FR2020681B1 (US07860544-20101228-C00003.png) 1973-03-16
DE1802932B2 (de) 1974-11-14
US3630872A (en) 1971-12-28
DE1802932A1 (de) 1970-05-27

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees