JPS4813789B1 - - Google Patents

Info

Publication number
JPS4813789B1
JPS4813789B1 JP44065393A JP6539369A JPS4813789B1 JP S4813789 B1 JPS4813789 B1 JP S4813789B1 JP 44065393 A JP44065393 A JP 44065393A JP 6539369 A JP6539369 A JP 6539369A JP S4813789 B1 JPS4813789 B1 JP S4813789B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP44065393A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4813789B1 publication Critical patent/JPS4813789B1/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00—Contacts
    • H01H1/02—Contacts characterised by the material thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Manufacture Of Switches (AREA)
  • Contacts (AREA)
  • Conductive Materials (AREA)
JP44065393A 1968-10-14 1969-08-20 Pending JPS4813789B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1802932A DE1802932B2 (de) 1968-10-14 1968-10-14 Verfahren zur Herstellung eines elektrischen Schaltkontaktes

Publications (1)

Publication Number Publication Date
JPS4813789B1 true JPS4813789B1 (ja) 1973-04-28

Family

ID=5710475

Family Applications (1)

Application Number Title Priority Date Filing Date
JP44065393A Pending JPS4813789B1 (ja) 1968-10-14 1969-08-20

Country Status (5)

Country Link
US (1) US3630872A (ja)
JP (1) JPS4813789B1 (ja)
DE (1) DE1802932B2 (ja)
FR (1) FR2020681B1 (ja)
GB (1) GB1290502A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5915449B2 (ja) * 1975-03-24 1984-04-10 イグロ カツジ 屋内電気配線のユニツト化工法

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4013539A (en) * 1973-01-12 1977-03-22 Coulter Information Systems, Inc. Thin film deposition apparatus
US3884787A (en) * 1973-01-12 1975-05-20 Coulter Information Systems Sputtering method for thin film deposition on a substrate
DE3011694C2 (de) * 1980-03-26 1986-01-16 Mengelberg, Hans, Dr., 8000 München Verfahren zur Beschichtung von Verschleißflächen, z.B. Kontaktflächen für die Schwachstromtechnik
DE3203037C2 (de) * 1982-01-29 1984-03-08 Siemens AG, 1000 Berlin und 8000 München Kontaktelement und Verfahren zu dessen Herstellung
FR2529022A1 (fr) * 1982-06-22 1983-12-23 Doloise Metallurgique Procede de fabrication d'un organe de contact electrique, contact et connecteur electriques obtenus par ce procede et dispositif pour la mise en oeuvre de ce procede
GB2130795B (en) * 1982-11-17 1986-07-16 Standard Telephones Cables Ltd Electrical contacts
GB2190399A (en) * 1986-05-02 1987-11-18 Nat Res Dev Multi-metal electrode
US4849079A (en) * 1986-05-23 1989-07-18 International Business Machines Corp. Process for preparing low electrical contact resistance composition
US4774151A (en) * 1986-05-23 1988-09-27 International Business Machines Corporation Low contact electrical resistant composition, substrates coated therewith, and process for preparing such
DE3708158C2 (de) * 1987-03-13 1997-02-06 Aeg Vakuumschalttechnik Gmbh Schaltkontakt für einen Vakuumschalter und Verfahren zur Herstellung eines derartigen Schaltkontakts
DE3813142A1 (de) * 1988-04-20 1989-11-09 Duerrwaechter E Dr Doduco Bandfoermiges oder plattenfoermiges halbzeug fuer elektrische kontakte
US4911810A (en) * 1988-06-21 1990-03-27 Brown University Modular sputtering apparatus
RU2546650C2 (ru) * 2013-05-31 2015-04-10 Открытое акционерное общество "Рязанский завод металлокерамических приборов" (ОАО РЗМКП) Магнитоуправляемый герметизированный контакт
KR101786675B1 (ko) * 2015-12-08 2017-10-18 현대자동차 주식회사 전기 접점 코팅용 조성물, 및 이를 이용한 전기 접점 코팅 방법

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5915449B2 (ja) * 1975-03-24 1984-04-10 イグロ カツジ 屋内電気配線のユニツト化工法

Also Published As

Publication number Publication date
US3630872A (en) 1971-12-28
DE1802932A1 (de) 1970-05-27
FR2020681A1 (ja) 1970-07-17
FR2020681B1 (ja) 1973-03-16
GB1290502A (ja) 1972-09-27
DE1802932B2 (de) 1974-11-14

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