GB1285422A - Improvements in or relating to a mask for photoengraving - Google Patents

Improvements in or relating to a mask for photoengraving

Info

Publication number
GB1285422A
GB1285422A GB20362/71A GB2036271A GB1285422A GB 1285422 A GB1285422 A GB 1285422A GB 20362/71 A GB20362/71 A GB 20362/71A GB 2036271 A GB2036271 A GB 2036271A GB 1285422 A GB1285422 A GB 1285422A
Authority
GB
United Kingdom
Prior art keywords
mask
aluminium
photo
photoengraving
relating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB20362/71A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of GB1285422A publication Critical patent/GB1285422A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/46—Antireflective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
GB20362/71A 1970-02-02 1971-04-19 Improvements in or relating to a mask for photoengraving Expired GB1285422A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP850070A JPS4939863B1 (cg-RX-API-DMAC7.html) 1970-02-02 1970-02-02

Publications (1)

Publication Number Publication Date
GB1285422A true GB1285422A (en) 1972-08-16

Family

ID=11694822

Family Applications (1)

Application Number Title Priority Date Filing Date
GB20362/71A Expired GB1285422A (en) 1970-02-02 1971-04-19 Improvements in or relating to a mask for photoengraving

Country Status (3)

Country Link
US (1) US3720143A (cg-RX-API-DMAC7.html)
JP (1) JPS4939863B1 (cg-RX-API-DMAC7.html)
GB (1) GB1285422A (cg-RX-API-DMAC7.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3999301A (en) * 1975-07-24 1976-12-28 The United States Of America As Represented By The Secretary Of The Navy Reticle-lens system
EP0660183A3 (en) * 1993-12-09 1997-01-02 Ryoden Semiconductor Syst Eng Mask for transferring a pattern onto a semiconductor component and its manufacturing process.

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5319208B2 (cg-RX-API-DMAC7.html) * 1972-11-27 1978-06-20
US3873203A (en) * 1973-03-19 1975-03-25 Motorola Inc Durable high resolution silicon template
US4173075A (en) * 1976-12-08 1979-11-06 Swiss Aluminium Ltd. Engraver's template
US4139386A (en) * 1976-12-08 1979-02-13 Swiss Aluminium Ltd. Method for obtaining engravers template
US4218503A (en) * 1977-12-02 1980-08-19 Rockwell International Corporation X-ray lithographic mask using rare earth and transition element compounds and method of fabrication thereof
JPS5593225A (en) * 1979-01-10 1980-07-15 Hitachi Ltd Forming method of minute pattern
US4260675A (en) * 1979-05-10 1981-04-07 Sullivan Donald F Photoprinting plate and method of preparing printed circuit board solder masks therewith
US4529685A (en) * 1984-03-02 1985-07-16 Advanced Micro Devices, Inc. Method for making integrated circuit devices using a layer of indium arsenide as an antireflective coating
US4964146A (en) * 1985-07-31 1990-10-16 Hitachi, Ltd. Pattern transistor mask and method of using the same
US5958628A (en) * 1995-06-06 1999-09-28 International Business Machines Corporation Formation of punch inspection masks and other devices using a laser
US6207330B1 (en) 1997-07-14 2001-03-27 International Business Machines Corporation Formation of punch inspection masks and other devices using a laser
US6342145B1 (en) 1999-07-14 2002-01-29 Nielsen & Bainbridge Llc Process for manufacturing multi-colored picture frames

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3322653A (en) * 1958-03-17 1967-05-30 Rca Corp Method of making a two sided storage electrode
US3148099A (en) * 1961-07-03 1964-09-08 Graphtex Inc Method of making aluminum foil nameplate
US3222175A (en) * 1961-11-29 1965-12-07 Eastman Kodak Co Process for forming metallic nonsilver images
US3622319A (en) * 1966-10-20 1971-11-23 Western Electric Co Nonreflecting photomasks and methods of making same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3999301A (en) * 1975-07-24 1976-12-28 The United States Of America As Represented By The Secretary Of The Navy Reticle-lens system
EP0660183A3 (en) * 1993-12-09 1997-01-02 Ryoden Semiconductor Syst Eng Mask for transferring a pattern onto a semiconductor component and its manufacturing process.
US5702849A (en) * 1993-12-09 1997-12-30 Mitsubishi Denki Kabushiki Kaisha Mask for transferring a pattern for use in a semiconductor device and method of manufacturing the same

Also Published As

Publication number Publication date
US3720143A (en) 1973-03-13
JPS4939863B1 (cg-RX-API-DMAC7.html) 1974-10-29

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee