GB1274017A - Presensitised lithographic printing plates - Google Patents

Presensitised lithographic printing plates

Info

Publication number
GB1274017A
GB1274017A GB2614869A GB2614869A GB1274017A GB 1274017 A GB1274017 A GB 1274017A GB 2614869 A GB2614869 A GB 2614869A GB 2614869 A GB2614869 A GB 2614869A GB 1274017 A GB1274017 A GB 1274017A
Authority
GB
United Kingdom
Prior art keywords
dichloropropane
prepared
dissolved
polymer
chloride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB2614869A
Other languages
English (en)
Inventor
James Frank Houle
Gilden Ramon Vannorman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of GB1274017A publication Critical patent/GB1274017A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
GB2614869A 1968-05-22 1969-05-22 Presensitised lithographic printing plates Expired GB1274017A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73118168A 1968-05-22 1968-05-22

Publications (1)

Publication Number Publication Date
GB1274017A true GB1274017A (en) 1972-05-10

Family

ID=24938412

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2614869A Expired GB1274017A (en) 1968-05-22 1969-05-22 Presensitised lithographic printing plates

Country Status (8)

Country Link
JP (1) JPS507481B1 (de)
BE (1) BE733491A (de)
CH (1) CH501946A (de)
DE (1) DE1925938C3 (de)
FR (1) FR2009091B1 (de)
GB (1) GB1274017A (de)
NL (1) NL6907737A (de)
ZA (1) ZA6903590B (de)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4588669A (en) * 1983-05-12 1986-05-13 Fuji Chemicals Industrial Co., Ltd. Photosensitive lithographic plate with diazo resin underlayer and polyvinyl acetal resin with azide in side chain overlayer
US4608331A (en) * 1984-11-16 1986-08-26 Witco Chemical Corporation Photosensitive plates with diazonium composition layer and polyurethane photopolymer with unsaturation in side chain overlayer
US4687727A (en) * 1982-09-21 1987-08-18 Fuji Photo Film Co., Ltd. Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition
US5275907A (en) * 1992-07-23 1994-01-04 Eastman Kodak Company Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding
EP1155820A2 (de) * 2000-05-17 2001-11-21 Fuji Photo Film Co., Ltd. Flachdruckplatte
US6596456B2 (en) 2001-05-29 2003-07-22 Kodak Polychrome Graphics Llc Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
CN106814540A (zh) * 2015-11-30 2017-06-09 乐凯华光印刷科技有限公司 水洗凸版用感光组合物、含有该水洗凸版用感光组合物的水洗凸版及水洗凸版的制备方法
US9780518B2 (en) 2012-04-18 2017-10-03 Cynosure, Inc. Picosecond laser apparatus and methods for treating target tissues with same
US10245107B2 (en) 2013-03-15 2019-04-02 Cynosure, Inc. Picosecond optical radiation systems and methods of use
US10434324B2 (en) 2005-04-22 2019-10-08 Cynosure, Llc Methods and systems for laser treatment using non-uniform output beam
US10849687B2 (en) 2006-08-02 2020-12-01 Cynosure, Llc Picosecond laser apparatus and methods for its operation and use
US11418000B2 (en) 2018-02-26 2022-08-16 Cynosure, Llc Q-switched cavity dumped sub-nanosecond laser

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4104072A (en) * 1977-05-19 1978-08-01 Polychrome Corporation Water developable lithographic printing plate having dual photosensitive layering
FR2400221A1 (fr) * 1977-08-09 1979-03-09 Kodak Pathe Compose de diazonium photosensible utile, en particulier, pour preparer des planches d'impression lithographique, procede de preparation de ce compose et plaque presensibilisee avec ce compose
JP4152559B2 (ja) 2000-03-06 2008-09-17 富士フイルム株式会社 ネガ型感光性平版印刷版
DE10233631B4 (de) * 2002-07-24 2004-09-30 Kodak Polychrome Graphics Gmbh Lithographie-Druckplattenvorläufer mit zwei strahlungsempfindlichen Schichten
JP4291638B2 (ja) 2003-07-29 2009-07-08 富士フイルム株式会社 アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版
JP4429116B2 (ja) 2004-08-27 2010-03-10 富士フイルム株式会社 平版印刷版原版及び平版印刷版の製版方法
EP1701213A3 (de) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Lichtempfindliche Zusammensetzung
JP4574506B2 (ja) 2005-03-23 2010-11-04 富士フイルム株式会社 平版印刷版原版、及びその製版方法
JP4368323B2 (ja) 2005-03-25 2009-11-18 富士フイルム株式会社 感光性平版印刷版
JP4457034B2 (ja) 2005-03-28 2010-04-28 富士フイルム株式会社 感光性平版印刷版
JP4524235B2 (ja) 2005-03-29 2010-08-11 富士フイルム株式会社 平版印刷版原版
JP4701042B2 (ja) 2005-08-22 2011-06-15 富士フイルム株式会社 感光性平版印刷版
JP4777226B2 (ja) 2006-12-07 2011-09-21 富士フイルム株式会社 画像記録材料、及び新規化合物
JP4860525B2 (ja) 2007-03-27 2012-01-25 富士フイルム株式会社 硬化性組成物及び平版印刷版原版
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
JP2009086373A (ja) 2007-09-28 2009-04-23 Fujifilm Corp ネガ型平版印刷版の現像方法
JP4890408B2 (ja) 2007-09-28 2012-03-07 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法
EP2204698B1 (de) 2009-01-06 2018-08-08 FUJIFILM Corporation Plattenoberflächenbehandlungsmittel für eine lithografische Druckplatte und Verfahren zur Behandlung der lithografischen Druckplatte
JP5714544B2 (ja) 2011-09-15 2015-05-07 富士フイルム株式会社 製版処理廃液のリサイクル方法
WO2013065853A1 (ja) 2011-11-04 2013-05-10 富士フイルム株式会社 製版処理廃液のリサイクル方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1205386B (de) * 1955-10-03 1965-11-18 Du Pont Photopolymerisierbare Schicht zur Herstellung von Reliefbildern oder Druckformen
BE563723A (de) * 1957-01-04
US3342601A (en) * 1964-02-27 1967-09-19 Eastman Kodak Co Lithographic printing plate
NL6610053A (de) * 1966-07-15 1968-01-16

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4687727A (en) * 1982-09-21 1987-08-18 Fuji Photo Film Co., Ltd. Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition
US4588669A (en) * 1983-05-12 1986-05-13 Fuji Chemicals Industrial Co., Ltd. Photosensitive lithographic plate with diazo resin underlayer and polyvinyl acetal resin with azide in side chain overlayer
US4608331A (en) * 1984-11-16 1986-08-26 Witco Chemical Corporation Photosensitive plates with diazonium composition layer and polyurethane photopolymer with unsaturation in side chain overlayer
US5275907A (en) * 1992-07-23 1994-01-04 Eastman Kodak Company Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding
EP0580530A2 (de) 1992-07-23 1994-01-26 Eastman Kodak Company Lichtempfindliche Zusammensetzung und Flachdruckplatte mit reduzierter Tendenz zur Blindlaufen
EP1155820A2 (de) * 2000-05-17 2001-11-21 Fuji Photo Film Co., Ltd. Flachdruckplatte
EP1155820A3 (de) * 2000-05-17 2003-09-24 Fuji Photo Film Co., Ltd. Flachdruckplatte
US6972167B2 (en) 2000-05-17 2005-12-06 Fuji Photo Film Co., Ltd. Planographic printing plate
US6596456B2 (en) 2001-05-29 2003-07-22 Kodak Polychrome Graphics Llc Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
US10434324B2 (en) 2005-04-22 2019-10-08 Cynosure, Llc Methods and systems for laser treatment using non-uniform output beam
US10849687B2 (en) 2006-08-02 2020-12-01 Cynosure, Llc Picosecond laser apparatus and methods for its operation and use
US10966785B2 (en) 2006-08-02 2021-04-06 Cynosure, Llc Picosecond laser apparatus and methods for its operation and use
US11712299B2 (en) 2006-08-02 2023-08-01 Cynosure, LLC. Picosecond laser apparatus and methods for its operation and use
US11095087B2 (en) 2012-04-18 2021-08-17 Cynosure, Llc Picosecond laser apparatus and methods for treating target tissues with same
US9780518B2 (en) 2012-04-18 2017-10-03 Cynosure, Inc. Picosecond laser apparatus and methods for treating target tissues with same
US10581217B2 (en) 2012-04-18 2020-03-03 Cynosure, Llc Picosecond laser apparatus and methods for treating target tissues with same
US10305244B2 (en) 2012-04-18 2019-05-28 Cynosure, Llc Picosecond laser apparatus and methods for treating target tissues with same
US11664637B2 (en) 2012-04-18 2023-05-30 Cynosure, Llc Picosecond laser apparatus and methods for treating target tissues with same
US10765478B2 (en) 2013-03-15 2020-09-08 Cynosurce, Llc Picosecond optical radiation systems and methods of use
US10245107B2 (en) 2013-03-15 2019-04-02 Cynosure, Inc. Picosecond optical radiation systems and methods of use
US11446086B2 (en) 2013-03-15 2022-09-20 Cynosure, Llc Picosecond optical radiation systems and methods of use
US10285757B2 (en) 2013-03-15 2019-05-14 Cynosure, Llc Picosecond optical radiation systems and methods of use
CN106814540B (zh) * 2015-11-30 2020-04-10 乐凯华光印刷科技有限公司 水洗凸版用感光组合物、含有该水洗凸版用感光组合物的水洗凸版及水洗凸版的制备方法
CN106814540A (zh) * 2015-11-30 2017-06-09 乐凯华光印刷科技有限公司 水洗凸版用感光组合物、含有该水洗凸版用感光组合物的水洗凸版及水洗凸版的制备方法
US11418000B2 (en) 2018-02-26 2022-08-16 Cynosure, Llc Q-switched cavity dumped sub-nanosecond laser
US11791603B2 (en) 2018-02-26 2023-10-17 Cynosure, LLC. Q-switched cavity dumped sub-nanosecond laser

Also Published As

Publication number Publication date
JPS507481B1 (de) 1975-03-26
FR2009091A1 (de) 1970-01-30
DE1925938C3 (de) 1984-01-26
DE1925938A1 (de) 1970-01-15
CH501946A (fr) 1971-01-15
FR2009091B1 (de) 1975-08-22
BE733491A (de) 1969-11-03
NL6907737A (de) 1969-11-25
ZA6903590B (de)
DE1925938B2 (de) 1975-09-18

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee