FR2009091A1 - - Google Patents

Info

Publication number
FR2009091A1
FR2009091A1 FR6916526A FR6916526A FR2009091A1 FR 2009091 A1 FR2009091 A1 FR 2009091A1 FR 6916526 A FR6916526 A FR 6916526A FR 6916526 A FR6916526 A FR 6916526A FR 2009091 A1 FR2009091 A1 FR 2009091A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR6916526A
Other languages
French (fr)
Other versions
FR2009091B1 (de
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of FR2009091A1 publication Critical patent/FR2009091A1/fr
Application granted granted Critical
Publication of FR2009091B1 publication Critical patent/FR2009091B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
FR6916526A 1968-05-22 1969-05-21 Expired FR2009091B1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73118168A 1968-05-22 1968-05-22

Publications (2)

Publication Number Publication Date
FR2009091A1 true FR2009091A1 (de) 1970-01-30
FR2009091B1 FR2009091B1 (de) 1975-08-22

Family

ID=24938412

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6916526A Expired FR2009091B1 (de) 1968-05-22 1969-05-21

Country Status (8)

Country Link
JP (1) JPS507481B1 (de)
BE (1) BE733491A (de)
CH (1) CH501946A (de)
DE (1) DE1925938C3 (de)
FR (1) FR2009091B1 (de)
GB (1) GB1274017A (de)
NL (1) NL6907737A (de)
ZA (1) ZA6903590B (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2391489A1 (fr) * 1977-05-19 1978-12-15 Polychrome Corp Plaque d'impression lithographique developpable a l'eau possedant une double couche photosensible
FR2400221A1 (fr) * 1977-08-09 1979-03-09 Kodak Pathe Compose de diazonium photosensible utile, en particulier, pour preparer des planches d'impression lithographique, procede de preparation de ce compose et plaque presensibilisee avec ce compose

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5953836A (ja) * 1982-09-21 1984-03-28 Fuji Photo Film Co Ltd 感光性平版印刷版
JPS59208552A (ja) * 1983-05-12 1984-11-26 Fuji Yakuhin Kogyo Kk 感光性平版印刷版
US4608331A (en) * 1984-11-16 1986-08-26 Witco Chemical Corporation Photosensitive plates with diazonium composition layer and polyurethane photopolymer with unsaturation in side chain overlayer
US5275907A (en) * 1992-07-23 1994-01-04 Eastman Kodak Company Photosensitive compositions and lithographic printing plates containing acid-substituted ternary acetal polymer and copolyester with reduced propensity to blinding
JP4152559B2 (ja) 2000-03-06 2008-09-17 富士フイルム株式会社 ネガ型感光性平版印刷版
JP4119597B2 (ja) 2000-05-17 2008-07-16 富士フイルム株式会社 平版印刷版原版
US6596456B2 (en) 2001-05-29 2003-07-22 Kodak Polychrome Graphics Llc Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
DE10233631B4 (de) * 2002-07-24 2004-09-30 Kodak Polychrome Graphics Gmbh Lithographie-Druckplattenvorläufer mit zwei strahlungsempfindlichen Schichten
JP4291638B2 (ja) 2003-07-29 2009-07-08 富士フイルム株式会社 アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版
JP4429116B2 (ja) 2004-08-27 2010-03-10 富士フイルム株式会社 平版印刷版原版及び平版印刷版の製版方法
EP1701213A3 (de) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Lichtempfindliche Zusammensetzung
JP4574506B2 (ja) 2005-03-23 2010-11-04 富士フイルム株式会社 平版印刷版原版、及びその製版方法
JP4368323B2 (ja) 2005-03-25 2009-11-18 富士フイルム株式会社 感光性平版印刷版
JP4457034B2 (ja) 2005-03-28 2010-04-28 富士フイルム株式会社 感光性平版印刷版
JP4524235B2 (ja) 2005-03-29 2010-08-11 富士フイルム株式会社 平版印刷版原版
US7856985B2 (en) 2005-04-22 2010-12-28 Cynosure, Inc. Method of treatment body tissue using a non-uniform laser beam
JP4701042B2 (ja) 2005-08-22 2011-06-15 富士フイルム株式会社 感光性平版印刷版
US7586957B2 (en) 2006-08-02 2009-09-08 Cynosure, Inc Picosecond laser apparatus and methods for its operation and use
JP4777226B2 (ja) 2006-12-07 2011-09-21 富士フイルム株式会社 画像記録材料、及び新規化合物
JP4860525B2 (ja) 2007-03-27 2012-01-25 富士フイルム株式会社 硬化性組成物及び平版印刷版原版
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
JP2009086373A (ja) 2007-09-28 2009-04-23 Fujifilm Corp ネガ型平版印刷版の現像方法
JP4890408B2 (ja) 2007-09-28 2012-03-07 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法
EP2204698B1 (de) 2009-01-06 2018-08-08 FUJIFILM Corporation Plattenoberflächenbehandlungsmittel für eine lithografische Druckplatte und Verfahren zur Behandlung der lithografischen Druckplatte
JP5714544B2 (ja) 2011-09-15 2015-05-07 富士フイルム株式会社 製版処理廃液のリサイクル方法
WO2013065853A1 (ja) 2011-11-04 2013-05-10 富士フイルム株式会社 製版処理廃液のリサイクル方法
WO2013158299A1 (en) 2012-04-18 2013-10-24 Cynosure, Inc. Picosecond laser apparatus and methods for treating target tissues with same
US10285757B2 (en) 2013-03-15 2019-05-14 Cynosure, Llc Picosecond optical radiation systems and methods of use
CN106814540B (zh) * 2015-11-30 2020-04-10 乐凯华光印刷科技有限公司 水洗凸版用感光组合物、含有该水洗凸版用感光组合物的水洗凸版及水洗凸版的制备方法
KR102627248B1 (ko) 2018-02-26 2024-01-19 싸이노슈어, 엘엘씨 Q-스위치드 캐비티 덤핑 서브 나노초 레이저

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1205386B (de) * 1955-10-03 1965-11-18 Du Pont Photopolymerisierbare Schicht zur Herstellung von Reliefbildern oder Druckformen
BE563723A (de) * 1957-01-04
US3342601A (en) * 1964-02-27 1967-09-19 Eastman Kodak Co Lithographic printing plate
NL6610053A (de) * 1966-07-15 1968-01-16

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2391489A1 (fr) * 1977-05-19 1978-12-15 Polychrome Corp Plaque d'impression lithographique developpable a l'eau possedant une double couche photosensible
FR2400221A1 (fr) * 1977-08-09 1979-03-09 Kodak Pathe Compose de diazonium photosensible utile, en particulier, pour preparer des planches d'impression lithographique, procede de preparation de ce compose et plaque presensibilisee avec ce compose

Also Published As

Publication number Publication date
JPS507481B1 (de) 1975-03-26
DE1925938C3 (de) 1984-01-26
DE1925938A1 (de) 1970-01-15
CH501946A (fr) 1971-01-15
FR2009091B1 (de) 1975-08-22
BE733491A (de) 1969-11-03
NL6907737A (de) 1969-11-25
GB1274017A (en) 1972-05-10
ZA6903590B (de)
DE1925938B2 (de) 1975-09-18

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Legal Events

Date Code Title Description
ST Notification of lapse