GB1254118A - Methods of etching oxide or nitride layers - Google Patents

Methods of etching oxide or nitride layers

Info

Publication number
GB1254118A
GB1254118A GB57509/68A GB5750968A GB1254118A GB 1254118 A GB1254118 A GB 1254118A GB 57509/68 A GB57509/68 A GB 57509/68A GB 5750968 A GB5750968 A GB 5750968A GB 1254118 A GB1254118 A GB 1254118A
Authority
GB
United Kingdom
Prior art keywords
oxide
nitride
silicon
dec
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB57509/68A
Other languages
English (en)
Inventor
M Lepselter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of GB1254118A publication Critical patent/GB1254118A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
    • H10P50/282—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
    • H10P50/283—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • Formation Of Insulating Films (AREA)
  • Drying Of Semiconductors (AREA)
GB57509/68A 1967-12-08 1968-12-04 Methods of etching oxide or nitride layers Expired GB1254118A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US68909067A 1967-12-08 1967-12-08

Publications (1)

Publication Number Publication Date
GB1254118A true GB1254118A (en) 1971-11-17

Family

ID=24767002

Family Applications (1)

Application Number Title Priority Date Filing Date
GB57509/68A Expired GB1254118A (en) 1967-12-08 1968-12-04 Methods of etching oxide or nitride layers

Country Status (8)

Country Link
US (1) US3585091A (https=)
JP (1) JPS5026907B1 (https=)
BE (1) BE725077A (https=)
DE (1) DE1812819B2 (https=)
FR (1) FR1596758A (https=)
GB (1) GB1254118A (https=)
NL (2) NL6817534A (https=)
SE (1) SE348234B (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4144066A (en) * 1977-11-30 1979-03-13 Ppg Industries, Inc. Electron bombardment method for making stained glass photomasks
US4619894A (en) * 1985-04-12 1986-10-28 Massachusetts Institute Of Technology Solid-transformation thermal resist
FR2620737B1 (fr) * 1987-09-17 1993-04-16 France Etat Procede de gravure d'une couche d'oxyde de silicium
JP2809087B2 (ja) * 1994-02-15 1998-10-08 日本電気株式会社 配線形成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1050409A (https=) * 1964-09-04

Also Published As

Publication number Publication date
DE1812819B2 (de) 1971-08-19
NL136565C (https=)
DE1812819A1 (de) 1969-08-14
BE725077A (https=) 1969-05-16
SE348234B (https=) 1972-08-28
JPS5026907B1 (https=) 1975-09-04
NL6817534A (https=) 1969-06-10
US3585091A (en) 1971-06-15
FR1596758A (https=) 1970-06-22

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GB1265545A (https=)