GB1328451A - Depositing a metal layer on a substrate - Google Patents
Depositing a metal layer on a substrateInfo
- Publication number
- GB1328451A GB1328451A GB1328451DA GB1328451A GB 1328451 A GB1328451 A GB 1328451A GB 1328451D A GB1328451D A GB 1328451DA GB 1328451 A GB1328451 A GB 1328451A
- Authority
- GB
- United Kingdom
- Prior art keywords
- substrate
- vapour
- depositing
- metal layer
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
1328451 Coating with metals by decomposition of a vapour MULLARD Ltd 6 March 1972 [26 March 1971] 7918/71 Heading C7F A metal e.g. W, Mo or Re, is deposited on a substrate of e.g. W, Mo or W-Mo by reducing a stream of the metal oxide vapour, water vapour and inert gas by means of a reducing gas, e. g. hydrogen. The metal oxide vapour may be formed by passing water vapour over the metal. The substrate may be heated to 650 to 1400‹ C by e.g. H.F. heating.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB791871 | 1971-03-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1328451A true GB1328451A (en) | 1973-08-30 |
Family
ID=9842295
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1328451D Expired GB1328451A (en) | 1971-03-26 | 1971-03-26 | Depositing a metal layer on a substrate |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1328451A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2391288A1 (en) * | 1977-05-18 | 1978-12-15 | Siemens Ag | PROCESS FOR THE REALIZATION OF THIN LAYERS OF METALS RESISTANT TO HIGH TEMPERATURES SUCH AS TUNGSTENE, MOLYBDENE, RHENIUM OR OSMIUM |
-
1971
- 1971-03-26 GB GB1328451D patent/GB1328451A/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2391288A1 (en) * | 1977-05-18 | 1978-12-15 | Siemens Ag | PROCESS FOR THE REALIZATION OF THIN LAYERS OF METALS RESISTANT TO HIGH TEMPERATURES SUCH AS TUNGSTENE, MOLYBDENE, RHENIUM OR OSMIUM |
US4198449A (en) * | 1977-05-18 | 1980-04-15 | Siemens Aktiengesellschaft | Method for the preparation of thin films of high-temperature-resistant metals such as tungsten, molybdenum, rhenium or osmium |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |