JPS5026907B1 - - Google Patents

Info

Publication number
JPS5026907B1
JPS5026907B1 JP43089140A JP8914068A JPS5026907B1 JP S5026907 B1 JPS5026907 B1 JP S5026907B1 JP 43089140 A JP43089140 A JP 43089140A JP 8914068 A JP8914068 A JP 8914068A JP S5026907 B1 JPS5026907 B1 JP S5026907B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP43089140A
Other languages
Japanese (ja)
Inventor
M Lepselter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of JPS5026907B1 publication Critical patent/JPS5026907B1/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00Etching of wafers, substrates or parts of devices
    • H10P50/20Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/28Dry etching; Plasma etching; Reactive-ion etching of insulating materials
    • H10P50/282Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
    • H10P50/283Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Weting (AREA)
  • Formation Of Insulating Films (AREA)
  • Drying Of Semiconductors (AREA)
JP43089140A 1967-12-08 1968-12-06 Pending JPS5026907B1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US68909067A 1967-12-08 1967-12-08

Publications (1)

Publication Number Publication Date
JPS5026907B1 true JPS5026907B1 (https=) 1975-09-04

Family

ID=24767002

Family Applications (1)

Application Number Title Priority Date Filing Date
JP43089140A Pending JPS5026907B1 (https=) 1967-12-08 1968-12-06

Country Status (8)

Country Link
US (1) US3585091A (https=)
JP (1) JPS5026907B1 (https=)
BE (1) BE725077A (https=)
DE (1) DE1812819B2 (https=)
FR (1) FR1596758A (https=)
GB (1) GB1254118A (https=)
NL (2) NL6817534A (https=)
SE (1) SE348234B (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4144066A (en) * 1977-11-30 1979-03-13 Ppg Industries, Inc. Electron bombardment method for making stained glass photomasks
US4619894A (en) * 1985-04-12 1986-10-28 Massachusetts Institute Of Technology Solid-transformation thermal resist
FR2620737B1 (fr) * 1987-09-17 1993-04-16 France Etat Procede de gravure d'une couche d'oxyde de silicium
JP2809087B2 (ja) * 1994-02-15 1998-10-08 日本電気株式会社 配線形成方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1050409A (https=) * 1964-09-04

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1050409A (https=) * 1964-09-04

Also Published As

Publication number Publication date
DE1812819B2 (de) 1971-08-19
NL136565C (https=)
DE1812819A1 (de) 1969-08-14
BE725077A (https=) 1969-05-16
SE348234B (https=) 1972-08-28
NL6817534A (https=) 1969-06-10
GB1254118A (en) 1971-11-17
US3585091A (en) 1971-06-15
FR1596758A (https=) 1970-06-22

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