GB1246704A - Photoresist materials for semiconductor masking - Google Patents

Photoresist materials for semiconductor masking

Info

Publication number
GB1246704A
GB1246704A GB06079/69A GB1607969A GB1246704A GB 1246704 A GB1246704 A GB 1246704A GB 06079/69 A GB06079/69 A GB 06079/69A GB 1607969 A GB1607969 A GB 1607969A GB 1246704 A GB1246704 A GB 1246704A
Authority
GB
United Kingdom
Prior art keywords
photo
vinyl
resists
gamma
specified
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB06079/69A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Publication of GB1246704A publication Critical patent/GB1246704A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
GB06079/69A 1968-04-26 1969-03-27 Photoresist materials for semiconductor masking Expired GB1246704A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US72464068A 1968-04-26 1968-04-26

Publications (1)

Publication Number Publication Date
GB1246704A true GB1246704A (en) 1971-09-15

Family

ID=24911238

Family Applications (1)

Application Number Title Priority Date Filing Date
GB06079/69A Expired GB1246704A (en) 1968-04-26 1969-03-27 Photoresist materials for semiconductor masking

Country Status (7)

Country Link
JP (1) JPS494851B1 (https=)
AT (1) AT297478B (https=)
BE (1) BE732026A (https=)
DE (1) DE1920932C3 (https=)
FR (1) FR2007530A1 (https=)
GB (1) GB1246704A (https=)
NL (1) NL6906398A (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0104235A4 (en) * 1982-03-29 1984-09-14 Motorola Inc METHOD OF FORMING A HYBRID LITHOGRAPHIC PROTECTION MATERIAL WITH ELECTRONIC / OPTICAL RADIUS.
GB2154330A (en) * 1984-02-13 1985-09-04 British Telecomm Fabrication of semiconductor devices
US4737425A (en) * 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2441315A1 (de) * 1974-08-29 1976-03-11 Hoechst Ag Mit o-naphthochinondiazidverbindung vorsensibilisierte druckplatte
DE3720465A1 (de) * 1987-06-20 1988-12-29 Asea Brown Boveri Haftvermittler fuer negativresist zum aetzen tiefer graeben in siliciumscheiben mit glatter oberflaeche und verfahren zur herstellung des haftvermittlers

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0104235A4 (en) * 1982-03-29 1984-09-14 Motorola Inc METHOD OF FORMING A HYBRID LITHOGRAPHIC PROTECTION MATERIAL WITH ELECTRONIC / OPTICAL RADIUS.
GB2154330A (en) * 1984-02-13 1985-09-04 British Telecomm Fabrication of semiconductor devices
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
US4737425A (en) * 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process

Also Published As

Publication number Publication date
DE1920932C3 (de) 1975-12-04
JPS494851B1 (https=) 1974-02-04
FR2007530A1 (https=) 1970-01-09
NL6906398A (https=) 1969-10-28
BE732026A (https=) 1969-10-24
DE1920932A1 (de) 1971-04-08
AT297478B (de) 1972-03-27
DE1920932B2 (de) 1971-11-25

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