AT297478B - Kopierlack für die Halbleitermaskierung - Google Patents

Kopierlack für die Halbleitermaskierung

Info

Publication number
AT297478B
AT297478B AT402569A AT402569A AT297478B AT 297478 B AT297478 B AT 297478B AT 402569 A AT402569 A AT 402569A AT 402569 A AT402569 A AT 402569A AT 297478 B AT297478 B AT 297478B
Authority
AT
Austria
Prior art keywords
semiconductor masking
lacquer
copy
copy lacquer
masking
Prior art date
Application number
AT402569A
Other languages
English (en)
Original Assignee
Dow Corning
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning filed Critical Dow Corning
Application granted granted Critical
Publication of AT297478B publication Critical patent/AT297478B/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/293—Organic, e.g. plastic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
AT402569A 1968-04-26 1969-04-25 Kopierlack für die Halbleitermaskierung AT297478B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US72464068A 1968-04-26 1968-04-26

Publications (1)

Publication Number Publication Date
AT297478B true AT297478B (de) 1972-03-27

Family

ID=24911238

Family Applications (1)

Application Number Title Priority Date Filing Date
AT402569A AT297478B (de) 1968-04-26 1969-04-25 Kopierlack für die Halbleitermaskierung

Country Status (7)

Country Link
JP (1) JPS494851B1 (de)
AT (1) AT297478B (de)
BE (1) BE732026A (de)
DE (1) DE1920932C3 (de)
FR (1) FR2007530A1 (de)
GB (1) GB1246704A (de)
NL (1) NL6906398A (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2441315A1 (de) * 1974-08-29 1976-03-11 Hoechst Ag Mit o-naphthochinondiazidverbindung vorsensibilisierte druckplatte
JPS59500436A (ja) * 1982-03-29 1984-03-15 モトロ−ラ・インコ−ポレ−テツド 電子ビ−ム／光学的ハイブリドリソグラフイツクレジスト法
GB8403698D0 (en) * 1984-02-13 1984-03-14 British Telecomm Semiconductor device fabrication
US4782008A (en) * 1985-03-19 1988-11-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
US4737425A (en) * 1986-06-10 1988-04-12 International Business Machines Corporation Patterned resist and process
DE3720465A1 (de) * 1987-06-20 1988-12-29 Asea Brown Boveri Haftvermittler fuer negativresist zum aetzen tiefer graeben in siliciumscheiben mit glatter oberflaeche und verfahren zur herstellung des haftvermittlers

Also Published As

Publication number Publication date
FR2007530A1 (de) 1970-01-09
GB1246704A (en) 1971-09-15
DE1920932A1 (de) 1971-04-08
NL6906398A (de) 1969-10-28
DE1920932B2 (de) 1971-11-25
JPS494851B1 (de) 1974-02-04
DE1920932C3 (de) 1975-12-04
BE732026A (de) 1969-10-24

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee