GB1229473A - - Google Patents

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Publication number
GB1229473A
GB1229473A GB1229473DA GB1229473A GB 1229473 A GB1229473 A GB 1229473A GB 1229473D A GB1229473D A GB 1229473DA GB 1229473 A GB1229473 A GB 1229473A
Authority
GB
United Kingdom
Prior art keywords
silicon oxide
oxysilane
film
electrodes
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1229473A publication Critical patent/GB1229473A/en
Expired legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)

Abstract

1,229,473. Silicon oxide films. RUMANIA, MINISTRY OF MACHINE CONSTRUCTION INDUSTRY. 14 June, 1968, No. 28535/68. Heading C1A. A film of silicon oxide is deposited on a surface (13) in an enclosure (3) under partial vacuum by decomposing an oxysilane (introduced from 12) with an electric discharge derived from a D.C. or low frequency A.C. applied between two electrodes (7 and 8) As described, tetraethoxysilane is supplied by controlled distillation at<SP> _</SP> 10‹ to + 100‹ C., and a partial vacuum of 10-1 to 10-<SP>2</SP> torr and a voltage across the electrodes of 200-5000 v. are maintained. The rate of formation of silicon oxide may be adjusted by increasing the voltage in conjunction with deposition time. The oxygen: ethoxysilane ratio in 3 may be adjusted so that SiO is deposited. The deposition of silicon oxide film may be a static operation for which a quantity of oxysilane is introduced into 3 which is sufficient to obtain a film of desired thickness or oxysilane may be continuously supplied and evacuated.
GB1229473D 1968-06-14 1968-06-14 Expired GB1229473A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2853568 1968-06-14

Publications (1)

Publication Number Publication Date
GB1229473A true GB1229473A (en) 1971-04-21

Family

ID=10277169

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1229473D Expired GB1229473A (en) 1968-06-14 1968-06-14

Country Status (1)

Country Link
GB (1) GB1229473A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4105821A (en) * 1975-08-13 1978-08-08 Robert Bosch Gmbh Silicon oxide coated metal having improved corrosion resistance

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4105821A (en) * 1975-08-13 1978-08-08 Robert Bosch Gmbh Silicon oxide coated metal having improved corrosion resistance

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees