GB1229473A - - Google Patents
Info
- Publication number
- GB1229473A GB1229473A GB1229473DA GB1229473A GB 1229473 A GB1229473 A GB 1229473A GB 1229473D A GB1229473D A GB 1229473DA GB 1229473 A GB1229473 A GB 1229473A
- Authority
- GB
- United Kingdom
- Prior art keywords
- silicon oxide
- oxysilane
- film
- electrodes
- deposited
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
Abstract
1,229,473. Silicon oxide films. RUMANIA, MINISTRY OF MACHINE CONSTRUCTION INDUSTRY. 14 June, 1968, No. 28535/68. Heading C1A. A film of silicon oxide is deposited on a surface (13) in an enclosure (3) under partial vacuum by decomposing an oxysilane (introduced from 12) with an electric discharge derived from a D.C. or low frequency A.C. applied between two electrodes (7 and 8) As described, tetraethoxysilane is supplied by controlled distillation at<SP> _</SP> 10‹ to + 100‹ C., and a partial vacuum of 10-1 to 10-<SP>2</SP> torr and a voltage across the electrodes of 200-5000 v. are maintained. The rate of formation of silicon oxide may be adjusted by increasing the voltage in conjunction with deposition time. The oxygen: ethoxysilane ratio in 3 may be adjusted so that SiO is deposited. The deposition of silicon oxide film may be a static operation for which a quantity of oxysilane is introduced into 3 which is sufficient to obtain a film of desired thickness or oxysilane may be continuously supplied and evacuated.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB2853568 | 1968-06-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1229473A true GB1229473A (en) | 1971-04-21 |
Family
ID=10277169
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1229473D Expired GB1229473A (en) | 1968-06-14 | 1968-06-14 |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1229473A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4105821A (en) * | 1975-08-13 | 1978-08-08 | Robert Bosch Gmbh | Silicon oxide coated metal having improved corrosion resistance |
-
1968
- 1968-06-14 GB GB1229473D patent/GB1229473A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4105821A (en) * | 1975-08-13 | 1978-08-08 | Robert Bosch Gmbh | Silicon oxide coated metal having improved corrosion resistance |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |