GB1228693A - - Google Patents

Info

Publication number
GB1228693A
GB1228693A GB1228693DA GB1228693A GB 1228693 A GB1228693 A GB 1228693A GB 1228693D A GB1228693D A GB 1228693DA GB 1228693 A GB1228693 A GB 1228693A
Authority
GB
United Kingdom
Prior art keywords
etchant
hydrogen
methylurea
ditolylthiourea
phenylurea
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of GB1228693A publication Critical patent/GB1228693A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/18—Acidic compositions for etching copper or alloys thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
GB1228693D 1968-08-09 1969-03-27 Expired GB1228693A (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US75138868A 1968-08-09 1968-08-09

Publications (1)

Publication Number Publication Date
GB1228693A true GB1228693A (enExample) 1971-04-15

Family

ID=25021760

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1228693D Expired GB1228693A (enExample) 1968-08-09 1969-03-27

Country Status (4)

Country Link
US (1) US3668131A (enExample)
DE (1) DE1919820A1 (enExample)
FR (1) FR2019333A1 (enExample)
GB (1) GB1228693A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115702261A (zh) * 2020-06-12 2023-02-14 德国艾托特克有限两合公司 用于处理金属衬底表面的水性碱性蚀刻组合物
CN115997785A (zh) * 2022-12-30 2023-04-25 宁波三江益农化学有限公司 一种藻类控制用组合物

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* Cited by examiner, † Cited by third party
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US4174253A (en) * 1977-11-08 1979-11-13 Dart Industries Inc. Dissolution of metals utilizing a H2 O2 -H2 SO4 solution catalyzed with hydroxy substituted cycloparaffins
US4220706A (en) * 1978-05-10 1980-09-02 Rca Corporation Etchant solution containing HF-HnO3 -H2 SO4 -H2 O2
US4222779A (en) * 1979-06-04 1980-09-16 Dart Industries Inc. Non-chromate conversion coatings
US4225351A (en) * 1979-06-04 1980-09-30 Dart Industries Inc. Non-chromate conversion coatings
US4225350A (en) * 1979-06-04 1980-09-30 Dart Industries Inc. Non-chromate conversion coatings
US4233113A (en) * 1979-06-25 1980-11-11 Dart Industries Inc. Dissolution of metals utilizing an aqueous H2 O2 -H2 SO4 -thioamide etchant
US4233112A (en) * 1979-06-25 1980-11-11 Dart Industries Inc. Dissolution of metals utilizing an aqueous H2 SO4 -H2 O2 -polysulfide etchant
US4233111A (en) * 1979-06-25 1980-11-11 Dart Industries Inc. Dissolution of metals utilizing an aqueous H2 SO4 -H2 O2 -3-sulfopropyldithiocarbamate etchant
US4236957A (en) * 1979-06-25 1980-12-02 Dart Industries Inc. Dissolution of metals utilizing an aqueous H2 SOY --H2 O.sub. -mercapto containing heterocyclic nitrogen etchant
US4351675A (en) * 1981-03-02 1982-09-28 Rohco, Inc. Conversion coatings for zinc and cadmium surfaces
US4370197A (en) * 1981-06-24 1983-01-25 International Business Machines Corporation Process for etching chrome
US4401509A (en) * 1982-09-07 1983-08-30 Fmc Corporation Composition and process for printed circuit etching using a sulfuric acid solution containing hydrogen peroxide
US4636282A (en) * 1985-06-20 1987-01-13 Great Lakes Chemical Corporation Method for etching copper and composition useful therein
EP0265578A1 (en) * 1986-10-30 1988-05-04 Jan-Olof Eriksson A non-abrasive polish or cleaning composition and process for its preparation
US4859281A (en) * 1987-06-04 1989-08-22 Pennwalt Corporation Etching of copper and copper bearing alloys
CH682023A5 (enExample) * 1990-10-26 1993-06-30 Recytec Sa
GB9425090D0 (en) * 1994-12-12 1995-02-08 Alpha Metals Ltd Copper coating
US20040140288A1 (en) * 1996-07-25 2004-07-22 Bakul Patel Wet etch of titanium-tungsten film
US20040134873A1 (en) * 1996-07-25 2004-07-15 Li Yao Abrasive-free chemical mechanical polishing composition and polishing process containing same
KR100302671B1 (ko) * 1996-07-25 2001-09-22 피. 제리 코더 화학기계적연마용조성물및화학기계적연마방법
US5783489A (en) * 1996-09-24 1998-07-21 Cabot Corporation Multi-oxidizer slurry for chemical mechanical polishing
US6039891A (en) * 1996-09-24 2000-03-21 Cabot Corporation Multi-oxidizer precursor for chemical mechanical polishing
US6033596A (en) * 1996-09-24 2000-03-07 Cabot Corporation Multi-oxidizer slurry for chemical mechanical polishing
US6068787A (en) * 1996-11-26 2000-05-30 Cabot Corporation Composition and slurry useful for metal CMP
US5958288A (en) * 1996-11-26 1999-09-28 Cabot Corporation Composition and slurry useful for metal CMP
US5954997A (en) 1996-12-09 1999-09-21 Cabot Corporation Chemical mechanical polishing slurry useful for copper substrates
US6309560B1 (en) 1996-12-09 2001-10-30 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper substrates
US6126853A (en) * 1996-12-09 2000-10-03 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper substrates
US6083419A (en) * 1997-07-28 2000-07-04 Cabot Corporation Polishing composition including an inhibitor of tungsten etching
US6284309B1 (en) 1997-12-19 2001-09-04 Atotech Deutschland Gmbh Method of producing copper surfaces for improved bonding, compositions used therein and articles made therefrom
US6177026B1 (en) 1998-05-26 2001-01-23 Cabot Microelectronics Corporation CMP slurry containing a solid catalyst
US6435947B2 (en) 1998-05-26 2002-08-20 Cabot Microelectronics Corporation CMP polishing pad including a solid catalyst
US6117250A (en) * 1999-02-25 2000-09-12 Morton International Inc. Thiazole and thiocarbamide based chemicals for use with oxidative etchant solutions
US6444140B2 (en) 1999-03-17 2002-09-03 Morton International Inc. Micro-etch solution for producing metal surface topography
US6533905B2 (en) * 2000-01-24 2003-03-18 Tini Alloy Company Method for sputtering tini shape-memory alloys
US20040099637A1 (en) * 2000-06-16 2004-05-27 Shipley Company, L.L.C. Composition for producing metal surface topography
US20030178391A1 (en) * 2000-06-16 2003-09-25 Shipley Company, L.L.C. Composition for producing metal surface topography
JP3930732B2 (ja) * 2000-12-27 2007-06-13 荏原ユージライト株式会社 銅および銅合金用のマイクロエッチング剤並びにこれを用いる銅または銅合金の微細粗化方法
JP3930885B2 (ja) * 2000-12-27 2007-06-13 荏原ユージライト株式会社 銅および銅合金用のマイクロエッチング剤
JP3932193B2 (ja) * 2000-12-27 2007-06-20 荏原ユージライト株式会社 銅および銅合金用のマイクロエッチング剤並びにこれを用いる銅または銅合金の微細粗化方法
US6383065B1 (en) 2001-01-22 2002-05-07 Cabot Microelectronics Corporation Catalytic reactive pad for metal CMP
US6841084B2 (en) * 2002-02-11 2005-01-11 Nikko Materials Usa, Inc. Etching solution for forming an embedded resistor
JP2006199888A (ja) * 2005-01-24 2006-08-03 Seiko Epson Corp 水性インク組成物及びそれを用いたインクジェット記録方法、並びに記録物
US8584767B2 (en) * 2007-01-25 2013-11-19 Tini Alloy Company Sprinkler valve with active actuation
US8684101B2 (en) * 2007-01-25 2014-04-01 Tini Alloy Company Frangible shape memory alloy fire sprinkler valve actuator
WO2009018289A2 (en) 2007-07-30 2009-02-05 Tini Alloy Company Method and devices for preventing restenosis in cardiovascular stents
US8303832B2 (en) * 2009-08-17 2012-11-06 Palo Alto Research Center Incorporated Solid inks for masks for printed circuit boards and other electronic devices
US8211617B2 (en) * 2009-08-17 2012-07-03 Palo Alto Research Center Incorporated Solid inks for printed masks
US8858755B2 (en) 2011-08-26 2014-10-14 Tel Nexx, Inc. Edge bevel removal apparatus and method
CN103184523B (zh) * 2011-12-27 2016-01-27 中建材浚鑫科技股份有限公司 一种单晶硅制绒剂及绒面单晶硅的制备方法
US10124197B2 (en) 2012-08-31 2018-11-13 TiNi Allot Company Fire sprinkler valve actuator
US11040230B2 (en) 2012-08-31 2021-06-22 Tini Alloy Company Fire sprinkler valve actuator
CN112831658B (zh) * 2019-11-25 2023-08-22 荆门格林循环电子废弃物处置有限公司 一种废电路板中金的回收方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2894986A (en) * 1956-07-23 1959-07-14 Monsanto Chemicals Diphenyl urea derivatives
DE1155432B (de) * 1960-02-27 1963-10-10 Dehydag Gmbh Verfahren zur Herstellung von Thioharnstoffabkoemmlingen
NL120737C (enExample) * 1961-06-08
US3074825A (en) * 1962-04-03 1963-01-22 Chemical Cleaning Inc Method of removing copper-containing iron oxide incrustations from ferriferous surfaces
DE1255443B (de) * 1964-08-22 1967-11-30 Degussa Verfahren zum chemischen AEtzen von gedruckten Schaltungen
US3407141A (en) * 1966-02-03 1968-10-22 Allied Chem Dissolution of metal with acidified hydrogen peroxide solutions

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115702261A (zh) * 2020-06-12 2023-02-14 德国艾托特克有限两合公司 用于处理金属衬底表面的水性碱性蚀刻组合物
CN115997785A (zh) * 2022-12-30 2023-04-25 宁波三江益农化学有限公司 一种藻类控制用组合物

Also Published As

Publication number Publication date
US3668131A (en) 1972-06-06
DE1919820A1 (de) 1970-06-25
FR2019333A1 (enExample) 1970-07-03

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees