GB1194428A - Process and Apparatus for Surface Coating Glass and Other Materials - Google Patents

Process and Apparatus for Surface Coating Glass and Other Materials

Info

Publication number
GB1194428A
GB1194428A GB38382/67A GB3838267A GB1194428A GB 1194428 A GB1194428 A GB 1194428A GB 38382/67 A GB38382/67 A GB 38382/67A GB 3838267 A GB3838267 A GB 3838267A GB 1194428 A GB1194428 A GB 1194428A
Authority
GB
United Kingdom
Prior art keywords
drum
source
sputtering
electrodes
vapour
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB38382/67A
Inventor
Pierre Gallez
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Glass Europe SA
Original Assignee
Glaverbel Belgium SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Glaverbel Belgium SA filed Critical Glaverbel Belgium SA
Publication of GB1194428A publication Critical patent/GB1194428A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

1,194,428. Coating by sputtering or evaporation. GLAVERBEL. Aug. 21, 1967 [Oct. 5, 1966], No. 38382/67. Heading C7F. Material e.g. Au, Cu, titanium dioxide or silicon monoxide is sputtered or evaporated on to a moving strip of e.g. glass to form one or more layers from electrodes 54, 55, 56, and 57 or vapour sources Fig. 2B (not shown), mounted on a drum which is rotated by a hollow shaft 50 extending through the wall 51a of the vacuum chamber to bring each electrode or source in turn into operative position. Fixed contacts 62, 63 provide high and low voltages for sputtering or heating the source material, and the electrodes are cooled by oil circulating in a passage 66, conduits 67, and shaft 50. The drum is located in its working positions by a roller 70 engaging notches in a disc 69. Screens are provided to prevent contamination of one source by another. In modifications Figs. 3, and 4 (not shown) the drum is of hexagonal or rectangular section. In a further modification Fig. 5 (not shown), the electrical and cooling fluid connections are made outside the drum and material is fed to the vapour source through a pipe. The substrate may be cleaned by glow discharge.
GB38382/67A 1966-10-05 1967-08-21 Process and Apparatus for Surface Coating Glass and Other Materials Expired GB1194428A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
LU52106A LU52106A1 (en) 1966-10-05 1966-10-05

Publications (1)

Publication Number Publication Date
GB1194428A true GB1194428A (en) 1970-06-10

Family

ID=19724990

Family Applications (1)

Application Number Title Priority Date Filing Date
GB38382/67A Expired GB1194428A (en) 1966-10-05 1967-08-21 Process and Apparatus for Surface Coating Glass and Other Materials

Country Status (11)

Country Link
US (1) US3616451A (en)
AT (2) AT280514B (en)
BE (1) BE704031A (en)
CH (1) CH501063A (en)
DE (1) DE1615287A1 (en)
ES (1) ES345149A1 (en)
FI (1) FI46636C (en)
FR (1) FR1556228A (en)
GB (1) GB1194428A (en)
LU (1) LU52106A1 (en)
NL (1) NL6713182A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19830223C1 (en) * 1998-07-07 1999-11-04 Techno Coat Oberflaechentechni Magnetron sputtering unit for multilayer coating of substrates especially in small to medium runs or in laboratories
WO2015059228A1 (en) * 2013-10-24 2015-04-30 Roth & Rau Ag Multi-magnet arrangement

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3767559A (en) * 1970-06-24 1973-10-23 Eastman Kodak Co Sputtering apparatus with accordion pleated anode means
FR2098563A5 (en) * 1970-07-10 1972-03-10 Progil
JPH0733576B2 (en) * 1989-11-29 1995-04-12 株式会社日立製作所 Sputter device, target exchanging device, and exchanging method thereof
JPH05804A (en) * 1990-08-01 1993-01-08 Sumitomo Electric Ind Ltd Film forming device for large area multiple oxide superconducting thin film
DE4040856A1 (en) * 1990-12-20 1992-06-25 Leybold Ag SPRAYING SYSTEM
US5292419A (en) * 1990-12-20 1994-03-08 Leybold Aktiengesellschaft Sputtering unit
US5279724A (en) * 1991-12-26 1994-01-18 Xerox Corporation Dual sputtering source
US5322606A (en) * 1991-12-26 1994-06-21 Xerox Corporation Use of rotary solenoid as a shutter actuator on a rotating arm
GB9405442D0 (en) * 1994-03-19 1994-05-04 Applied Vision Ltd Apparatus for coating substrates
US6045671A (en) * 1994-10-18 2000-04-04 Symyx Technologies, Inc. Systems and methods for the combinatorial synthesis of novel materials
US6833031B2 (en) * 2000-03-21 2004-12-21 Wavezero, Inc. Method and device for coating a substrate
JP2003141719A (en) * 2001-10-30 2003-05-16 Anelva Corp Sputtering device and thin film forming method
JP4066044B2 (en) * 2002-11-08 2008-03-26 信行 高橋 Film forming method and sputtering apparatus
CA2564539C (en) * 2005-11-14 2014-05-06 Sulzer Metco Coatings B.V. A method for coating of a base body with a platinum modified aluminide ptmal by means of a physical deposition out of the gas phase
US8287647B2 (en) * 2007-04-17 2012-10-16 Lam Research Corporation Apparatus and method for atomic layer deposition
KR100865475B1 (en) * 2007-08-30 2008-10-27 세메스 주식회사 Nozzle assembly, apparatus for supplying a processing liquid having the same and method of supplying a processing liquid using the same
US10586689B2 (en) * 2009-07-31 2020-03-10 Guardian Europe S.A.R.L. Sputtering apparatus including cathode with rotatable targets, and related methods
US20120027953A1 (en) * 2010-07-28 2012-02-02 Synos Technology, Inc. Rotating Reactor Assembly for Depositing Film on Substrate
US20130014700A1 (en) * 2011-07-11 2013-01-17 Hariharakeshava Sarpangala Hegde Target shield designs in multi-target deposition system.
PT3649410T (en) * 2017-07-07 2022-02-01 Nextracker Inc Systems for and methods of positioning solar panels in an array of solar panels to efficiently capture sunlight

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19830223C1 (en) * 1998-07-07 1999-11-04 Techno Coat Oberflaechentechni Magnetron sputtering unit for multilayer coating of substrates especially in small to medium runs or in laboratories
US6113752A (en) * 1998-07-07 2000-09-05 Techno-Coat Oberflachentechnik Gmbh Method and device for coating substrate
WO2015059228A1 (en) * 2013-10-24 2015-04-30 Roth & Rau Ag Multi-magnet arrangement

Also Published As

Publication number Publication date
US3616451A (en) 1971-10-26
BE704031A (en) 1968-03-19
AT284365B (en) 1970-09-10
CH501063A (en) 1970-12-31
FI46636C (en) 1973-05-08
LU52106A1 (en) 1968-05-07
ES345149A1 (en) 1968-11-16
FI46636B (en) 1973-01-31
NL6713182A (en) 1968-04-08
AT280514B (en) 1970-04-10
FR1556228A (en) 1969-02-07
DE1615287A1 (en) 1970-06-11

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
435 Patent endorsed 'licences of right' on the date specified (sect. 35/1949)
PLE Entries relating assignments, transmissions, licences in the register of patents
PLNP Patent lapsed through nonpayment of renewal fees