GB1170897A - Improvements in or relating to Processes for Lapping and/or Polishing Semiconductor Plates. - Google Patents

Improvements in or relating to Processes for Lapping and/or Polishing Semiconductor Plates.

Info

Publication number
GB1170897A
GB1170897A GB00004/68A GB1000468A GB1170897A GB 1170897 A GB1170897 A GB 1170897A GB 00004/68 A GB00004/68 A GB 00004/68A GB 1000468 A GB1000468 A GB 1000468A GB 1170897 A GB1170897 A GB 1170897A
Authority
GB
United Kingdom
Prior art keywords
plates
carrier
lapping
columns
plane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB00004/68A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Siemens Corp
Original Assignee
Siemens AG
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG, Siemens Corp filed Critical Siemens AG
Publication of GB1170897A publication Critical patent/GB1170897A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P90/00Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
    • H10P90/12Preparing bulk and homogeneous wafers
    • H10P90/123Preparing bulk and homogeneous wafers by grinding or lapping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/27Work carriers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
GB00004/68A 1967-03-03 1968-03-01 Improvements in or relating to Processes for Lapping and/or Polishing Semiconductor Plates. Expired GB1170897A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES0108629 1967-03-03

Publications (1)

Publication Number Publication Date
GB1170897A true GB1170897A (en) 1969-11-19

Family

ID=7528929

Family Applications (1)

Application Number Title Priority Date Filing Date
GB00004/68A Expired GB1170897A (en) 1967-03-03 1968-03-01 Improvements in or relating to Processes for Lapping and/or Polishing Semiconductor Plates.

Country Status (5)

Country Link
US (1) US3562965A (https=)
DE (1) DE1652170B2 (https=)
FR (1) FR1564761A (https=)
GB (1) GB1170897A (https=)
NL (1) NL6801149A (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3805458A (en) * 1972-12-22 1974-04-23 Bell Telephone Labor Inc Technique for correcting the crystallographic orientation angle of crystals by double face lapping of overlapping layers
US3803774A (en) * 1972-12-22 1974-04-16 Bell Telephone Labor Inc Technique for correcting the crystallo-graphic orientation angle of crystals by the formation of mesas and double face lapping
DE2712521C2 (de) * 1977-03-22 1987-03-05 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zum Aufkitten von Scheiben
US4316757A (en) * 1980-03-03 1982-02-23 Monsanto Company Method and apparatus for wax mounting of thin wafers for polishing
JP2648638B2 (ja) * 1990-11-30 1997-09-03 三菱マテリアル株式会社 ウェーハの接着方法およびその装置
US6010392A (en) * 1998-02-17 2000-01-04 International Business Machines Corporation Die thinning apparatus
US7121924B2 (en) 2004-04-20 2006-10-17 3M Innovative Properties Company Abrasive articles, and methods of making and using the same
US8124455B2 (en) * 2005-04-02 2012-02-28 Stats Chippac Ltd. Wafer strength reinforcement system for ultra thin wafer thinning
TWI402906B (zh) * 2007-06-25 2013-07-21 聖高拜陶器塑膠公司 單晶體之結晶性再定向之方法
CN110370165B (zh) * 2019-07-22 2021-07-13 吉林大学 一种耐磨损的行星研磨盘

Also Published As

Publication number Publication date
US3562965A (en) 1971-02-16
DE1652170B2 (de) 1975-05-22
DE1652170A1 (de) 1971-02-25
FR1564761A (https=) 1969-04-25
NL6801149A (https=) 1968-09-04

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