DE2712521C2 - - Google Patents

Info

Publication number
DE2712521C2
DE2712521C2 DE2712521A DE2712521A DE2712521C2 DE 2712521 C2 DE2712521 C2 DE 2712521C2 DE 2712521 A DE2712521 A DE 2712521A DE 2712521 A DE2712521 A DE 2712521A DE 2712521 C2 DE2712521 C2 DE 2712521C2
Authority
DE
Germany
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2712521A
Other versions
DE2712521A1 (de
Inventor
Dieter Dipl.-Chem. Dr. Regler
Bruno Meissner
Alfred 8263 Burghausen De Moritz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siltronic AG
Original Assignee
Wacker Siltronic AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Siltronic AG filed Critical Wacker Siltronic AG
Priority to DE19772712521 priority Critical patent/DE2712521A1/de
Priority to GB4251/78A priority patent/GB1554694A/en
Priority to NL7801348A priority patent/NL7801348A/xx
Priority to IT48497/78A priority patent/IT1102109B/it
Priority to FR7808275A priority patent/FR2384589A1/fr
Priority to BE186160A priority patent/BE865169A/xx
Priority to JP3283178A priority patent/JPS53146572A/ja
Publication of DE2712521A1 publication Critical patent/DE2712521A1/de
Priority to US06/073,415 priority patent/US4283242A/en
Application granted granted Critical
Publication of DE2712521C2 publication Critical patent/DE2712521C2/de
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/27—Work carriers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/34—Accessories
    • B24B37/345—Feeding, loading or unloading work specially adapted to lapping
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10S156/918—Delaminating processes adapted for specified product, e.g. delaminating medical specimen slide
    • Y10S156/93—Semiconductive product delaminating, e.g. delaminating emiconductive wafer from underlayer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
DE19772712521 1977-03-22 1977-03-22 Verfahren zum aufkitten von scheiben Granted DE2712521A1 (de)

Priority Applications (8)

Application Number Priority Date Filing Date Title
DE19772712521 DE2712521A1 (de) 1977-03-22 1977-03-22 Verfahren zum aufkitten von scheiben
GB4251/78A GB1554694A (en) 1977-03-22 1978-02-02 Cementing discs or the like to carrier plates
NL7801348A NL7801348A (nl) 1977-03-22 1978-02-06 Werkwijze voor het opbrengen door kitten van tot schijven verwerkte materialen.
IT48497/78A IT1102109B (it) 1977-03-22 1978-03-20 Procedimento ed apparecchiatura per attaccare con mastice lastre su un supporto in particolare per la levigatura
FR7808275A FR2384589A1 (fr) 1977-03-22 1978-03-22 Procede de collage au mastic de disques destines a etre polis
BE186160A BE865169A (fr) 1977-03-22 1978-03-22 Procede de collage au mastic de disques destines a etre polis
JP3283178A JPS53146572A (en) 1977-03-22 1978-03-22 Method of bonding disks
US06/073,415 US4283242A (en) 1977-03-22 1979-09-07 Process for cementing semiconductor discs onto a carrier plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772712521 DE2712521A1 (de) 1977-03-22 1977-03-22 Verfahren zum aufkitten von scheiben

Publications (2)

Publication Number Publication Date
DE2712521A1 DE2712521A1 (de) 1978-09-28
DE2712521C2 true DE2712521C2 (de) 1987-03-05

Family

ID=6004323

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19772712521 Granted DE2712521A1 (de) 1977-03-22 1977-03-22 Verfahren zum aufkitten von scheiben

Country Status (8)

Country Link
US (1) US4283242A (de)
JP (1) JPS53146572A (de)
BE (1) BE865169A (de)
DE (1) DE2712521A1 (de)
FR (1) FR2384589A1 (de)
GB (1) GB1554694A (de)
IT (1) IT1102109B (de)
NL (1) NL7801348A (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2809274A1 (de) * 1978-03-03 1979-09-13 Wacker Chemitronic Verfahren zur vergleichmaessigung des polierabtrages von scheiben beim polieren
US4316757A (en) * 1980-03-03 1982-02-23 Monsanto Company Method and apparatus for wax mounting of thin wafers for polishing
US4379018A (en) * 1981-12-17 1983-04-05 Planet Products Corporation Heat transfer apparatus
US4530138A (en) * 1982-09-30 1985-07-23 Westinghouse Electric Corp. Method of making a transducer assembly
US4466852A (en) * 1983-10-27 1984-08-21 At&T Technologies, Inc. Method and apparatus for demounting wafers
JPS61159718A (ja) * 1984-12-29 1986-07-19 株式会社村田製作所 積層セラミック電子部品の製造方法
EP0193159B1 (de) * 1985-02-07 1992-05-06 Fujitsu Limited Verfahren und Vorrichtung zum Anheften eines Streifens oder Films an eine Halbleiterscheibe
GB8527708D0 (en) * 1985-11-09 1985-12-11 Old Acre Eng Co Ltd Laminating press
US4934920A (en) * 1987-06-17 1990-06-19 Mitsubishi Denki Kabushiki Kaisha Apparatus for producing semiconductor device
JPH084105B2 (ja) * 1987-06-19 1996-01-17 株式会社エンヤシステム ウェハ接着方法
US5217563A (en) * 1988-12-01 1993-06-08 Bayer Aktiengesellschaft Apparatus for producing a deep-drawn formed plastic piece
JP2648638B2 (ja) * 1990-11-30 1997-09-03 三菱マテリアル株式会社 ウェーハの接着方法およびその装置
US5236646A (en) * 1991-02-28 1993-08-17 The United States Of America As Represented By The Secretary Of The Navy Process for preparing thermoplastic composites
US5116216A (en) * 1991-02-28 1992-05-26 The United States Of America As Represented By The Secretary Of The Navy Apparatus for preparing thermoplastic composites
JP2678161B2 (ja) * 1991-10-30 1997-11-17 九州電子金属 株式会社 半導体ウエーハの真空貼着装置
JPH0737768A (ja) * 1992-11-26 1995-02-07 Sumitomo Electric Ind Ltd 半導体ウェハの補強方法及び補強された半導体ウェハ
US5300175A (en) * 1993-01-04 1994-04-05 Motorola, Inc. Method for mounting a wafer to a submount
US5460773A (en) * 1993-08-11 1995-10-24 Fritz; Michael L. Seal for blow down platen
US6017484A (en) * 1997-01-21 2000-01-25 Harold P. Hale Method for manufacture of minimum porosity, wrinkle free composite parts
US6425812B1 (en) 1997-04-08 2002-07-30 Lam Research Corporation Polishing head for chemical mechanical polishing using linear planarization technology
US6244946B1 (en) 1997-04-08 2001-06-12 Lam Research Corporation Polishing head with removable subcarrier
US6336845B1 (en) 1997-11-12 2002-01-08 Lam Research Corporation Method and apparatus for polishing semiconductor wafers
DE19756614A1 (de) * 1997-12-18 1999-07-01 Wacker Siltronic Halbleitermat Verfahren zur Montage und Demontage einer Halbleiterscheibe, und Stoffmischung, die zur Durchführung des Verfahrens geeignet ist
JP3537688B2 (ja) * 1998-11-24 2004-06-14 富士通株式会社 磁気ヘッドの加工方法
US6431959B1 (en) * 1999-12-20 2002-08-13 Lam Research Corporation System and method of defect optimization for chemical mechanical planarization of polysilicon
US6666756B1 (en) 2000-03-31 2003-12-23 Lam Research Corporation Wafer carrier head assembly
DE10048881A1 (de) * 2000-09-29 2002-03-07 Infineon Technologies Ag Vorrichtung und Verfahren zum planen Verbinden zweier Wafer für ein Dünnschleifen und ein Trennen eines Produkt-Wafers
DE10054159A1 (de) * 2000-11-02 2002-05-16 Wacker Siltronic Halbleitermat Verfahren zur Montage von Halbleiterscheiben
US7239902B2 (en) * 2001-03-16 2007-07-03 Nellor Puritan Bennett Incorporated Device and method for monitoring body fluid and electrolyte disorders
DE102005006052A1 (de) * 2004-12-21 2006-07-06 Osram Opto Semiconductors Gmbh Linse, Laseranordnung und Verfahren zur Herstellung einer Laseranordnung
JP5895676B2 (ja) * 2012-04-09 2016-03-30 三菱電機株式会社 半導体装置の製造方法
CN108025587B (zh) * 2015-09-18 2020-11-17 本田技研工业株式会社 粘贴装置和粘贴方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB316134A (de) * 1928-07-23 1930-10-06 Paul Pick
US3041800A (en) * 1960-05-04 1962-07-03 Roy O Heisel Apparatus for shaping crystals
US3322598A (en) * 1963-10-02 1967-05-30 Alvin M Marks Laminator for securing continuous flexible film to a base
US3405019A (en) * 1965-07-30 1968-10-08 Mc Donnell Douglas Corp Vacuum bonding process
DE1577469A1 (de) * 1966-05-24 1970-05-06 Siemens Ag Verfahren zum Herstellen von Halbleiterscheiben gleichmaessiger Dicke durch mechanische Oberflaechenbearbeitung
US3453783A (en) * 1966-06-30 1969-07-08 Texas Instruments Inc Apparatus for holding silicon slices
US3453166A (en) * 1966-10-11 1969-07-01 Bell Telephone Labor Inc Method and apparatus for bonding transducer elements
US3493451A (en) * 1966-11-02 1970-02-03 Boeing Co Vacuum press and method of laminating therewith
US3475867A (en) * 1966-12-20 1969-11-04 Monsanto Co Processing of semiconductor wafers
DE1652170B2 (de) * 1967-03-03 1975-05-22 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum gleichzeitigen stirnseitigen Abarbeiten gleichdicker Werkstoffschichten an mehreren unterschiedlich dicken Halbleiterscheiben
US3492763A (en) * 1967-09-18 1970-02-03 Monsanto Co Method and apparatus for mounting semiconductor slices
US3597081A (en) * 1967-11-02 1971-08-03 Continental Device Corp Vacuum masking system and method
US3554834A (en) * 1968-07-24 1971-01-12 Corning Glass Works Decal applying
US3681171A (en) * 1968-08-23 1972-08-01 Hitachi Ltd Apparatus for producing a multilayer printed circuit plate assembly
JPS495570A (de) * 1972-05-02 1974-01-18
JPS4937278A (de) * 1972-08-14 1974-04-06
US3888053A (en) * 1973-05-29 1975-06-10 Rca Corp Method of shaping semiconductor workpiece
US4104099A (en) * 1977-01-27 1978-08-01 International Telephone And Telegraph Corporation Method and apparatus for lapping or polishing materials

Also Published As

Publication number Publication date
JPS53146572A (en) 1978-12-20
FR2384589A1 (fr) 1978-10-20
IT7848497A0 (it) 1978-03-20
FR2384589B1 (de) 1980-08-29
GB1554694A (en) 1979-10-24
DE2712521A1 (de) 1978-09-28
NL7801348A (nl) 1978-09-26
IT1102109B (it) 1985-10-07
BE865169A (fr) 1978-09-22
US4283242A (en) 1981-08-11

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee