GB1120989A - A method of and apparatus for masking the surface of a substrate - Google Patents
A method of and apparatus for masking the surface of a substrateInfo
- Publication number
- GB1120989A GB1120989A GB346067A GB346067A GB1120989A GB 1120989 A GB1120989 A GB 1120989A GB 346067 A GB346067 A GB 346067A GB 346067 A GB346067 A GB 346067A GB 1120989 A GB1120989 A GB 1120989A
- Authority
- GB
- United Kingdom
- Prior art keywords
- substrate
- depositing
- masking
- getter material
- getter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
A substrate is formed with a pattern of e.g. a semi-conductor material, by depositing a getter material 5, e.g. Ba, Ca, Mg, Na or P, on the substrate, removing parts of the getter material by heating with e.g. a laser beam 8 outside the vacuum chamber or an electron beam within the chamber, depositing the material 11, exposing the getter material to the air to form the oxide, and removing <PICT:1120989/C6-C7/1> it with the material 11 deposited thereon by washing in water or a weak acid.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB346067A GB1120989A (en) | 1967-01-24 | 1967-01-24 | A method of and apparatus for masking the surface of a substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB346067A GB1120989A (en) | 1967-01-24 | 1967-01-24 | A method of and apparatus for masking the surface of a substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1120989A true GB1120989A (en) | 1968-07-24 |
Family
ID=9758749
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB346067A Expired GB1120989A (en) | 1967-01-24 | 1967-01-24 | A method of and apparatus for masking the surface of a substrate |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB1120989A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4022928A (en) * | 1975-05-22 | 1977-05-10 | Piwcyzk Bernhard P | Vacuum deposition methods and masking structure |
-
1967
- 1967-01-24 GB GB346067A patent/GB1120989A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4022928A (en) * | 1975-05-22 | 1977-05-10 | Piwcyzk Bernhard P | Vacuum deposition methods and masking structure |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1186930A (en) | Masking Process for Microcircuit Manufacture | |
FR2083740A5 (en) | Laser applied surface film | |
GB1120989A (en) | A method of and apparatus for masking the surface of a substrate | |
BE800393A (en) | METHOD FOR MANUFACTURING SILICON ELECTRON EMITTERS WITH EFFECTIVE NEGATIVE ELECTRONIC AFFINITY | |
JPS5248468A (en) | Process for production of semiconductor device | |
GB841843A (en) | Improvements in or relating to the formation of a layer of material exhibiting the photo-conductive effect | |
JPS5743420A (en) | Mask alignment method | |
JPS55147628A (en) | Mask base material | |
JPS5615045A (en) | Formation of pattern | |
JPS5596681A (en) | Method of fabricating semiconductor device | |
JPS5633818A (en) | Method for ion implantation | |
GB969065A (en) | Improvements in or relating to deposition of thin films | |
JPS56130924A (en) | Manufacture of semiconductor device | |
JPS57112025A (en) | Formation of pattern | |
GB1055012A (en) | Improvements in or relating to methods of manufacturing an article having a surface pattern | |
GB1398976A (en) | Methods of forming evaporated layers | |
JPS5745234A (en) | Method for formation of microscopic pattern | |
DE2236918B2 (en) | Photocathode mask - comprising patterned silicon layer on, eg quartz, with photocathode material on top | |
FR2156511A1 (en) | Semiconductor doping - process - by ion bombardment of dopant coating on semiconductor wafer | |
JPS51117871A (en) | Semiconductor substrate processing method | |
JPS5617348A (en) | Exposing method | |
JPS56101745A (en) | Formation of microminiature electrode | |
JPS51147953A (en) | Method of manufacturing cathode ray tube | |
JPS5357974A (en) | Electron beam exposure method | |
GB1525936A (en) | Transistor and integrated circuit manufacture |