GB1120989A - A method of and apparatus for masking the surface of a substrate - Google Patents

A method of and apparatus for masking the surface of a substrate

Info

Publication number
GB1120989A
GB1120989A GB346067A GB346067A GB1120989A GB 1120989 A GB1120989 A GB 1120989A GB 346067 A GB346067 A GB 346067A GB 346067 A GB346067 A GB 346067A GB 1120989 A GB1120989 A GB 1120989A
Authority
GB
United Kingdom
Prior art keywords
substrate
depositing
masking
getter material
getter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB346067A
Inventor
Alan Douglas Brisbane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STC PLC
Original Assignee
Standard Telephone and Cables PLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Standard Telephone and Cables PLC filed Critical Standard Telephone and Cables PLC
Priority to GB346067A priority Critical patent/GB1120989A/en
Publication of GB1120989A publication Critical patent/GB1120989A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

A substrate is formed with a pattern of e.g. a semi-conductor material, by depositing a getter material 5, e.g. Ba, Ca, Mg, Na or P, on the substrate, removing parts of the getter material by heating with e.g. a laser beam 8 outside the vacuum chamber or an electron beam within the chamber, depositing the material 11, exposing the getter material to the air to form the oxide, and removing <PICT:1120989/C6-C7/1> it with the material 11 deposited thereon by washing in water or a weak acid.
GB346067A 1967-01-24 1967-01-24 A method of and apparatus for masking the surface of a substrate Expired GB1120989A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB346067A GB1120989A (en) 1967-01-24 1967-01-24 A method of and apparatus for masking the surface of a substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB346067A GB1120989A (en) 1967-01-24 1967-01-24 A method of and apparatus for masking the surface of a substrate

Publications (1)

Publication Number Publication Date
GB1120989A true GB1120989A (en) 1968-07-24

Family

ID=9758749

Family Applications (1)

Application Number Title Priority Date Filing Date
GB346067A Expired GB1120989A (en) 1967-01-24 1967-01-24 A method of and apparatus for masking the surface of a substrate

Country Status (1)

Country Link
GB (1) GB1120989A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4022928A (en) * 1975-05-22 1977-05-10 Piwcyzk Bernhard P Vacuum deposition methods and masking structure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4022928A (en) * 1975-05-22 1977-05-10 Piwcyzk Bernhard P Vacuum deposition methods and masking structure

Similar Documents

Publication Publication Date Title
GB1186930A (en) Masking Process for Microcircuit Manufacture
FR2083740A5 (en) Laser applied surface film
GB1120989A (en) A method of and apparatus for masking the surface of a substrate
BE800393A (en) METHOD FOR MANUFACTURING SILICON ELECTRON EMITTERS WITH EFFECTIVE NEGATIVE ELECTRONIC AFFINITY
JPS5248468A (en) Process for production of semiconductor device
GB841843A (en) Improvements in or relating to the formation of a layer of material exhibiting the photo-conductive effect
JPS5743420A (en) Mask alignment method
JPS55147628A (en) Mask base material
JPS5615045A (en) Formation of pattern
JPS5596681A (en) Method of fabricating semiconductor device
JPS5633818A (en) Method for ion implantation
GB969065A (en) Improvements in or relating to deposition of thin films
JPS56130924A (en) Manufacture of semiconductor device
JPS57112025A (en) Formation of pattern
GB1055012A (en) Improvements in or relating to methods of manufacturing an article having a surface pattern
GB1398976A (en) Methods of forming evaporated layers
JPS5745234A (en) Method for formation of microscopic pattern
DE2236918B2 (en) Photocathode mask - comprising patterned silicon layer on, eg quartz, with photocathode material on top
FR2156511A1 (en) Semiconductor doping - process - by ion bombardment of dopant coating on semiconductor wafer
JPS51117871A (en) Semiconductor substrate processing method
JPS5617348A (en) Exposing method
JPS56101745A (en) Formation of microminiature electrode
JPS51147953A (en) Method of manufacturing cathode ray tube
JPS5357974A (en) Electron beam exposure method
GB1525936A (en) Transistor and integrated circuit manufacture