GB1063306A - Process for coating high temperature metals and alloys - Google Patents
Process for coating high temperature metals and alloysInfo
- Publication number
- GB1063306A GB1063306A GB35034/63A GB3503463A GB1063306A GB 1063306 A GB1063306 A GB 1063306A GB 35034/63 A GB35034/63 A GB 35034/63A GB 3503463 A GB3503463 A GB 3503463A GB 1063306 A GB1063306 A GB 1063306A
- Authority
- GB
- United Kingdom
- Prior art keywords
- base
- nitrogen
- nickel
- alloys
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910045601 alloy Inorganic materials 0.000 title abstract 4
- 239000000956 alloy Substances 0.000 title abstract 4
- 239000011248 coating agent Substances 0.000 title abstract 4
- 238000000576 coating method Methods 0.000 title abstract 4
- 229910052751 metal Inorganic materials 0.000 title 1
- 239000002184 metal Substances 0.000 title 1
- 150000002739 metals Chemical class 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract 8
- 239000011651 chromium Substances 0.000 abstract 4
- 239000010955 niobium Substances 0.000 abstract 4
- 229910052757 nitrogen Inorganic materials 0.000 abstract 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract 3
- 229910052581 Si3N4 Inorganic materials 0.000 abstract 3
- 229910052758 niobium Inorganic materials 0.000 abstract 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 abstract 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract 3
- 229910000990 Ni alloy Inorganic materials 0.000 abstract 2
- 229910017052 cobalt Inorganic materials 0.000 abstract 2
- 239000010941 cobalt Substances 0.000 abstract 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 abstract 2
- 229910052759 nickel Inorganic materials 0.000 abstract 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract 1
- 229910000531 Co alloy Inorganic materials 0.000 abstract 1
- 229910021529 ammonia Inorganic materials 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 239000008246 gaseous mixture Substances 0.000 abstract 1
- 229910002804 graphite Inorganic materials 0.000 abstract 1
- 239000010439 graphite Substances 0.000 abstract 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract 1
- 229910052753 mercury Inorganic materials 0.000 abstract 1
- 229910000753 refractory alloy Inorganic materials 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
- -1 silicon halide Chemical class 0.000 abstract 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/345—Silicon nitride
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Abstract
Cobalt, nickel and niobium base alloys are coated with silicon nitride. Examples are (parts % by weight) Nb base, Zr 1; Ni base, Cr 15.5, Fe 8; Ni base, Cr 19.5, Mo 4.25, Ti 3, Al 1.4, B 0.005, Zr 0.085; Co base, Cr 21, Fe 2, W 11, Nb 2.ALSO:A nickel, cobalt or niobium base refractory alloy is coated with silicon nitride by contacting the alloy, at a temperature between 875 DEG C. and 1200 DEG C., with a gaseous mixture comprising a silicon halide and nitrogen, and then replacing the nitrogen with ammonia. In an example, a niobium base alloy strip is placed in a graphite cylinder into which nitrogen and silicon tetrafluoride are simultaneously introduced, whilst heating to 1010 DEG C. at a pressure of 2 mms. of mercury. After several hours, the nitrogen is replaced by anhydrous ammonia and a further silicon nitride coating is deposited. The nickel alloy may be chromium plated. When coating nickel and cobalt alloys, they may first be given an oxide coating by heating in air at 850 DEG C. to 950 DEG C.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US222663A US3200015A (en) | 1962-09-10 | 1962-09-10 | Process for coating high temperature alloys |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1063306A true GB1063306A (en) | 1967-03-30 |
Family
ID=22833177
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB35034/63A Expired GB1063306A (en) | 1962-09-10 | 1963-09-05 | Process for coating high temperature metals and alloys |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3200015A (en) |
| CH (1) | CH450104A (en) |
| DE (1) | DE1546051B2 (en) |
| GB (1) | GB1063306A (en) |
| SE (1) | SE313229B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4089992A (en) * | 1965-10-11 | 1978-05-16 | International Business Machines Corporation | Method for depositing continuous pinhole free silicon nitride films and products produced thereby |
| US3472689A (en) * | 1967-01-19 | 1969-10-14 | Rca Corp | Vapor deposition of silicon-nitrogen insulating coatings |
| US3520722A (en) * | 1967-05-10 | 1970-07-14 | Rca Corp | Fabrication of semiconductive devices with silicon nitride coatings |
| US3787223A (en) * | 1968-10-16 | 1974-01-22 | Texas Instruments Inc | Chemical vapor deposition coatings on titanium |
| NL7209294A (en) * | 1972-07-01 | 1974-01-03 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US448915A (en) * | 1891-03-24 | Georg erlwein | ||
| FR1142646A (en) * | 1956-02-11 | 1957-09-20 | Cedel | New electrical resistors and their production methods |
| US3073717A (en) * | 1958-12-31 | 1963-01-15 | Robert J Pyle | Coated carbon element for use in nuclear reactors and the process of making the element |
| US3095527A (en) * | 1959-08-31 | 1963-06-25 | Charles R Barnes | Electrical capacitor having a silicon nitride dielectric |
-
1962
- 1962-09-10 US US222663A patent/US3200015A/en not_active Expired - Lifetime
-
1963
- 1963-09-02 DE DE19631546051 patent/DE1546051B2/en not_active Withdrawn
- 1963-09-04 CH CH1093463A patent/CH450104A/en unknown
- 1963-09-05 GB GB35034/63A patent/GB1063306A/en not_active Expired
- 1963-09-10 SE SE9881/63A patent/SE313229B/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| DE1546051B2 (en) | 1971-06-09 |
| SE313229B (en) | 1969-08-04 |
| US3200015A (en) | 1965-08-10 |
| DE1546051A1 (en) | 1969-10-23 |
| CH450104A (en) | 1968-01-15 |
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