FR3110026B1 - Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée - Google Patents

Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée Download PDF

Info

Publication number
FR3110026B1
FR3110026B1 FR2004444A FR2004444A FR3110026B1 FR 3110026 B1 FR3110026 B1 FR 3110026B1 FR 2004444 A FR2004444 A FR 2004444A FR 2004444 A FR2004444 A FR 2004444A FR 3110026 B1 FR3110026 B1 FR 3110026B1
Authority
FR
France
Prior art keywords
electrons
pulsed source
pulsed
source
monochromatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR2004444A
Other languages
English (en)
French (fr)
Other versions
FR3110026A1 (fr
Inventor
Daniel Comparat
Nicholas Barrett
Lionel Amiaud
Yan Picard
Anne Lafosse
Raphaël Hahn
Olena Fedchenko
Gerd Schoenhense
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Universite Paris Saclay
Original Assignee
Centre National de la Recherche Scientifique CNRS
Commissariat a lEnergie Atomique CEA
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Universite Paris Saclay
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS, Commissariat a lEnergie Atomique CEA, Commissariat a lEnergie Atomique et aux Energies Alternatives CEA, Universite Paris Saclay filed Critical Centre National de la Recherche Scientifique CNRS
Priority to FR2004444A priority Critical patent/FR3110026B1/fr
Priority to JP2022563144A priority patent/JP7645906B2/ja
Priority to PCT/EP2021/061068 priority patent/WO2021224079A1/fr
Priority to EP21720785.1A priority patent/EP4147263A1/fr
Priority to US17/921,587 priority patent/US12387901B2/en
Publication of FR3110026A1 publication Critical patent/FR3110026A1/fr
Application granted granted Critical
Publication of FR3110026B1 publication Critical patent/FR3110026B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/29—Reflection microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06333—Photo emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06341—Field emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/083—Beam forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24475—Scattered electron detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/262—Non-scanning techniques
    • H01J2237/2623—Field-emission microscopes
    • H01J2237/2626—Pulsed source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
FR2004444A 2020-05-05 2020-05-05 Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée Active FR3110026B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR2004444A FR3110026B1 (fr) 2020-05-05 2020-05-05 Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée
JP2022563144A JP7645906B2 (ja) 2020-05-05 2021-04-28 パルス電子供給源を備えた表面分析システム
PCT/EP2021/061068 WO2021224079A1 (fr) 2020-05-05 2021-04-28 Systeme d'analyse de surface comprenant une source pulsee d'electrons
EP21720785.1A EP4147263A1 (fr) 2020-05-05 2021-04-28 Systeme d'analyse de surface comprenant une source pulsee d'electrons
US17/921,587 US12387901B2 (en) 2020-05-05 2021-04-28 Surface analysis system comprising a pulsed electron source

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR2004444A FR3110026B1 (fr) 2020-05-05 2020-05-05 Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée
FR2004444 2020-05-05

Publications (2)

Publication Number Publication Date
FR3110026A1 FR3110026A1 (fr) 2021-11-12
FR3110026B1 true FR3110026B1 (fr) 2022-06-10

Family

ID=72470444

Family Applications (1)

Application Number Title Priority Date Filing Date
FR2004444A Active FR3110026B1 (fr) 2020-05-05 2020-05-05 Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée

Country Status (5)

Country Link
US (1) US12387901B2 (https=)
EP (1) EP4147263A1 (https=)
JP (1) JP7645906B2 (https=)
FR (1) FR3110026B1 (https=)
WO (1) WO2021224079A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3110026B1 (fr) * 2020-05-05 2022-06-10 Commissariat Energie Atomique Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4414509A (en) * 1980-11-26 1983-11-08 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Low energy electron magnetometer using a monoenergetic electron beam
FR2643507A1 (fr) * 1989-02-21 1990-08-24 Thomson Tubes Electroniques Canon a electrons a faisceau electronique module par un dispositif optique
DE3918249C1 (https=) * 1989-06-05 1990-09-13 Forschungszentrum Juelich Gmbh, 5170 Juelich, De
US5973323A (en) * 1997-11-05 1999-10-26 Kla-Tencor Corporation Apparatus and method for secondary electron emission microscope
JP3441955B2 (ja) * 1998-02-23 2003-09-02 株式会社日立製作所 投射方式の荷電粒子顕微鏡および基板検査システム
US6586733B1 (en) * 1999-05-25 2003-07-01 Kla-Tencor Apparatus and methods for secondary electron emission microscope with dual beam
US6610980B2 (en) * 2000-05-15 2003-08-26 Kla-Tencor Corporation Apparatus for inspection of semiconductor wafers and masks using a low energy electron microscope with two illuminating beams
DE10235456B4 (de) * 2002-08-02 2008-07-10 Leo Elektronenmikroskopie Gmbh Elektronenmikroskopiesystem
DE10301579A1 (de) * 2003-01-16 2004-07-29 Leo Elektronenmikroskopie Gmbh Elektronenstrahlgerät und Detektoranordnung
US6803571B1 (en) * 2003-06-26 2004-10-12 Kla-Tencor Technologies Corporation Method and apparatus for dual-energy e-beam inspector
US6878937B1 (en) * 2004-02-10 2005-04-12 Kla-Tencor Technologies Corporation Prism array for electron beam inspection and defect review
US7453062B2 (en) * 2006-02-28 2008-11-18 International Business Machines Corporation Energy-filtering cathode lens microscopy instrument
US7755069B2 (en) * 2006-05-16 2010-07-13 The Regents Of The University Of California Ultra-bright pulsed electron beam with low longitudinal emittance
WO2008010777A1 (en) * 2006-07-21 2008-01-24 National University Of Singapore A multi-beam ion/electron spectra-microscope
DE102006043895B9 (de) * 2006-09-19 2012-02-09 Carl Zeiss Nts Gmbh Elektronenmikroskop zum Inspizieren und Bearbeiten eines Objekts mit miniaturisierten Strukturen
JP4597207B2 (ja) * 2008-03-31 2010-12-15 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
US10755892B2 (en) * 2018-05-23 2020-08-25 Kla-Tencor Corporation Reflection-mode electron-beam inspection using ptychographic imaging
DE102019107327A1 (de) * 2019-03-21 2020-09-24 Specs Surface Nano Analysis Gmbh Vorrichtung und Verfahren zum Elektronentransfer von einer Probe zu einem Energieanalysator und Elektronen-Spektrometervorrichtung
US11101102B2 (en) * 2019-08-28 2021-08-24 The Board Of Trustees Of The Leland Stanford Junior University Photoabsorption microscopy using electron analysis
FR3110026B1 (fr) * 2020-05-05 2022-06-10 Commissariat Energie Atomique Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée

Also Published As

Publication number Publication date
JP2023523705A (ja) 2023-06-07
JP7645906B2 (ja) 2025-03-14
FR3110026A1 (fr) 2021-11-12
US20230170176A1 (en) 2023-06-01
US12387901B2 (en) 2025-08-12
EP4147263A1 (fr) 2023-03-15
WO2021224079A1 (fr) 2021-11-11

Similar Documents

Publication Publication Date Title
US8097830B2 (en) Method for material processing and/or material analysis using lasers
JP4509154B2 (ja) 光照射装置、微粒子解析装置及び光照射方法
TW200506316A (en) Displacement gauge and displacement measuring method
WO1995021393A3 (de) Vorrichtung und verfahren zum optischen messen eines probenpunktes einer probe mit hoher ortsauflösung
JP2002530671A (ja) 放物状のｘ線ミラーと水晶モノクロメータを含むｘ線分析装置
FR3110026B1 (fr) Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée
JPH1078390A (ja) 表面プラズモンセンサー
US20040222196A1 (en) Device for laser drilling
JP2008256585A (ja) 元素分析装置および元素分析方法
RU2081403C1 (ru) Измерительный датчик для портативного анализатора оптической эмиссии
JP2915294B2 (ja) 金属材料表面の塗油量測定方法および装置
FR3085756B1 (fr) Systeme de mesure de l'absorption d'un rayonnement laser d'un echantillon
US11733264B2 (en) Cantilever, scanning probe microscope, and measurement method using scanning probe microscope
JP2000055809A (ja) 顕微ラマン分光装置及び顕微ラマン分光測定方法
CN219391871U (zh) 用于检测样品的分析系统
US3376415A (en) X-ray spectrometer with means to vary the spacing of the atomic planes in the analyzing piezoelectric crystal
JP2006105599A (ja) 温度測定方法、温度応力測定方法、高温時応力測定方法、温度測定装置、温度応力測定装置、及び高温時応力測定装置
KR102295280B1 (ko) Libs 측정이 가능한 고분해능 레이저 가공장치
EP1677093A3 (en) Near-field film-thickness measurement apparatus
JP2018054353A (ja) 近接場顕微鏡
US20150279645A1 (en) Mass spectroscope and mass spectrometry
JP2917475B2 (ja) Ｘ線分析装置
JPH06241999A (ja) 二段励起法を用いたレーザ発光分光分析方法
JPH0835934A (ja) 試料の内部欠陥評価装置
JP4639971B2 (ja) Ｘ線分析装置

Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 2

PLSC Publication of the preliminary search report

Effective date: 20211112

CA Change of address

Effective date: 20211209

PLFP Fee payment

Year of fee payment: 3

PLFP Fee payment

Year of fee payment: 4

PLFP Fee payment

Year of fee payment: 5

PLFP Fee payment

Year of fee payment: 6