JP7645906B2 - パルス電子供給源を備えた表面分析システム - Google Patents

パルス電子供給源を備えた表面分析システム Download PDF

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Publication number
JP7645906B2
JP7645906B2 JP2022563144A JP2022563144A JP7645906B2 JP 7645906 B2 JP7645906 B2 JP 7645906B2 JP 2022563144 A JP2022563144 A JP 2022563144A JP 2022563144 A JP2022563144 A JP 2022563144A JP 7645906 B2 JP7645906 B2 JP 7645906B2
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Prior art keywords
electron
surface analysis
pulsed
electrons
performing surface
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JP2022563144A
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Japanese (ja)
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JP2023523705A (ja
JP2023523705A5 (https=
Inventor
コンパラ，ダニエル
バレット，ニコラ
アミオー，リオネル
ピカール，ヤン
ラフォッス，アンヌ
アーン，ラファエル
フェドチェンコ，オレーナ
ショーエンヘンゼ，ゲルト
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Centre National de la Recherche Scientifique CNRS
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Centre National de la Recherche Scientifique CNRS
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical, image processing or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/29—Reflection microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06333—Photo emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06341—Field emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/083—Beam forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24475—Scattered electron detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/262—Non-scanning techniques
    • H01J2237/2623—Field-emission microscopes
    • H01J2237/2626—Pulsed source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2022563144A 2020-05-05 2021-04-28 パルス電子供給源を備えた表面分析システム Active JP7645906B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR2004444A FR3110026B1 (fr) 2020-05-05 2020-05-05 Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée
FR2004444 2020-05-05
PCT/EP2021/061068 WO2021224079A1 (fr) 2020-05-05 2021-04-28 Systeme d'analyse de surface comprenant une source pulsee d'electrons

Publications (3)

Publication Number Publication Date
JP2023523705A JP2023523705A (ja) 2023-06-07
JP2023523705A5 JP2023523705A5 (https=) 2025-02-17
JP7645906B2 true JP7645906B2 (ja) 2025-03-14

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JP2022563144A Active JP7645906B2 (ja) 2020-05-05 2021-04-28 パルス電子供給源を備えた表面分析システム

Country Status (5)

Country Link
US (1) US12387901B2 (https=)
EP (1) EP4147263A1 (https=)
JP (1) JP7645906B2 (https=)
FR (1) FR3110026B1 (https=)
WO (1) WO2021224079A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3110026B1 (fr) * 2020-05-05 2022-06-10 Commissariat Energie Atomique Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080173829A1 (en) 2006-05-16 2008-07-24 Max Zolotorev Ultra - bright pulsed electron beam with low longitudinal emittance

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US4414509A (en) * 1980-11-26 1983-11-08 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Low energy electron magnetometer using a monoenergetic electron beam
FR2643507A1 (fr) * 1989-02-21 1990-08-24 Thomson Tubes Electroniques Canon a electrons a faisceau electronique module par un dispositif optique
DE3918249C1 (https=) * 1989-06-05 1990-09-13 Forschungszentrum Juelich Gmbh, 5170 Juelich, De
US5973323A (en) * 1997-11-05 1999-10-26 Kla-Tencor Corporation Apparatus and method for secondary electron emission microscope
JP3441955B2 (ja) * 1998-02-23 2003-09-02 株式会社日立製作所 投射方式の荷電粒子顕微鏡および基板検査システム
US6586733B1 (en) * 1999-05-25 2003-07-01 Kla-Tencor Apparatus and methods for secondary electron emission microscope with dual beam
US6610980B2 (en) * 2000-05-15 2003-08-26 Kla-Tencor Corporation Apparatus for inspection of semiconductor wafers and masks using a low energy electron microscope with two illuminating beams
DE10235456B4 (de) * 2002-08-02 2008-07-10 Leo Elektronenmikroskopie Gmbh Elektronenmikroskopiesystem
DE10301579A1 (de) * 2003-01-16 2004-07-29 Leo Elektronenmikroskopie Gmbh Elektronenstrahlgerät und Detektoranordnung
US6803571B1 (en) * 2003-06-26 2004-10-12 Kla-Tencor Technologies Corporation Method and apparatus for dual-energy e-beam inspector
US6878937B1 (en) * 2004-02-10 2005-04-12 Kla-Tencor Technologies Corporation Prism array for electron beam inspection and defect review
US7453062B2 (en) * 2006-02-28 2008-11-18 International Business Machines Corporation Energy-filtering cathode lens microscopy instrument
WO2008010777A1 (en) * 2006-07-21 2008-01-24 National University Of Singapore A multi-beam ion/electron spectra-microscope
DE102006043895B9 (de) * 2006-09-19 2012-02-09 Carl Zeiss Nts Gmbh Elektronenmikroskop zum Inspizieren und Bearbeiten eines Objekts mit miniaturisierten Strukturen
JP4597207B2 (ja) * 2008-03-31 2010-12-15 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
US10755892B2 (en) * 2018-05-23 2020-08-25 Kla-Tencor Corporation Reflection-mode electron-beam inspection using ptychographic imaging
DE102019107327A1 (de) * 2019-03-21 2020-09-24 Specs Surface Nano Analysis Gmbh Vorrichtung und Verfahren zum Elektronentransfer von einer Probe zu einem Energieanalysator und Elektronen-Spektrometervorrichtung
US11101102B2 (en) * 2019-08-28 2021-08-24 The Board Of Trustees Of The Leland Stanford Junior University Photoabsorption microscopy using electron analysis
FR3110026B1 (fr) * 2020-05-05 2022-06-10 Commissariat Energie Atomique Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080173829A1 (en) 2006-05-16 2008-07-24 Max Zolotorev Ultra - bright pulsed electron beam with low longitudinal emittance

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
E. Moufarej et al.，Forced field ionization of Rydberg states for the production of monochromatic beams，PHYSICAL REVIEW A，American Physical Society，2017年04月10日，Volume 95，043409，https://doi.org/10.1103/PhysRevA.95.043409
Marian Mankos et al.，Design for a high resolution electron energy loss microscope，Ultramicroscopy ，ELSEVIER，2019年10月01日，Volume 207，112848，https://doi.org/10.1016/j.ultramic.2019.112848
Michael G. Littman et al.，Field- Ionization Processes in Excited Atoms，PHYSICAL REVIEW LETTERS，American Physical Society，1978年07月10日，Volume 41，pages 103-107，https://doi.org/10.1103/PhysRevLett.41.103

Also Published As

Publication number Publication date
JP2023523705A (ja) 2023-06-07
FR3110026B1 (fr) 2022-06-10
FR3110026A1 (fr) 2021-11-12
US20230170176A1 (en) 2023-06-01
US12387901B2 (en) 2025-08-12
EP4147263A1 (fr) 2023-03-15
WO2021224079A1 (fr) 2021-11-11

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