JP2023523705A5 - - Google Patents

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Publication number
JP2023523705A5
JP2023523705A5 JP2022563144A JP2022563144A JP2023523705A5 JP 2023523705 A5 JP2023523705 A5 JP 2023523705A5 JP 2022563144 A JP2022563144 A JP 2022563144A JP 2022563144 A JP2022563144 A JP 2022563144A JP 2023523705 A5 JP2023523705 A5 JP 2023523705A5
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JP
Japan
Prior art keywords
lens
diffraction
plane
prism
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022563144A
Other languages
English (en)
Japanese (ja)
Other versions
JP2023523705A (ja
JP7645906B2 (ja
Filing date
Publication date
Priority claimed from FR2004444A external-priority patent/FR3110026B1/fr
Application filed filed Critical
Publication of JP2023523705A publication Critical patent/JP2023523705A/ja
Publication of JP2023523705A5 publication Critical patent/JP2023523705A5/ja
Application granted granted Critical
Publication of JP7645906B2 publication Critical patent/JP7645906B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2022563144A 2020-05-05 2021-04-28 パルス電子供給源を備えた表面分析システム Active JP7645906B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR2004444A FR3110026B1 (fr) 2020-05-05 2020-05-05 Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée
FR2004444 2020-05-05
PCT/EP2021/061068 WO2021224079A1 (fr) 2020-05-05 2021-04-28 Systeme d'analyse de surface comprenant une source pulsee d'electrons

Publications (3)

Publication Number Publication Date
JP2023523705A JP2023523705A (ja) 2023-06-07
JP2023523705A5 true JP2023523705A5 (https=) 2025-02-17
JP7645906B2 JP7645906B2 (ja) 2025-03-14

Family

ID=72470444

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022563144A Active JP7645906B2 (ja) 2020-05-05 2021-04-28 パルス電子供給源を備えた表面分析システム

Country Status (5)

Country Link
US (1) US12387901B2 (https=)
EP (1) EP4147263A1 (https=)
JP (1) JP7645906B2 (https=)
FR (1) FR3110026B1 (https=)
WO (1) WO2021224079A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3110026B1 (fr) * 2020-05-05 2022-06-10 Commissariat Energie Atomique Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4414509A (en) * 1980-11-26 1983-11-08 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Low energy electron magnetometer using a monoenergetic electron beam
FR2643507A1 (fr) * 1989-02-21 1990-08-24 Thomson Tubes Electroniques Canon a electrons a faisceau electronique module par un dispositif optique
DE3918249C1 (https=) * 1989-06-05 1990-09-13 Forschungszentrum Juelich Gmbh, 5170 Juelich, De
US5973323A (en) * 1997-11-05 1999-10-26 Kla-Tencor Corporation Apparatus and method for secondary electron emission microscope
JP3441955B2 (ja) * 1998-02-23 2003-09-02 株式会社日立製作所 投射方式の荷電粒子顕微鏡および基板検査システム
US6586733B1 (en) * 1999-05-25 2003-07-01 Kla-Tencor Apparatus and methods for secondary electron emission microscope with dual beam
US6610980B2 (en) * 2000-05-15 2003-08-26 Kla-Tencor Corporation Apparatus for inspection of semiconductor wafers and masks using a low energy electron microscope with two illuminating beams
DE10235456B4 (de) * 2002-08-02 2008-07-10 Leo Elektronenmikroskopie Gmbh Elektronenmikroskopiesystem
DE10301579A1 (de) * 2003-01-16 2004-07-29 Leo Elektronenmikroskopie Gmbh Elektronenstrahlgerät und Detektoranordnung
US6803571B1 (en) * 2003-06-26 2004-10-12 Kla-Tencor Technologies Corporation Method and apparatus for dual-energy e-beam inspector
US6878937B1 (en) * 2004-02-10 2005-04-12 Kla-Tencor Technologies Corporation Prism array for electron beam inspection and defect review
US7453062B2 (en) * 2006-02-28 2008-11-18 International Business Machines Corporation Energy-filtering cathode lens microscopy instrument
US7755069B2 (en) * 2006-05-16 2010-07-13 The Regents Of The University Of California Ultra-bright pulsed electron beam with low longitudinal emittance
WO2008010777A1 (en) * 2006-07-21 2008-01-24 National University Of Singapore A multi-beam ion/electron spectra-microscope
DE102006043895B9 (de) * 2006-09-19 2012-02-09 Carl Zeiss Nts Gmbh Elektronenmikroskop zum Inspizieren und Bearbeiten eines Objekts mit miniaturisierten Strukturen
JP4597207B2 (ja) * 2008-03-31 2010-12-15 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
US10755892B2 (en) * 2018-05-23 2020-08-25 Kla-Tencor Corporation Reflection-mode electron-beam inspection using ptychographic imaging
DE102019107327A1 (de) * 2019-03-21 2020-09-24 Specs Surface Nano Analysis Gmbh Vorrichtung und Verfahren zum Elektronentransfer von einer Probe zu einem Energieanalysator und Elektronen-Spektrometervorrichtung
US11101102B2 (en) * 2019-08-28 2021-08-24 The Board Of Trustees Of The Leland Stanford Junior University Photoabsorption microscopy using electron analysis
FR3110026B1 (fr) * 2020-05-05 2022-06-10 Commissariat Energie Atomique Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée

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