FR3110026B1 - Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée - Google Patents

Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée Download PDF

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Publication number
FR3110026B1
FR3110026B1 FR2004444A FR2004444A FR3110026B1 FR 3110026 B1 FR3110026 B1 FR 3110026B1 FR 2004444 A FR2004444 A FR 2004444A FR 2004444 A FR2004444 A FR 2004444A FR 3110026 B1 FR3110026 B1 FR 3110026B1
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FR
France
Prior art keywords
electrons
pulsed source
pulsed
source
monochromatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
FR2004444A
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English (en)
Other versions
FR3110026A1 (fr
Inventor
Daniel Comparat
Nicholas Barrett
Lionel Amiaud
Yan Picard
Anne Lafosse
Raphaël Hahn
Olena Fedchenko
Gerd Schoenhense
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Universite Paris Saclay
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Centre National de la Recherche Scientifique CNRS
Commissariat a lEnergie Atomique CEA
Universite Paris Saclay
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Centre National de la Recherche Scientifique CNRS, Commissariat a lEnergie Atomique CEA, Universite Paris Saclay, Commissariat a lEnergie Atomique et aux Energies Alternatives CEA filed Critical Centre National de la Recherche Scientifique CNRS
Priority to FR2004444A priority Critical patent/FR3110026B1/fr
Priority to JP2022563144A priority patent/JP2023523705A/ja
Priority to PCT/EP2021/061068 priority patent/WO2021224079A1/fr
Priority to US17/921,587 priority patent/US20230170176A1/en
Priority to EP21720785.1A priority patent/EP4147263A1/fr
Publication of FR3110026A1 publication Critical patent/FR3110026A1/fr
Application granted granted Critical
Publication of FR3110026B1 publication Critical patent/FR3110026B1/fr
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/29—Reflection microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06333—Photo emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06341—Field emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/083—Beam forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24475—Scattered electron detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/262—Non-scanning techniques
    • H01J2237/2623—Field-emission microscopes
    • H01J2237/2626—Pulsed source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

L’invention concerne une source pulsée d’électrons (10) monochromatique comprenant :- une source d’atomes (16) ;- un faisceau laser (15) configuré pour former une zone d’excitation laser (15a) apte à exciter les atomes (16) vers des états de Rydberg ;- un champ électrique pulsé (F) de part et d’autre de la zone d’excitation laser, configuré pour ioniser au moins les atomes excités et former un faisceau d’électrons (100) monochromatique. L’invention concerne également un système d’analyse de surface d’un matériau comprenant : - une source pulsée d’électrons (10) formant un faisceau monochromatique d’électrons incidents (100) ;- des moyens d’acheminement (20) des électrons incidents (100) vers la surface d’un échantillon de matériau (55), de manière à former des électrons rétrodiffusés (110), et des électrons rétrodiffusés (110) vers des moyens de détection, lesdits moyens d’acheminement comprenant au moins une optique électronique ;- des moyens de détection (30) des électrons rétrodiffusés (110). Figure pour l’abrégé : Fig. 3
FR2004444A 2020-05-05 2020-05-05 Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée Active FR3110026B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR2004444A FR3110026B1 (fr) 2020-05-05 2020-05-05 Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée
JP2022563144A JP2023523705A (ja) 2020-05-05 2021-04-28 パルス電子供給源を備えた表面分析システム
PCT/EP2021/061068 WO2021224079A1 (fr) 2020-05-05 2021-04-28 Systeme d'analyse de surface comprenant une source pulsee d'electrons
US17/921,587 US20230170176A1 (en) 2020-05-05 2021-04-28 Surface analysis system comprising a pulsed electron source
EP21720785.1A EP4147263A1 (fr) 2020-05-05 2021-04-28 Systeme d'analyse de surface comprenant une source pulsee d'electrons

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR2004444 2020-05-05
FR2004444A FR3110026B1 (fr) 2020-05-05 2020-05-05 Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée

Publications (2)

Publication Number Publication Date
FR3110026A1 FR3110026A1 (fr) 2021-11-12
FR3110026B1 true FR3110026B1 (fr) 2022-06-10

Family

ID=72470444

Family Applications (1)

Application Number Title Priority Date Filing Date
FR2004444A Active FR3110026B1 (fr) 2020-05-05 2020-05-05 Source pulsée d’électrons et système d’analyse de surface comprenant une telle source pulsée

Country Status (5)

Country Link
US (1) US20230170176A1 (fr)
EP (1) EP4147263A1 (fr)
JP (1) JP2023523705A (fr)
FR (1) FR3110026B1 (fr)
WO (1) WO2021224079A1 (fr)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4414509A (en) * 1980-11-26 1983-11-08 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Low energy electron magnetometer using a monoenergetic electron beam
US7755069B2 (en) * 2006-05-16 2010-07-13 The Regents Of The University Of California Ultra-bright pulsed electron beam with low longitudinal emittance

Also Published As

Publication number Publication date
FR3110026A1 (fr) 2021-11-12
WO2021224079A1 (fr) 2021-11-11
US20230170176A1 (en) 2023-06-01
JP2023523705A (ja) 2023-06-07
EP4147263A1 (fr) 2023-03-15

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