FR3061548B1 - Dispositif de mesure de degres de dissociation de gaz comprenant un spectrometre optique - Google Patents
Dispositif de mesure de degres de dissociation de gaz comprenant un spectrometre optique Download PDFInfo
- Publication number
- FR3061548B1 FR3061548B1 FR1760907A FR1760907A FR3061548B1 FR 3061548 B1 FR3061548 B1 FR 3061548B1 FR 1760907 A FR1760907 A FR 1760907A FR 1760907 A FR1760907 A FR 1760907A FR 3061548 B1 FR3061548 B1 FR 3061548B1
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- gas
- dissociation
- gas path
- measuring
- optical
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/85—Investigating moving fluids or granular solids
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32853—Hygiene
- H01J37/32862—In situ cleaning of vessels and/or internal parts
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H01J37/32972—Spectral analysis
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N2021/258—Surface plasmon spectroscopy, e.g. micro- or nanoparticles in suspension
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N2021/8411—Application to online plant, process monitoring
- G01N2021/8416—Application to online plant, process monitoring and process controlling, not otherwise provided for
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/85—Investigating moving fluids or granular solids
- G01N2021/8578—Gaseous flow
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Drying Of Semiconductors (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
DISPOSITIF DE MESURE DE DEGRES DE DISSOCIATION DE GAZ COMPRENANT UN SPECTROMETRE OPTIQUE Ce dispositif comprend : un chemin principal de gaz (1) pour mettre en œuvre les processus de dépôt assisté par plasma, de gravure de membrane et de modification de surface de matériau afin d'obtenir des fonctions et des effets spéciaux dans la fabrication de circuits intégrés à semi-conducteurs ; un deuxième chemin de gaz (6) relié au chemin principal de gaz (1) pour stocker du gaz réactif (A) ; un organe de détection (8) et un dispositif optique (9) de mesure de dissociation de gaz plasmatique par spectre optique disposé entre le chemin principal de gaz (1) et le deuxième chemin de gaz (6), l'organe de détection (8) détectant un degré de dissociation de gaz dans un corps de tube (7) et le dispositif (9) de mesure de dissociation de gaz plasmatique par spectre optique calcule une valeur relative de quantité de dissociation. Figure pour l’abrégé : figure 4
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW106100285 | 2017-01-05 | ||
TW106100285A TWI636253B (zh) | 2017-01-05 | 2017-01-05 | 一種應用光譜儀來量測氣體解離狀態的量測裝置 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR3061548A1 FR3061548A1 (fr) | 2018-07-06 |
FR3061548B1 true FR3061548B1 (fr) | 2022-03-25 |
Family
ID=60094642
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR1760907A Active FR3061548B1 (fr) | 2017-01-05 | 2017-11-20 | Dispositif de mesure de degres de dissociation de gaz comprenant un spectrometre optique |
Country Status (9)
Country | Link |
---|---|
US (1) | US10204840B2 (fr) |
JP (2) | JP6601779B2 (fr) |
KR (1) | KR102088084B1 (fr) |
CN (2) | CN107290287B (fr) |
DE (1) | DE102017129785B4 (fr) |
FR (1) | FR3061548B1 (fr) |
GB (1) | GB2559245B (fr) |
SG (1) | SG10201706295QA (fr) |
TW (1) | TWI636253B (fr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI636253B (zh) * | 2017-01-05 | 2018-09-21 | 富蘭登科技股份有限公司 | 一種應用光譜儀來量測氣體解離狀態的量測裝置 |
TWI792161B (zh) * | 2021-01-26 | 2023-02-11 | 富蘭登科技股份有限公司 | 以光譜量測物質的物理狀態之裝置及其方法 |
Family Cites Families (27)
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JPS5891176U (ja) * | 1981-12-14 | 1983-06-20 | 日本電気株式会社 | 半導体素子の特性測定装置 |
US5565114A (en) * | 1993-03-04 | 1996-10-15 | Tokyo Electron Limited | Method and device for detecting the end point of plasma process |
JP2002517740A (ja) * | 1998-06-12 | 2002-06-18 | オン−ライン テクノロジーズ インコーポレーテッド | 処理室清浄またはウエハエッチング・エンドポイントの特定方法およびその装置 |
JP4363861B2 (ja) * | 2003-02-04 | 2009-11-11 | 株式会社日立ハイテクノロジーズ | 半導体製造装置 |
US7067432B2 (en) * | 2003-06-26 | 2006-06-27 | Applied Materials, Inc. | Methodology for in-situ and real-time chamber condition monitoring and process recovery during plasma processing |
JP3873943B2 (ja) * | 2003-07-16 | 2007-01-31 | ソニー株式会社 | プラズマモニタ方法、プラズマ処理方法、半導体装置の製造方法、およびプラズマ処理装置 |
US7261745B2 (en) * | 2003-09-30 | 2007-08-28 | Agere Systems Inc. | Real-time gate etch critical dimension control by oxygen monitoring |
US6950178B2 (en) * | 2003-10-09 | 2005-09-27 | Micron Technology, Inc. | Method and system for monitoring plasma using optical emission spectroscopy |
US7460225B2 (en) * | 2004-03-05 | 2008-12-02 | Vassili Karanassios | Miniaturized source devices for optical and mass spectrometry |
JP2006066536A (ja) * | 2004-08-25 | 2006-03-09 | Hitachi High-Technologies Corp | プラズマ処理装置及び処理方法 |
US20060118240A1 (en) * | 2004-12-03 | 2006-06-08 | Applied Science And Technology, Inc. | Methods and apparatus for downstream dissociation of gases |
RU2008108010A (ru) * | 2005-08-02 | 2009-09-10 | Массачусетс Инститьют Оф Текнолоджи (Us) | Способ применения фторида серы для удаления поверхностных отложений |
US8382909B2 (en) * | 2005-11-23 | 2013-02-26 | Edwards Limited | Use of spectroscopic techniques to monitor and control reactant gas input into a pre-pump reactive gas injection system |
GB2441582A (en) * | 2006-09-01 | 2008-03-12 | Gencoa Ltd | Process monitoring and control |
AT504466B1 (de) | 2006-10-25 | 2009-05-15 | Eiselt Primoz | Verfahren und vorrichtung zur entfettung von gegenständen oder materialien mittels oxidativer radikale |
JP5125248B2 (ja) * | 2007-06-22 | 2013-01-23 | 株式会社日立製作所 | イオンモビリティ分光計 |
KR100885678B1 (ko) | 2007-07-24 | 2009-02-26 | 한국과학기술원 | 기체 측정 장치 및 방법 |
CN201096521Y (zh) * | 2007-11-06 | 2008-08-06 | 南京理工大学 | 非接触式等离子体温度和电子密度测量装置 |
US20100224322A1 (en) * | 2009-03-03 | 2010-09-09 | Applied Materials, Inc. | Endpoint detection for a reactor chamber using a remote plasma chamber |
US8003959B2 (en) * | 2009-06-26 | 2011-08-23 | Varian Semiconductor Equipment Associates, Inc. | Ion source cleaning end point detection |
KR20110069626A (ko) | 2009-12-17 | 2011-06-23 | 한전케이디엔주식회사 | 전력 설비의 노이즈 방지 회로 |
FR2965355B1 (fr) * | 2010-09-24 | 2013-05-10 | Horiba Jobin Yvon Sas | Procede de mesure par spectrometrie de decharge luminescente d'un echantillon solide organique ou polymere |
JP2016025233A (ja) * | 2014-07-22 | 2016-02-08 | 株式会社東芝 | 基板処理装置、及び基板処理方法 |
KR20160120382A (ko) * | 2015-04-07 | 2016-10-18 | 삼성전자주식회사 | 광학 분광 분석 장치 및 플라즈마 처리 장치 |
CN105714270A (zh) * | 2016-04-15 | 2016-06-29 | 信利(惠州)智能显示有限公司 | 化学气相沉积清洗终点监测方法及其系统 |
TWI636253B (zh) * | 2017-01-05 | 2018-09-21 | 富蘭登科技股份有限公司 | 一種應用光譜儀來量測氣體解離狀態的量測裝置 |
CN107228829B (zh) * | 2017-06-07 | 2019-07-16 | 哈尔滨工业大学 | 一种氪工质霍尔推力器放电通道内电子和原子参数的在线监测装置和方法 |
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2017
- 2017-01-05 TW TW106100285A patent/TWI636253B/zh active
- 2017-05-03 CN CN201710305494.8A patent/CN107290287B/zh active Active
- 2017-05-03 CN CN201720482868.9U patent/CN207300868U/zh active Active
- 2017-05-26 US US15/606,809 patent/US10204840B2/en active Active
- 2017-07-20 JP JP2017141027A patent/JP6601779B2/ja active Active
- 2017-07-20 JP JP2017003312U patent/JP3213290U/ja active Active
- 2017-08-02 SG SG10201706295QA patent/SG10201706295QA/en unknown
- 2017-08-08 KR KR1020170100366A patent/KR102088084B1/ko active IP Right Grant
- 2017-11-20 FR FR1760907A patent/FR3061548B1/fr active Active
- 2017-11-29 GB GB1719832.6A patent/GB2559245B/en active Active
- 2017-12-13 DE DE102017129785.5A patent/DE102017129785B4/de active Active
Also Published As
Publication number | Publication date |
---|---|
FR3061548A1 (fr) | 2018-07-06 |
GB2559245B (en) | 2020-05-20 |
KR102088084B1 (ko) | 2020-03-12 |
JP3213290U (ja) | 2017-11-02 |
CN107290287A (zh) | 2017-10-24 |
TW201825893A (zh) | 2018-07-16 |
CN107290287B (zh) | 2019-09-24 |
US20180190548A1 (en) | 2018-07-05 |
DE102017129785B4 (de) | 2023-03-16 |
JP2018109598A (ja) | 2018-07-12 |
SG10201706295QA (en) | 2018-08-30 |
US10204840B2 (en) | 2019-02-12 |
JP6601779B2 (ja) | 2019-11-06 |
GB2559245A (en) | 2018-08-01 |
GB201719832D0 (en) | 2018-01-10 |
CN207300868U (zh) | 2018-05-01 |
DE102017129785A1 (de) | 2018-07-05 |
TWI636253B (zh) | 2018-09-21 |
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