SG10201706295QA - A Method and A Device for Measuring Gas Dissociation Degrees with an Optical Spectrometer - Google Patents
A Method and A Device for Measuring Gas Dissociation Degrees with an Optical SpectrometerInfo
- Publication number
- SG10201706295QA SG10201706295QA SG10201706295QA SG10201706295QA SG10201706295QA SG 10201706295Q A SG10201706295Q A SG 10201706295QA SG 10201706295Q A SG10201706295Q A SG 10201706295QA SG 10201706295Q A SG10201706295Q A SG 10201706295QA SG 10201706295Q A SG10201706295Q A SG 10201706295QA
- Authority
- SG
- Singapore
- Prior art keywords
- present application
- gas dissociation
- degrees
- industries
- measuring gas
- Prior art date
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/85—Investigating moving fluids or granular solids
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32853—Hygiene
- H01J37/32862—In situ cleaning of vessels and/or internal parts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
- H01J37/32972—Spectral analysis
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N2021/258—Surface plasmon spectroscopy, e.g. micro- or nanoparticles in suspension
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N2021/8411—Application to online plant, process monitoring
- G01N2021/8416—Application to online plant, process monitoring and process controlling, not otherwise provided for
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/85—Investigating moving fluids or granular solids
- G01N2021/8578—Gaseous flow
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
Abstract
P00353C01 FRT-SGI 2 15 A METHOD AND A DEVICE FOR MEASURING GAS DISSOCIATION DEGREES WITH AN OPTICAL SPECTROMETER 5 A primary objective of the present application is to provide a method and a device for measuring gas dissociation degrees. The principle of the present application is to detect the gas dissociation degree in a tube body and to calculate the relative dissociation quantity value by means of a device according to the present application. When the contamination value in a primary path. 10 The present application may be applied to any device and/or any apparatus that requires measuring of gas dissociation degrees, including but not limited to physical vapor deposition device, chemical vapor deposition device, etching device and any other relevant device in the semiconductor, photoelectric, panel industries and any 15 other relevant industry. The present application may also be directly disposed in a remote plasma source device. Further, the present application may be applied in any inspection examination device in the biotechnology, chemistry, applied physics industries and any other relevant industry. Still further, the present application may be applied to any inspection apparatus or testing platform in the equipment maintenance 20 industry for any of the foregoing industries. [Figure 3]
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW106100285A TWI636253B (en) | 2017-01-05 | 2017-01-05 | Measuring device using spectrometer to measure gas dissociation state |
JP2017141027A JP6601779B2 (en) | 2017-01-05 | 2017-07-20 | Method and apparatus for measuring gas dissociation state using a spectrometer |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201706295QA true SG10201706295QA (en) | 2018-08-30 |
Family
ID=60094642
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201706295QA SG10201706295QA (en) | 2017-01-05 | 2017-08-02 | A Method and A Device for Measuring Gas Dissociation Degrees with an Optical Spectrometer |
Country Status (9)
Country | Link |
---|---|
US (1) | US10204840B2 (en) |
JP (2) | JP6601779B2 (en) |
KR (1) | KR102088084B1 (en) |
CN (2) | CN207300868U (en) |
DE (1) | DE102017129785B4 (en) |
FR (1) | FR3061548B1 (en) |
GB (1) | GB2559245B (en) |
SG (1) | SG10201706295QA (en) |
TW (1) | TWI636253B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI636253B (en) * | 2017-01-05 | 2018-09-21 | 富蘭登科技股份有限公司 | Measuring device using spectrometer to measure gas dissociation state |
TWI792161B (en) * | 2021-01-26 | 2023-02-11 | 富蘭登科技股份有限公司 | Apparatus and method for measuring physical state of matter by spectroscopy |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS5891176U (en) * | 1981-12-14 | 1983-06-20 | 日本電気株式会社 | Semiconductor device characteristic measurement equipment |
US5565114A (en) * | 1993-03-04 | 1996-10-15 | Tokyo Electron Limited | Method and device for detecting the end point of plasma process |
JP2002517740A (en) * | 1998-06-12 | 2002-06-18 | オン−ライン テクノロジーズ インコーポレーテッド | Method and apparatus for identifying process chamber clean or wafer etching endpoints |
JP4363861B2 (en) * | 2003-02-04 | 2009-11-11 | 株式会社日立ハイテクノロジーズ | Semiconductor manufacturing equipment |
US7067432B2 (en) * | 2003-06-26 | 2006-06-27 | Applied Materials, Inc. | Methodology for in-situ and real-time chamber condition monitoring and process recovery during plasma processing |
JP3873943B2 (en) * | 2003-07-16 | 2007-01-31 | ソニー株式会社 | Plasma monitoring method, plasma processing method, semiconductor device manufacturing method, and plasma processing apparatus |
US7261745B2 (en) * | 2003-09-30 | 2007-08-28 | Agere Systems Inc. | Real-time gate etch critical dimension control by oxygen monitoring |
US6950178B2 (en) * | 2003-10-09 | 2005-09-27 | Micron Technology, Inc. | Method and system for monitoring plasma using optical emission spectroscopy |
US7460225B2 (en) * | 2004-03-05 | 2008-12-02 | Vassili Karanassios | Miniaturized source devices for optical and mass spectrometry |
JP2006066536A (en) * | 2004-08-25 | 2006-03-09 | Hitachi High-Technologies Corp | Plasma processing device and its processing method |
US20060118240A1 (en) * | 2004-12-03 | 2006-06-08 | Applied Science And Technology, Inc. | Methods and apparatus for downstream dissociation of gases |
RU2008108010A (en) * | 2005-08-02 | 2009-09-10 | Массачусетс Инститьют Оф Текнолоджи (Us) | METHOD OF APPLICATION OF SULFUR FLUORIDE FOR REMOVING SURFACE SEDIMENTS |
US8382909B2 (en) * | 2005-11-23 | 2013-02-26 | Edwards Limited | Use of spectroscopic techniques to monitor and control reactant gas input into a pre-pump reactive gas injection system |
GB2441582A (en) * | 2006-09-01 | 2008-03-12 | Gencoa Ltd | Process monitoring and control |
AT504466B1 (en) | 2006-10-25 | 2009-05-15 | Eiselt Primoz | METHOD AND DEVICE FOR DEGASSING OBJECTS OR MATERIALS USING THE OXIDATIVE RADICALS |
JP5125248B2 (en) * | 2007-06-22 | 2013-01-23 | 株式会社日立製作所 | Ion mobility spectrometer |
KR100885678B1 (en) | 2007-07-24 | 2009-02-26 | 한국과학기술원 | Apparatus and Method for Monitoring a Gas Using Gas - Permeable Material |
CN201096521Y (en) * | 2007-11-06 | 2008-08-06 | 南京理工大学 | Non-contact type plasma temperature and electron density measuring apparatus |
US20100224322A1 (en) * | 2009-03-03 | 2010-09-09 | Applied Materials, Inc. | Endpoint detection for a reactor chamber using a remote plasma chamber |
US8003959B2 (en) * | 2009-06-26 | 2011-08-23 | Varian Semiconductor Equipment Associates, Inc. | Ion source cleaning end point detection |
KR20110069626A (en) | 2009-12-17 | 2011-06-23 | 한전케이디엔주식회사 | Circuit for protecting noise of power equipment |
FR2965355B1 (en) * | 2010-09-24 | 2013-05-10 | Horiba Jobin Yvon Sas | METHOD FOR LUMINESCENT DISCHARGE SPECTROMETRY MEASUREMENT OF AN ORGANIC OR POLYMER SOLID SAMPLE |
JP2016025233A (en) * | 2014-07-22 | 2016-02-08 | 株式会社東芝 | Substrate processing apparatus and board processing method |
KR20160120382A (en) * | 2015-04-07 | 2016-10-18 | 삼성전자주식회사 | Apparatus for optical emission spectroscopy and apparatus for treating plasma |
CN105714270A (en) * | 2016-04-15 | 2016-06-29 | 信利(惠州)智能显示有限公司 | Cleaning finishing monitoring method and system thereof with chemical vapor deposition |
TWI636253B (en) * | 2017-01-05 | 2018-09-21 | 富蘭登科技股份有限公司 | Measuring device using spectrometer to measure gas dissociation state |
CN107228829B (en) * | 2017-06-07 | 2019-07-16 | 哈尔滨工业大学 | The on-Line Monitor Device and method of electronics and atomic parameter in a kind of krypton working medium hall thruster discharge channel |
-
2017
- 2017-01-05 TW TW106100285A patent/TWI636253B/en active
- 2017-05-03 CN CN201720482868.9U patent/CN207300868U/en active Active
- 2017-05-03 CN CN201710305494.8A patent/CN107290287B/en active Active
- 2017-05-26 US US15/606,809 patent/US10204840B2/en active Active
- 2017-07-20 JP JP2017141027A patent/JP6601779B2/en active Active
- 2017-07-20 JP JP2017003312U patent/JP3213290U/en active Active
- 2017-08-02 SG SG10201706295QA patent/SG10201706295QA/en unknown
- 2017-08-08 KR KR1020170100366A patent/KR102088084B1/en active IP Right Grant
- 2017-11-20 FR FR1760907A patent/FR3061548B1/en active Active
- 2017-11-29 GB GB1719832.6A patent/GB2559245B/en active Active
- 2017-12-13 DE DE102017129785.5A patent/DE102017129785B4/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP6601779B2 (en) | 2019-11-06 |
TW201825893A (en) | 2018-07-16 |
DE102017129785B4 (en) | 2023-03-16 |
GB2559245B (en) | 2020-05-20 |
FR3061548B1 (en) | 2022-03-25 |
GB2559245A (en) | 2018-08-01 |
DE102017129785A1 (en) | 2018-07-05 |
GB201719832D0 (en) | 2018-01-10 |
FR3061548A1 (en) | 2018-07-06 |
JP2018109598A (en) | 2018-07-12 |
US10204840B2 (en) | 2019-02-12 |
CN107290287A (en) | 2017-10-24 |
CN107290287B (en) | 2019-09-24 |
US20180190548A1 (en) | 2018-07-05 |
JP3213290U (en) | 2017-11-02 |
TWI636253B (en) | 2018-09-21 |
CN207300868U (en) | 2018-05-01 |
KR102088084B1 (en) | 2020-03-12 |
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