SG10201807414RA - Method of inspecting flow rate measuring system - Google Patents

Method of inspecting flow rate measuring system

Info

Publication number
SG10201807414RA
SG10201807414RA SG10201807414RA SG10201807414RA SG10201807414RA SG 10201807414R A SG10201807414R A SG 10201807414RA SG 10201807414R A SG10201807414R A SG 10201807414RA SG 10201807414R A SG10201807414R A SG 10201807414RA SG 10201807414R A SG10201807414R A SG 10201807414RA
Authority
SG
Singapore
Prior art keywords
flow rate
measuring system
rate measuring
gas
flow path
Prior art date
Application number
SG10201807414RA
Inventor
Hirose Jun
Amikura Norihiko
Miyoshi Risako
Onodera Shinobu
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of SG10201807414RA publication Critical patent/SG10201807414RA/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
    • G01F25/10—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters
    • G01F25/15—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters specially adapted for gas meters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
    • G01F25/10—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F3/00—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow
    • G01F3/02—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow with measuring chambers which expand or contract during measurement
    • G01F3/20—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow with measuring chambers which expand or contract during measurement having flexible movable walls, e.g. diaphragms, bellows
    • G01F3/22—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow with measuring chambers which expand or contract during measurement having flexible movable walls, e.g. diaphragms, bellows for gases
    • G01F3/221—Valves therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F3/00—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow
    • G01F3/02—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow with measuring chambers which expand or contract during measurement
    • G01F3/20—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow with measuring chambers which expand or contract during measurement having flexible movable walls, e.g. diaphragms, bellows
    • G01F3/22—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow with measuring chambers which expand or contract during measurement having flexible movable walls, e.g. diaphragms, bellows for gases
    • G01F3/226—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow with measuring chambers which expand or contract during measurement having flexible movable walls, e.g. diaphragms, bellows for gases characterised by features of meter body or housing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F3/00—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow
    • G01F3/36—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow with stationary measuring chambers having constant volume during measurement
    • G01F3/38—Measuring the volume flow of fluids or fluent solid material wherein the fluid passes through the meter in successive and more or less isolated quantities, the meter being driven by the flow with stationary measuring chambers having constant volume during measurement having only one measuring chamber
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F15/00—Details of, or accessories for, apparatus of groups G01F1/00 - G01F13/00 insofar as such details or appliances are not adapted to particular types of such apparatus
    • G01F15/005—Valves

Abstract

METHOD OF INSPECTING FLOW RATE MEASURING SYSTEM Disclosed is a method of inspecting a flow rate measuring system used in a substrate processing system. The flow rate measuring system provides a gas flow path used for calculating a flow rate in a build-up method. A gas output by a flow rate controller of a gas supply unit of the substrate processing system may be supplied to the gas flow path. In the method, apart from a previously obtained initial value of a volume of the gas flow path, a volume of the gas flow path is obtained at the time of inspection of the flow rate measuring system. Then, the obtained volume is compared to the initial value. Figure 1
SG10201807414RA 2017-08-31 2018-08-29 Method of inspecting flow rate measuring system SG10201807414RA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017166950A JP6960278B2 (en) 2017-08-31 2017-08-31 How to inspect the flow measurement system

Publications (1)

Publication Number Publication Date
SG10201807414RA true SG10201807414RA (en) 2019-03-28

Family

ID=65437420

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201807414RA SG10201807414RA (en) 2017-08-31 2018-08-29 Method of inspecting flow rate measuring system

Country Status (6)

Country Link
US (1) US10859426B2 (en)
JP (1) JP6960278B2 (en)
KR (1) KR102579127B1 (en)
CN (1) CN109425414B (en)
SG (1) SG10201807414RA (en)
TW (1) TWI791598B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9857265B2 (en) * 2015-04-03 2018-01-02 Richard Andrew DeVerse Methods and systems for detecting fluidic levels and flow rate and fluidic equipment malfunctions
JP6956014B2 (en) * 2018-01-09 2021-10-27 東京エレクトロン株式会社 How to find the gas flow rate
JP7042134B2 (en) * 2018-03-29 2022-03-25 東京エレクトロン株式会社 Substrate processing system and method for determining the flow rate of gas
JP7249030B2 (en) * 2019-07-30 2023-03-30 株式会社フジキン Volume measuring method in flow measuring device and flow measuring device

Family Cites Families (19)

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JPS5467462A (en) * 1977-11-09 1979-05-30 Mitsubishi Electric Corp Gas flow meter
JP3167493B2 (en) * 1993-03-01 2001-05-21 東京エレクトロン株式会社 Pressure control device
JPH06318446A (en) * 1993-05-07 1994-11-15 Hitachi Ltd Analysis method and device
JP3055847B2 (en) * 1993-07-02 2000-06-26 東京エレクトロン株式会社 Decompression processing equipment
JP3967424B2 (en) * 1997-04-30 2007-08-29 東京エレクトロン株式会社 Vacuum processing apparatus and pressure adjustment method
KR19990027295A (en) * 1997-09-29 1999-04-15 양재신 Leveling Plate
JP4078982B2 (en) 2002-04-22 2008-04-23 東京エレクトロン株式会社 Processing system and flow measurement method
JP4421393B2 (en) * 2004-06-22 2010-02-24 東京エレクトロン株式会社 Substrate processing equipment
JP4648098B2 (en) * 2005-06-06 2011-03-09 シーケーディ株式会社 Absolute flow verification system for flow control equipment
JP4856905B2 (en) * 2005-06-27 2012-01-18 国立大学法人東北大学 Flow rate variable type flow control device
JP4718274B2 (en) * 2005-08-25 2011-07-06 東京エレクトロン株式会社 Semiconductor manufacturing apparatus, flow correction method for semiconductor manufacturing apparatus, program
KR101117749B1 (en) * 2006-03-07 2012-03-16 씨케이디 가부시키 가이샤 Gas flow rate verification unit
JP4288297B1 (en) * 2008-01-09 2009-07-01 三菱重工業株式会社 Pressure control device and pressure control method
JP5538119B2 (en) 2010-07-30 2014-07-02 株式会社フジキン Calibration method and flow rate measuring method of flow controller for gas supply device
JP5430621B2 (en) * 2011-08-10 2014-03-05 Ｃｋｄ株式会社 Gas flow verification system and gas flow verification unit
JP5433660B2 (en) * 2011-10-12 2014-03-05 Ｃｋｄ株式会社 Gas flow monitoring system
JP5905735B2 (en) * 2012-02-21 2016-04-20 東京エレクトロン株式会社 Substrate processing apparatus, substrate processing method, and method for changing settable band of substrate temperature
JP6367069B2 (en) * 2013-11-25 2018-08-01 東京エレクトロン株式会社 Mixing apparatus, substrate processing apparatus, and mixing method
KR101556888B1 (en) 2015-06-17 2015-10-01 주식회사 정도산업 Apparatus for boring stone

Also Published As

Publication number Publication date
CN109425414A (en) 2019-03-05
TWI791598B (en) 2023-02-11
US10859426B2 (en) 2020-12-08
KR102579127B1 (en) 2023-09-14
TW201930832A (en) 2019-08-01
KR20190024804A (en) 2019-03-08
US20190063987A1 (en) 2019-02-28
JP2019045246A (en) 2019-03-22
CN109425414B (en) 2020-09-08
JP6960278B2 (en) 2021-11-05

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