FR3047111B1 - Assemblage comprenant des moyens d'interconnexion mixtes comportant des elements intermediaires d'interconnexion et des joints frittes metalliques et procede de fabrication - Google Patents
Assemblage comprenant des moyens d'interconnexion mixtes comportant des elements intermediaires d'interconnexion et des joints frittes metalliques et procede de fabrication Download PDFInfo
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- FR3047111B1 FR3047111B1 FR1650583A FR1650583A FR3047111B1 FR 3047111 B1 FR3047111 B1 FR 3047111B1 FR 1650583 A FR1650583 A FR 1650583A FR 1650583 A FR1650583 A FR 1650583A FR 3047111 B1 FR3047111 B1 FR 3047111B1
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- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
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- H01L2224/136—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/13638—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
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- H01L2224/13638—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
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- H01L2224/10—Bump connectors; Manufacturing methods related thereto
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- H01L2224/16057—Shape in side view
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- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/16238—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a bonding area protruding from the surface of the item
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- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
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- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/8119—Arrangement of the bump connectors prior to mounting
- H01L2224/81191—Arrangement of the bump connectors prior to mounting wherein the bump connectors are disposed only on the semiconductor or solid-state body
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- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/8119—Arrangement of the bump connectors prior to mounting
- H01L2224/81193—Arrangement of the bump connectors prior to mounting wherein the bump connectors are disposed on both the semiconductor or solid-state body and another item or body to be connected to the semiconductor or solid-state body
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/812—Applying energy for connecting
- H01L2224/81201—Compression bonding
- H01L2224/81203—Thermocompression bonding, e.g. diffusion bonding, pressure joining, thermocompression welding or solid-state welding
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/812—Applying energy for connecting
- H01L2224/81201—Compression bonding
- H01L2224/81203—Thermocompression bonding, e.g. diffusion bonding, pressure joining, thermocompression welding or solid-state welding
- H01L2224/81204—Thermocompression bonding, e.g. diffusion bonding, pressure joining, thermocompression welding or solid-state welding with a graded temperature profile
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- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/812—Applying energy for connecting
- H01L2224/81201—Compression bonding
- H01L2224/81208—Compression bonding applying unidirectional static pressure
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/818—Bonding techniques
- H01L2224/8184—Sintering
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- H—ELECTRICITY
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/38—Effects and problems related to the device integration
- H01L2924/381—Pitch distance
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- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Ceramic Engineering (AREA)
- Wire Bonding (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Powder Metallurgy (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1650583A FR3047111B1 (fr) | 2016-01-26 | 2016-01-26 | Assemblage comprenant des moyens d'interconnexion mixtes comportant des elements intermediaires d'interconnexion et des joints frittes metalliques et procede de fabrication |
US16/072,867 US11011490B2 (en) | 2016-01-26 | 2017-01-26 | Assembly comprising hybrid interconnecting means including intermediate interconnecting elements and sintered metal joints, and manufacturing process |
PCT/EP2017/051667 WO2017129687A1 (fr) | 2016-01-26 | 2017-01-26 | Assemblage comprenant des moyens d'interconnexion mixtes comportant des elements intermediaires d'interconnexion et des joints frittes metalliques et procede de fabrication |
EP17701352.1A EP3408863A1 (fr) | 2016-01-26 | 2017-01-26 | Assemblage comprenant des moyens d'interconnexion mixtes comportant des elements intermediaires d'interconnexion et des joints frittes metalliques et procede de fabrication |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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FR1650583 | 2016-01-26 | ||
FR1650583A FR3047111B1 (fr) | 2016-01-26 | 2016-01-26 | Assemblage comprenant des moyens d'interconnexion mixtes comportant des elements intermediaires d'interconnexion et des joints frittes metalliques et procede de fabrication |
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FR3047111A1 FR3047111A1 (fr) | 2017-07-28 |
FR3047111B1 true FR3047111B1 (fr) | 2018-03-23 |
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FR1650583A Active FR3047111B1 (fr) | 2016-01-26 | 2016-01-26 | Assemblage comprenant des moyens d'interconnexion mixtes comportant des elements intermediaires d'interconnexion et des joints frittes metalliques et procede de fabrication |
Country Status (4)
Country | Link |
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US (1) | US11011490B2 (fr) |
EP (1) | EP3408863A1 (fr) |
FR (1) | FR3047111B1 (fr) |
WO (1) | WO2017129687A1 (fr) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
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US20170309549A1 (en) * | 2016-04-21 | 2017-10-26 | Texas Instruments Incorporated | Sintered Metal Flip Chip Joints |
US10759658B2 (en) * | 2018-12-10 | 2020-09-01 | Texas Instruments Incorporated | Hermetic vertical shear weld wafer bonding |
US10910336B2 (en) * | 2019-01-29 | 2021-02-02 | Shih-Chi Chen | Chip package structure |
US11329018B2 (en) * | 2019-10-23 | 2022-05-10 | International Business Machines Corporation | Forming of bump structure |
US11348875B2 (en) * | 2020-02-27 | 2022-05-31 | Micron Technology, Inc. | Semiconductor devices with flexible connector array |
EP3872855A1 (fr) * | 2020-02-27 | 2021-09-01 | Siemens Aktiengesellschaft | Substrat semi-fini pour un module électronique de puissance avec une structure de câblage avec des protubérances et procédé de fabrication correspondant |
KR102273299B1 (ko) | 2020-04-27 | 2021-07-06 | 알에프에이치아이씨 주식회사 | 열 확산 및 임피던스 정합을 위한 GaN 기반 고출력 트랜지스터 구조체 및 이를 제조하는 방법 |
WO2021256040A1 (fr) * | 2020-06-15 | 2021-12-23 | ソニーセミコンダクタソリューションズ株式会社 | Dispositif à semi-conducteurs et son procédé de production |
WO2021259536A2 (fr) | 2020-06-23 | 2021-12-30 | Siemens Aktiengesellschaft | Procédé de mise en contact d'un semi-conducteur de puissance sur un substrat |
US20220262754A1 (en) * | 2021-02-18 | 2022-08-18 | International Business Machines Corporation | Sintering a nanoparticle paste for semiconductor chip join |
FR3121277B1 (fr) | 2021-03-26 | 2024-02-16 | Safran Electronics & Defense | Procédé pour assembler un composant électronique à un substrat |
FR3121278A1 (fr) | 2021-03-26 | 2022-09-30 | Safran Electronics & Defense | Procédé pour assembler un composant électronique à un substrat par pressage |
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WO1996029736A1 (fr) * | 1995-03-20 | 1996-09-26 | Kabushiki Kaisha Toshiba | Substrat de circuit au nitrure de silicium |
US20020093108A1 (en) | 2001-01-15 | 2002-07-18 | Grigorov Ilya L. | Flip chip packaged semiconductor device having double stud bumps and method of forming same |
US8257795B2 (en) | 2004-02-18 | 2012-09-04 | Virginia Tech Intellectual Properties, Inc. | Nanoscale metal paste for interconnect and method of use |
US20060030069A1 (en) * | 2004-08-04 | 2006-02-09 | Chien-Wei Chang | Packaging method for manufacturing substrates |
JP2007184408A (ja) * | 2006-01-06 | 2007-07-19 | Nec Corp | 電極接合方法 |
JP4731340B2 (ja) * | 2006-02-02 | 2011-07-20 | 富士通株式会社 | 半導体装置の製造方法 |
JP4343177B2 (ja) | 2006-02-06 | 2009-10-14 | 富士通マイクロエレクトロニクス株式会社 | 半導体装置 |
JP5151584B2 (ja) * | 2008-03-17 | 2013-02-27 | 富士通株式会社 | 半導体装置及び半導体装置の製造方法 |
JP5322774B2 (ja) * | 2009-05-25 | 2013-10-23 | パナソニック株式会社 | 実装構造体、およびその製造方法 |
US8580607B2 (en) * | 2010-07-27 | 2013-11-12 | Tessera, Inc. | Microelectronic packages with nanoparticle joining |
US9406579B2 (en) * | 2012-05-14 | 2016-08-02 | STATS ChipPAC Pte. Ltd. | Semiconductor device and method of controlling warpage in semiconductor package |
US8823175B2 (en) * | 2012-05-15 | 2014-09-02 | Infineon Technologies Ag | Reliable area joints for power semiconductors |
KR101565690B1 (ko) | 2014-04-10 | 2015-11-03 | 삼성전기주식회사 | 회로기판, 회로기판 제조방법, 전자부품 패키지 및 전자부품 패키지 제조방법 |
US9633971B2 (en) * | 2015-07-10 | 2017-04-25 | Invensas Corporation | Structures and methods for low temperature bonding using nanoparticles |
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2016
- 2016-01-26 FR FR1650583A patent/FR3047111B1/fr active Active
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2017
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- 2017-01-26 US US16/072,867 patent/US11011490B2/en active Active
- 2017-01-26 WO PCT/EP2017/051667 patent/WO2017129687A1/fr active Application Filing
Also Published As
Publication number | Publication date |
---|---|
FR3047111A1 (fr) | 2017-07-28 |
EP3408863A1 (fr) | 2018-12-05 |
US20180374813A1 (en) | 2018-12-27 |
US11011490B2 (en) | 2021-05-18 |
WO2017129687A1 (fr) | 2017-08-03 |
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