FR2947816B1 - Procede de depot par pulverisation cathodique, produit obtenu et cible de pulverisation - Google Patents

Procede de depot par pulverisation cathodique, produit obtenu et cible de pulverisation

Info

Publication number
FR2947816B1
FR2947816B1 FR0954756A FR0954756A FR2947816B1 FR 2947816 B1 FR2947816 B1 FR 2947816B1 FR 0954756 A FR0954756 A FR 0954756A FR 0954756 A FR0954756 A FR 0954756A FR 2947816 B1 FR2947816 B1 FR 2947816B1
Authority
FR
France
Prior art keywords
spray
product obtained
deposition method
cathodic
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0954756A
Other languages
English (en)
Other versions
FR2947816A1 (fr
Inventor
Nicolas Chemin
Eric Gouardes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Original Assignee
Saint Gobain Glass France SAS
Compagnie de Saint Gobain SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint Gobain Glass France SAS, Compagnie de Saint Gobain SA filed Critical Saint Gobain Glass France SAS
Priority to FR0954756A priority Critical patent/FR2947816B1/fr
Priority to CN201080030853XA priority patent/CN102471143A/zh
Priority to EP10732348A priority patent/EP2451755A1/fr
Priority to JP2012518993A priority patent/JP2012532985A/ja
Priority to US13/382,954 priority patent/US20120258858A1/en
Priority to PCT/EP2010/059810 priority patent/WO2011003974A1/fr
Publication of FR2947816A1 publication Critical patent/FR2947816A1/fr
Application granted granted Critical
Publication of FR2947816B1 publication Critical patent/FR2947816B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/218—V2O5, Nb2O5, Ta2O5
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/219—CrOx, MoOx, WOx
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/228—Other specific oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/71—Photocatalytic coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physical Vapour Deposition (AREA)
  • Catalysts (AREA)
  • Surface Treatment Of Glass (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Laminated Bodies (AREA)
FR0954756A 2009-07-09 2009-07-09 Procede de depot par pulverisation cathodique, produit obtenu et cible de pulverisation Expired - Fee Related FR2947816B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR0954756A FR2947816B1 (fr) 2009-07-09 2009-07-09 Procede de depot par pulverisation cathodique, produit obtenu et cible de pulverisation
CN201080030853XA CN102471143A (zh) 2009-07-09 2010-07-08 通过溅射的沉积用方法，所得产品，和溅射靶
EP10732348A EP2451755A1 (fr) 2009-07-09 2010-07-08 Procede de depôt par pulverisation cathodique, produit obtenu et cible de pulverisation
JP2012518993A JP2012532985A (ja) 2009-07-09 2010-07-08 スパッタリングによる堆積方法、得られた製品及びスパッタリングターゲット
US13/382,954 US20120258858A1 (en) 2009-07-09 2010-07-08 Method for deposition by sputtering, resulting product, and sputtering target
PCT/EP2010/059810 WO2011003974A1 (fr) 2009-07-09 2010-07-08 Procede de depôt par pulverisation cathodique, produit obtenu et cible de pulverisation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0954756A FR2947816B1 (fr) 2009-07-09 2009-07-09 Procede de depot par pulverisation cathodique, produit obtenu et cible de pulverisation

Publications (2)

Publication Number Publication Date
FR2947816A1 FR2947816A1 (fr) 2011-01-14
FR2947816B1 true FR2947816B1 (fr) 2011-07-22

Family

ID=41632108

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0954756A Expired - Fee Related FR2947816B1 (fr) 2009-07-09 2009-07-09 Procede de depot par pulverisation cathodique, produit obtenu et cible de pulverisation

Country Status (6)

Country Link
US (1) US20120258858A1 (fr)
EP (1) EP2451755A1 (fr)
JP (1) JP2012532985A (fr)
CN (1) CN102471143A (fr)
FR (1) FR2947816B1 (fr)
WO (1) WO2011003974A1 (fr)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8796482B2 (en) 2009-10-01 2014-08-05 Yeda Research And Development Co. Ltd. Oxidation of primary aliphatic alcohols with a noble metal polyoxometalate complex
JP6044992B2 (ja) * 2013-06-28 2016-12-14 国立研究開発法人産業技術総合研究所 可視光応答性組成物とこれを用いた光電極、光触媒、光センサー
JP2015059049A (ja) * 2013-09-17 2015-03-30 株式会社豊田中央研究所 半導体材料、光電極材料、光触媒材料、半導体材料の製造方法
JP6291823B2 (ja) * 2013-12-10 2018-03-14 大日本印刷株式会社 光触媒機能材料の製造方法
CN104923214B (zh) * 2015-05-13 2018-04-27 武汉理工大学 一种钨酸铋光催化薄膜及其制备方法
CN105344348A (zh) * 2015-09-08 2016-02-24 徐州医学院 一种具有可见光催化特性的BiVO4薄膜制备方法
CN105463396A (zh) * 2016-01-19 2016-04-06 新疆中兴能源有限公司 一种直流磁控溅射制备光解水用钒酸铋薄膜的方法
CN105679880A (zh) * 2016-01-19 2016-06-15 新疆中兴能源有限公司 一种光解水用大面积钒酸铋薄膜的简易制备方法
US10179946B2 (en) * 2017-03-03 2019-01-15 Guardian Glass, LLC Coated article having low-E coating with IR reflecting layer(s) and niobium bismuth based high index layer and method of making same
CN107354476A (zh) * 2017-06-27 2017-11-17 青岛鲁润中科环境工程技术开发有限公司 铁基双金属氢氧化物/钒酸铋光阳极的制备方法及其应用
US11072855B2 (en) * 2017-08-04 2021-07-27 Royal Melbourne Institute Of Technology Vanadium oxide films and methods of fabricating the same
CN109078633A (zh) * 2018-08-24 2018-12-25 西南交通大学 一种W掺杂Bi2O3纳米结构的制备方法
CN110444402B (zh) * 2019-07-09 2020-09-25 淮阴工学院 一种提高BiVO4光阳极光电化学性能的方法
CN112725750B (zh) * 2020-12-12 2022-02-11 河南大学 利用磁控溅射技术制备bvo外延单晶薄膜的方法
CN114196916B (zh) * 2021-12-16 2024-05-07 西湖大学 一种金属反射镜的制备方法以及金属反射镜

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3140100C2 (de) * 1981-10-09 1986-11-27 Robert Bosch Gmbh, 7000 Stuttgart Mehrschichtsystem für Wärmeschutzanwendung
JPH1192922A (ja) * 1997-09-16 1999-04-06 Toshiba Corp 誘電体膜形成用スパッタリングターゲット、その製造方法および強誘電体メモリの製造方法
JP2003311157A (ja) * 2002-04-18 2003-11-05 Toyota Central Res & Dev Lab Inc 金属酸化物光触媒体及びその製造方法
JP4203288B2 (ja) * 2002-09-18 2008-12-24 旭化成ケミカルズ株式会社 光触媒フィルム、および該光触媒フィルムが貼付された部材
JP4208666B2 (ja) * 2003-07-18 2009-01-14 エスケー化研株式会社 バナジン酸ビスマス微粒子の製造方法
FR2857885B1 (fr) * 2003-07-23 2006-12-22 Saint Gobain Procede de preparation d'un revetement photocatalytique integre dans le traitement thermique d'un vitrage
JP2005058941A (ja) * 2003-08-18 2005-03-10 Asahi Kasei Chemicals Corp 防汚性プラズマディスプレイパネル
FR2868770B1 (fr) * 2004-04-09 2006-06-02 Saint Gobain Substrat, notamment substrat verrier, portant une couche a propriete photocatalytique modifiee pour pouvoir absorber des photons du visible
FR2868792B1 (fr) * 2004-04-13 2006-05-26 Saint Gobain Substrat photocatalytique actif sous lumiere visible
FR2873460B1 (fr) * 2004-07-21 2006-10-06 Saint Gobain Systeme electrochimique a electrolyte non oxyde
DE102004046390A1 (de) * 2004-09-24 2006-04-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Vakuumbeschichten mit einer photohalbleitenden Schicht und Anwendung des Verfahrens
US20080105535A1 (en) * 2004-12-13 2008-05-08 Osaka University Composite Metal Oxide Photocatalyst Exhibiting Responsibility to Visible Light
CN1308070C (zh) * 2005-05-19 2007-04-04 武汉理工大学 制备具有可见光活性纳晶Bi2WO6粉末光催化材料的水热－热处理方法
JP2007117999A (ja) * 2005-09-29 2007-05-17 Sumitomo Metal Ind Ltd 酸化チタン系光触媒とその用途
US8679587B2 (en) * 2005-11-29 2014-03-25 State of Oregon acting by and through the State Board of Higher Education action on Behalf of Oregon State University Solution deposition of inorganic materials and electronic devices made comprising the inorganic materials
JP5332099B2 (ja) * 2006-11-20 2013-11-06 日産自動車株式会社 自動車用光触媒システム
FR2911130B1 (fr) 2007-01-05 2009-11-27 Saint Gobain Procede de depot de couche mince et produit obtenu
US7820296B2 (en) * 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coating technology
US20100155218A1 (en) * 2008-12-12 2010-06-24 University Of South Carolina Novel Photocatalysts that Operate Under Visible Light

Also Published As

Publication number Publication date
WO2011003974A1 (fr) 2011-01-13
FR2947816A1 (fr) 2011-01-14
EP2451755A1 (fr) 2012-05-16
JP2012532985A (ja) 2012-12-20
CN102471143A (zh) 2012-05-23
US20120258858A1 (en) 2012-10-11

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20150331