FR2933105B1 - Procede de depot non-electrolytique - Google Patents

Procede de depot non-electrolytique

Info

Publication number
FR2933105B1
FR2933105B1 FR0854341A FR0854341A FR2933105B1 FR 2933105 B1 FR2933105 B1 FR 2933105B1 FR 0854341 A FR0854341 A FR 0854341A FR 0854341 A FR0854341 A FR 0854341A FR 2933105 B1 FR2933105 B1 FR 2933105B1
Authority
FR
France
Prior art keywords
deposition method
electrolytic deposition
electrolytic
deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0854341A
Other languages
English (en)
Other versions
FR2933105A1 (fr
Inventor
Sandrine Duluard
Claudine Biver
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EssilorLuxottica SA
Original Assignee
Essilor International Compagnie Generale dOptique SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR0854341A priority Critical patent/FR2933105B1/fr
Application filed by Essilor International Compagnie Generale dOptique SA filed Critical Essilor International Compagnie Generale dOptique SA
Priority to US12/995,290 priority patent/US8551561B2/en
Priority to CN200980125637.0A priority patent/CN102124143B/zh
Priority to PCT/FR2009/051194 priority patent/WO2009156692A2/fr
Priority to KR1020107029239A priority patent/KR101595504B1/ko
Priority to JP2011515554A priority patent/JP5511809B2/ja
Priority to EP09769533.2A priority patent/EP2300635B1/fr
Publication of FR2933105A1 publication Critical patent/FR2933105A1/fr
Application granted granted Critical
Publication of FR2933105B1 publication Critical patent/FR2933105B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/54—Contact plating, i.e. electroless electrochemical plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
  • Chemically Coating (AREA)
FR0854341A 2008-06-27 2008-06-27 Procede de depot non-electrolytique Expired - Fee Related FR2933105B1 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FR0854341A FR2933105B1 (fr) 2008-06-27 2008-06-27 Procede de depot non-electrolytique
CN200980125637.0A CN102124143B (zh) 2008-06-27 2009-06-23 非电解沉积方法
PCT/FR2009/051194 WO2009156692A2 (fr) 2008-06-27 2009-06-23 Procede de depot non-electrolytique.
KR1020107029239A KR101595504B1 (ko) 2008-06-27 2009-06-23 비전해 증착 방법
US12/995,290 US8551561B2 (en) 2008-06-27 2009-06-23 Non-electrolytic deposition method
JP2011515554A JP5511809B2 (ja) 2008-06-27 2009-06-23 非電気堆積法
EP09769533.2A EP2300635B1 (fr) 2008-06-27 2009-06-23 Procédé de dépôt non-électrolytique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0854341A FR2933105B1 (fr) 2008-06-27 2008-06-27 Procede de depot non-electrolytique

Publications (2)

Publication Number Publication Date
FR2933105A1 FR2933105A1 (fr) 2010-01-01
FR2933105B1 true FR2933105B1 (fr) 2010-09-03

Family

ID=40260515

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0854341A Expired - Fee Related FR2933105B1 (fr) 2008-06-27 2008-06-27 Procede de depot non-electrolytique

Country Status (7)

Country Link
US (1) US8551561B2 (fr)
EP (1) EP2300635B1 (fr)
JP (1) JP5511809B2 (fr)
KR (1) KR101595504B1 (fr)
CN (1) CN102124143B (fr)
FR (1) FR2933105B1 (fr)
WO (1) WO2009156692A2 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2960558B1 (fr) 2010-05-27 2012-06-08 Essilor Int Procede de fabrication d'un article electrochrome
FR2963936B1 (fr) * 2010-08-17 2012-08-31 Essilor Int Procede de fabrication d'un article electrochrome
US20140036223A1 (en) * 2011-02-03 2014-02-06 Essilor International (Compagnie Generale D'optique) Self-healing transparent coatings containing mineral conductive colloids
US9897886B2 (en) 2015-02-10 2018-02-20 LAFORGE Optical, Inc. Lens for displaying a virtual image

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4590117A (en) * 1983-03-10 1986-05-20 Toray Industries, Inc. Transparent material having antireflective coating
JPH079523B2 (ja) * 1986-04-14 1995-02-01 日本板硝子株式会社 Ｅｃ膜つき基板の製造方法
JPS6422985A (en) * 1987-07-17 1989-01-25 Nitto Denko Corp Electrochromic display element
US6744549B2 (en) * 2002-03-19 2004-06-01 Dow Global Technologies Inc. Electrochromic display device
DE102004030930A1 (de) * 2004-06-25 2006-02-23 Ormecon Gmbh Zinnbeschichtete Leiterplatten mit geringer Neigung zur Whiskerbildung
EP1630252A1 (fr) * 2004-08-27 2006-03-01 ATOTECH Deutschland GmbH Procédé de dépot d'etain ou d'alliages d'etain sur des substrats contenant de l'antimoine

Also Published As

Publication number Publication date
JP5511809B2 (ja) 2014-06-04
US8551561B2 (en) 2013-10-08
WO2009156692A2 (fr) 2009-12-30
FR2933105A1 (fr) 2010-01-01
KR20110028300A (ko) 2011-03-17
JP2011526000A (ja) 2011-09-29
EP2300635B1 (fr) 2017-10-11
CN102124143B (zh) 2013-07-31
US20110070361A1 (en) 2011-03-24
KR101595504B1 (ko) 2016-02-17
CN102124143A (zh) 2011-07-13
EP2300635A2 (fr) 2011-03-30
WO2009156692A3 (fr) 2010-06-24

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Legal Events

Date Code Title Description
PLFP Fee payment

Year of fee payment: 8

PLFP Fee payment

Year of fee payment: 9

PLFP Fee payment

Year of fee payment: 10

PLFP Fee payment

Year of fee payment: 11

TP Transmission of property

Owner name: ESSILOR INTERNATIONAL, FR

Effective date: 20180601

ST Notification of lapse

Effective date: 20200206