FR2902925B1 - Appareil et procede de fabrication d'un motif de couches minces et solution de reserve de gravure utilisee. - Google Patents
Appareil et procede de fabrication d'un motif de couches minces et solution de reserve de gravure utilisee.Info
- Publication number
- FR2902925B1 FR2902925B1 FR0610708A FR0610708A FR2902925B1 FR 2902925 B1 FR2902925 B1 FR 2902925B1 FR 0610708 A FR0610708 A FR 0610708A FR 0610708 A FR0610708 A FR 0610708A FR 2902925 B1 FR2902925 B1 FR 2902925B1
- Authority
- FR
- France
- Prior art keywords
- thin film
- film pattern
- manufacturing thin
- reserve solution
- etch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
- H01L21/0212—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC the material being fluoro carbon compounds, e.g.(CFx) n, (CHxFy) n or polytetrafluoroethylene
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
- H01L21/02288—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating printing, e.g. ink-jet printing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/312—Organic layers, e.g. photoresist
- H01L21/3127—Layers comprising fluoro (hydro)carbon compounds, e.g. polytetrafluoroethylene
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/02—Materials and properties organic material
- G02F2202/022—Materials and properties organic material polymeric
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/28—Adhesive materials or arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2209/00—Apparatus and processes for manufacture of discharge tubes
- H01J2209/02—Manufacture of cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/1292—Multistep manufacturing methods using liquid deposition, e.g. printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Nonlinear Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Electroluminescent Light Sources (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Printing Methods (AREA)
- Liquid Crystal (AREA)
- Printing Plates And Materials Therefor (AREA)
- Optical Filters (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060056739A KR101264688B1 (ko) | 2006-06-23 | 2006-06-23 | 박막 패턴의 제조장치 및 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2902925A1 FR2902925A1 (fr) | 2007-12-28 |
FR2902925B1 true FR2902925B1 (fr) | 2011-06-10 |
Family
ID=38872606
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0610708A Expired - Fee Related FR2902925B1 (fr) | 2006-06-23 | 2006-12-08 | Appareil et procede de fabrication d'un motif de couches minces et solution de reserve de gravure utilisee. |
Country Status (5)
Country | Link |
---|---|
US (2) | US20070295688A1 (fr) |
JP (1) | JP4921948B2 (fr) |
KR (1) | KR101264688B1 (fr) |
CN (1) | CN101093349B (fr) |
FR (1) | FR2902925B1 (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101298464B1 (ko) * | 2008-12-24 | 2013-08-23 | 엘지디스플레이 주식회사 | 레지스트 용액 및 이를 이용한 패턴 형성방법 |
WO2014078011A1 (fr) * | 2012-11-14 | 2014-05-22 | Sun Chemical Corporation | Compositions et processus pour une fabrication de cellules solaires passivées par l'arrière |
JP2014226876A (ja) * | 2013-05-24 | 2014-12-08 | ソニー株式会社 | ブランケットおよび印刷方法ならびに表示装置および電子機器の製造方法 |
JP2015159277A (ja) * | 2014-01-23 | 2015-09-03 | パナソニック株式会社 | 電子デバイスの製造方法 |
KR101919122B1 (ko) * | 2014-08-12 | 2018-11-15 | 주식회사 제우스 | 공정 분리형 기판 처리장치 및 처리방법 |
CN110620065A (zh) * | 2019-08-26 | 2019-12-27 | 石狮市纳傲贸易有限公司 | 一种晶圆加工设备 |
CN117116812B (zh) * | 2023-10-18 | 2023-12-26 | 贵州芯际探索科技有限公司 | 一种沟槽栅蚀刻装置及蚀刻方法 |
Family Cites Families (29)
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US3085907A (en) * | 1958-04-01 | 1963-04-16 | Rohm & Haas | Aqueous polymeric methyl methacrylate compositions for coating cement products and methods for coating such products |
FR2328070A1 (fr) * | 1975-10-17 | 1977-05-13 | Ugine Kuhlmann | Produits anti-tache permettant l'elimination facile des salissures au lavage |
US4752353A (en) * | 1982-09-29 | 1988-06-21 | Corning Glass Works | Method for transfer printing of TV shadow mask resist |
US4808501A (en) * | 1985-10-15 | 1989-02-28 | Polaroid Corporation, Patent Dept. | Method for manufacturing an optical filter |
US5079122A (en) | 1990-07-03 | 1992-01-07 | Xerox Corporation | Toner compositions with charge enhancing additives |
US5535673A (en) * | 1993-11-03 | 1996-07-16 | Corning Incorporated | Method of printing a color filter |
US5533447A (en) * | 1993-11-03 | 1996-07-09 | Corning Incorporated | Method and apparatus for printing a color filter ink pattern |
TW353158B (en) * | 1994-03-09 | 1999-02-21 | Nat Starch Chem Invest | Aqueous photoresist composition, method for preparing the same and circuit board comprising thereof |
JPH11307633A (ja) * | 1997-11-17 | 1999-11-05 | Sony Corp | 低誘電率膜を有する半導体装置、およびその製造方法 |
US6156860A (en) * | 1997-02-18 | 2000-12-05 | Dainippon Ink And Chemicals, Inc. | Surface active agent containing fluorine and coating compositions using the same |
JPH10330683A (ja) | 1997-05-29 | 1998-12-15 | Dainippon Ink & Chem Inc | 離型性コート剤および其の塗工方法 |
US6037104A (en) * | 1998-09-01 | 2000-03-14 | Micron Display Technology, Inc. | Methods of forming semiconductor devices and methods of forming field emission displays |
US6255130B1 (en) * | 1998-11-19 | 2001-07-03 | Samsung Electronics Co., Ltd. | Thin film transistor array panel and a method for manufacturing the same |
JP2000327968A (ja) | 1999-05-21 | 2000-11-28 | Dainippon Ink & Chem Inc | 着色マイクロカプセル分散型水性ジェットインク |
US6472028B1 (en) * | 1999-08-12 | 2002-10-29 | Joseph Frazzitta | Method of producing a high gloss coating on a printed surface |
JP2001194785A (ja) * | 2000-01-11 | 2001-07-19 | Mitsubishi Electric Corp | レジストパターン微細化材料及びこの材料を用いた半導体装置の製造方法並びにこの製造方法を用いた半導体装置 |
JP2001269564A (ja) | 2000-03-27 | 2001-10-02 | Dainippon Ink & Chem Inc | フッ素系界面活性剤及びその組成物 |
JP3802732B2 (ja) | 2000-05-12 | 2006-07-26 | 信越化学工業株式会社 | レジスト材料及びパターン形成方法 |
KR100437475B1 (ko) * | 2001-04-13 | 2004-06-23 | 삼성에스디아이 주식회사 | 평판 디스플레이 장치용 표시 소자 제조 방법 |
JP3847580B2 (ja) * | 2001-06-29 | 2006-11-22 | 富士フイルムエレクトロニクスマテリアルズ株式会社 | 光硬化性組成物 |
JP2004006325A (ja) * | 2002-04-26 | 2004-01-08 | Oce Technol Bv | 基礎支持体にコーティング層を自由選択でコーティング模様の形態に形成する方法 |
CN1241054C (zh) * | 2003-01-27 | 2006-02-08 | 奇美电子股份有限公司 | 半透半反式薄膜晶体管液晶显示面板及其制造方法 |
JP2004286795A (ja) | 2003-03-19 | 2004-10-14 | Konica Minolta Holdings Inc | 熱現像写真感光材料 |
BRPI0414883A (pt) | 2003-09-29 | 2006-12-12 | Ethena Healthcare Inc | composição, concentrado de composição, e, composições alcoólicas desinfetante e semelhante a gel |
JP4828791B2 (ja) * | 2003-10-24 | 2011-11-30 | 光村印刷株式会社 | 精密パターニング用インキ組成物 |
JP2006037060A (ja) | 2004-07-30 | 2006-02-09 | Hitachi Chem Co Ltd | 印刷インキ組成物、凸版反転オフセット法、レジストパターンの形成法、電子部品の製造法及び電子部品 |
JP4768977B2 (ja) | 2004-09-14 | 2011-09-07 | 株式会社リコー | インクジェット記録装置及びインクジェット記録方法 |
CN1313876C (zh) * | 2005-01-19 | 2007-05-02 | 广辉电子股份有限公司 | 薄膜晶体管液晶显示器的像素结构的制造方法 |
JP2007203544A (ja) * | 2006-01-31 | 2007-08-16 | Ricoh Co Ltd | 記録方法および印刷物 |
-
2006
- 2006-06-23 KR KR1020060056739A patent/KR101264688B1/ko active IP Right Grant
- 2006-12-08 CN CN2006101688635A patent/CN101093349B/zh not_active Expired - Fee Related
- 2006-12-08 FR FR0610708A patent/FR2902925B1/fr not_active Expired - Fee Related
- 2006-12-15 US US11/639,282 patent/US20070295688A1/en not_active Abandoned
- 2006-12-15 JP JP2006338497A patent/JP4921948B2/ja not_active Expired - Fee Related
-
2011
- 2011-04-28 US US13/096,614 patent/US9091873B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
KR101264688B1 (ko) | 2013-05-16 |
FR2902925A1 (fr) | 2007-12-28 |
JP4921948B2 (ja) | 2012-04-25 |
JP2008004911A (ja) | 2008-01-10 |
US20110206847A1 (en) | 2011-08-25 |
CN101093349A (zh) | 2007-12-26 |
KR20070121910A (ko) | 2007-12-28 |
US9091873B2 (en) | 2015-07-28 |
CN101093349B (zh) | 2010-12-08 |
US20070295688A1 (en) | 2007-12-27 |
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Effective date: 20210806 |