FR2838531B1 - Un substrat de matrice pour afficheur a cristal liquide et un procede de fabrication d'un tel substrat - Google Patents

Un substrat de matrice pour afficheur a cristal liquide et un procede de fabrication d'un tel substrat

Info

Publication number
FR2838531B1
FR2838531B1 FR0304702A FR0304702A FR2838531B1 FR 2838531 B1 FR2838531 B1 FR 2838531B1 FR 0304702 A FR0304702 A FR 0304702A FR 0304702 A FR0304702 A FR 0304702A FR 2838531 B1 FR2838531 B1 FR 2838531B1
Authority
FR
France
Prior art keywords
substrate
manufacturing
liquid crystal
crystal display
matrix substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0304702A
Other languages
English (en)
Other versions
FR2838531A1 (fr
Inventor
Byoung Ho Lim
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Display Co Ltd
Original Assignee
LG Philips LCD Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Philips LCD Co Ltd filed Critical LG Philips LCD Co Ltd
Publication of FR2838531A1 publication Critical patent/FR2838531A1/fr
Application granted granted Critical
Publication of FR2838531B1 publication Critical patent/FR2838531B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1345—Conductors connecting electrodes to cell terminals
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1345—Conductors connecting electrodes to cell terminals
    • G02F1/13458—Terminal pads
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136254—Checking; Testing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1259—Multistep manufacturing methods
    • H01L27/1288—Multistep manufacturing methods employing particular masking sequences or specially adapted masks, e.g. half-tone mask
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
FR0304702A 2002-04-16 2003-04-15 Un substrat de matrice pour afficheur a cristal liquide et un procede de fabrication d'un tel substrat Expired - Fee Related FR2838531B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2002-0020727A KR100443539B1 (ko) 2002-04-16 2002-04-16 액정표시장치용 어레이기판과 그 제조방법

Publications (2)

Publication Number Publication Date
FR2838531A1 FR2838531A1 (fr) 2003-10-17
FR2838531B1 true FR2838531B1 (fr) 2004-08-20

Family

ID=36083942

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0304702A Expired - Fee Related FR2838531B1 (fr) 2002-04-16 2003-04-15 Un substrat de matrice pour afficheur a cristal liquide et un procede de fabrication d'un tel substrat

Country Status (8)

Country Link
US (2) US6873392B2 (fr)
JP (1) JP3672302B2 (fr)
KR (1) KR100443539B1 (fr)
CN (1) CN100594409C (fr)
DE (1) DE10317628B4 (fr)
FR (1) FR2838531B1 (fr)
GB (1) GB2387708B (fr)
TW (1) TWI230306B (fr)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100680701B1 (ko) 2004-07-23 2007-02-08 엘지전자 주식회사 모기판 및 이를 이용한 유기전계발광표시소자의 제조방법
KR101051012B1 (ko) * 2004-08-06 2011-07-21 삼성전자주식회사 표시 패널용 모기판 및 그의 제조 방법
KR101051008B1 (ko) * 2004-08-24 2011-07-21 삼성전자주식회사 어레이 기판의 제조 방법과, 이에 의해 제조된 어레이 기판
KR101100883B1 (ko) * 2004-11-08 2012-01-02 삼성전자주식회사 박막 트랜지스터 표시판
KR101107246B1 (ko) 2004-12-24 2012-01-25 엘지디스플레이 주식회사 박막 트랜지스터 기판 및 그 제조 방법
KR101107245B1 (ko) 2004-12-24 2012-01-25 엘지디스플레이 주식회사 수평 전계 박막 트랜지스터 기판 및 그 제조 방법
KR101080705B1 (ko) * 2004-12-28 2011-11-07 엘지디스플레이 주식회사 칩 온 글라스 구조 액정표시장치용 어레이 기판
KR100663029B1 (ko) 2004-12-31 2006-12-28 엘지.필립스 엘시디 주식회사 액정표시장치 , 그 제조방법 및 액정표시장치 검사방법
US7705924B2 (en) 2005-02-22 2010-04-27 Samsung Electronics Co., Ltd. Liquid crystal display and test method thereof
TWI271679B (en) * 2005-05-03 2007-01-21 Chunghwa Picture Tubes Ltd Array of active devices and method for testing an array of active devices
KR101082893B1 (ko) * 2005-08-24 2011-11-11 삼성전자주식회사 어레이 기판 및 이를 갖는 표시장치
CN100416344C (zh) * 2006-01-18 2008-09-03 中华映管股份有限公司 主动元件阵列基板、液晶显示面板与两者的检测方法
CN100449318C (zh) * 2006-04-11 2009-01-07 友达光电股份有限公司 检测线路阵列是否短路的装置及其方法
CN100388108C (zh) * 2006-04-14 2008-05-14 友达光电股份有限公司 液晶显示器组件与薄膜晶体管基板及测试方法
CN101621038B (zh) * 2008-07-01 2011-11-09 中华映管股份有限公司 有源元件阵列基板的制造方法
KR101337195B1 (ko) 2008-10-10 2013-12-05 엘지디스플레이 주식회사 액정표시장치용 어레이기판 및 그의 제조방법, 이를 구비한액정표시장치
CN101726943B (zh) * 2008-10-21 2012-08-22 华映视讯（吴江）有限公司 主动元件阵列基板、液晶显示面板及两者的检测方法
US9275932B2 (en) 2011-05-24 2016-03-01 Sharp Kabushiki Kaisha Active matrix substrate, and display device
KR101726641B1 (ko) * 2011-08-03 2017-04-26 엘지디스플레이 주식회사 인쇄판의 제조 방법
GB201304939D0 (en) 2013-03-18 2013-05-01 Cellucomp Ltd Process for Preparing Cellulose-Containing Particles from Plant Material
CN103337477B (zh) * 2013-05-27 2015-06-03 北京京东方光电科技有限公司 阵列基板的制备方法及阵列基板和显示装置
KR102272789B1 (ko) * 2014-01-15 2021-07-05 삼성디스플레이 주식회사 표시 패널 및 이를 포함하는 표시 장치
CN105182640B (zh) * 2015-09-06 2019-06-07 京东方科技集团股份有限公司 阵列基板及显示装置
CN105096899B (zh) * 2015-09-22 2018-09-25 深圳市华星光电技术有限公司 阵列基板、液晶显示面板及液晶显示装置
CN106444189A (zh) * 2016-10-13 2017-02-22 京东方科技集团股份有限公司 一种阵列基板、其检测方法及显示装置
CN107728393B (zh) * 2017-11-07 2023-08-08 深圳市华星光电半导体显示技术有限公司 Hva焊垫共用结构
US10330996B2 (en) * 2017-11-07 2019-06-25 Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. Common structure of high vertical alignment pads
CN109239999B (zh) * 2018-11-12 2020-12-04 惠科股份有限公司 软性电路板、显示面板及显示装置
CN112230485B (zh) * 2020-10-27 2022-05-20 厦门天马微电子有限公司 一种阵列基板、显示面板及显示装置

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0465168A (ja) * 1990-07-05 1992-03-02 Hitachi Ltd 薄膜トランジスタ
US5486939A (en) * 1994-04-28 1996-01-23 Xerox Corporation Thin-film structure with insulating and smoothing layers between crossing conductive lines
JP3315834B2 (ja) * 1995-05-31 2002-08-19 富士通株式会社 薄膜トランジスタマトリクス装置及びその製造方法
US5668032A (en) * 1995-07-31 1997-09-16 Holmberg; Scott H. Active matrix ESD protection and testing scheme
US6613650B1 (en) * 1995-07-31 2003-09-02 Hyundai Electronics America Active matrix ESD protection and testing scheme
KR100239779B1 (ko) * 1996-12-04 2000-01-15 구본준 액정표시장치
JP4294096B2 (ja) * 1997-01-13 2009-07-08 ヒュンダイ エレクトロニクス アメリカ 改良されたアクティブ・マトリクスのｅｓｄ保護および試験体系
KR100244449B1 (ko) * 1997-02-11 2000-02-01 구본준 박막 트랜지스터 검사용 단락 배선을 갖는 액정 표시 장치와 그 제조 방법(liquid crystal display having shorting bar for testing tft and method for manufacturing the same)
US6734925B1 (en) * 1998-12-07 2004-05-11 Samsung Electronics Co., Ltd. Multiple testing bars for testing liquid crystal display and method thereof
KR100490040B1 (ko) * 1997-12-05 2005-09-06 삼성전자주식회사 두개이상의쇼팅바를갖는액정표시장치및그제조방법
KR100281058B1 (ko) * 1997-11-05 2001-02-01 구본준, 론 위라하디락사 액정표시장치
KR100569715B1 (ko) * 1998-08-21 2006-07-31 삼성전자주식회사 평면 구동 방식 액정 표시 장치의 제조 방법
US6246074B1 (en) * 1998-09-30 2001-06-12 Lg.Philips Lcd Co., Ltd. Thin film transistor substrate with testing circuit
KR100303207B1 (ko) * 1998-11-13 2002-05-13 구본준, 론 위라하디락사 검사회로를가지는박막트랜지스터매트릭스기판
KR20000026540A (ko) * 1998-10-21 2000-05-15 윤종용 4장의 마스크를 이용한 액정 표시 장치용 박막 트랜지스터 기판의 제조 방법 및 액정 표시 장치용박막 트랜지스터 기판
US6353464B1 (en) * 1998-11-20 2002-03-05 Kabushiki Kaisha Advanced Display TFT array substrate, liquid crystal display using TFT array substrate, and manufacturing method thereof in which the interlayer insulating film covers the guard resistance and the short ring
US6545359B1 (en) * 1998-12-18 2003-04-08 Semiconductor Energy Laboratory Co., Ltd. Wiring line and manufacture process thereof, and semiconductor device and manufacturing process thereof
US6380559B1 (en) * 1999-06-03 2002-04-30 Samsung Electronics Co., Ltd. Thin film transistor array substrate for a liquid crystal display
JP2002040481A (ja) * 2000-07-24 2002-02-06 Internatl Business Mach Corp <Ibm> 表示装置、その製造方法、及び配線基板
FR2815143B1 (fr) * 2000-10-11 2005-11-18 Lg Philips Lcd Co Ltd Substrat reseau pour un affichage a cristaux liquides et methode de fabrication de celui-ci
KR100769160B1 (ko) * 2000-12-29 2007-10-23 엘지.필립스 엘시디 주식회사 액정표시장치의 테스트 패드

Also Published As

Publication number Publication date
TW200305765A (en) 2003-11-01
TWI230306B (en) 2005-04-01
JP2003337349A (ja) 2003-11-28
DE10317628A1 (de) 2003-10-30
GB2387708B (en) 2004-06-09
GB2387708A (en) 2003-10-22
CN1453615A (zh) 2003-11-05
US6873392B2 (en) 2005-03-29
FR2838531A1 (fr) 2003-10-17
US20050200768A1 (en) 2005-09-15
JP3672302B2 (ja) 2005-07-20
KR100443539B1 (ko) 2004-08-09
GB0308207D0 (en) 2003-05-14
US7268838B2 (en) 2007-09-11
US20030193623A1 (en) 2003-10-16
CN100594409C (zh) 2010-03-17
KR20030082146A (ko) 2003-10-22
DE10317628B4 (de) 2007-08-09

Similar Documents

Publication Publication Date Title
FR2838531B1 (fr) Un substrat de matrice pour afficheur a cristal liquide et un procede de fabrication d&#39;un tel substrat
FR2838562B1 (fr) Procede de fabrication d&#39;un substrat de matrice d&#39;un dispositif d&#39;affichage a cristaux liquides
FR2873826B1 (fr) Substrat de matrice pour un ecran a cristaux liquides et procede de fabrication de ce dernier
FR2746961B1 (fr) Substrat a transistor pour un dispositif d&#39;affichage a cristal liquide et son procede de fabrication
FR2761812B1 (fr) Afficheur a cristal liquide et procede de fabrication d&#39;un tel afficheur
FR2866722B1 (fr) Dispositif d&#39;affichage a cristaux liquides et procede de fabrication d&#39;un tel dispositif
FR2879763B1 (fr) Dispositif d&#39;ecran a cristaux liquides et procede de fabrication de son substrat a matrice
FR2875308B1 (fr) Substrat pour dispositif d&#39;affichage a cristaux liquides et procede de fabrication de celui-ci
FR2866748B1 (fr) Dispositif d&#39;affichage a cristal liquide et son procede de fabrication
FR2749963B1 (fr) Dispositif d&#39;affichage a cristal liquide a matrice active et procede de fabrication d&#39;un tel dispositif
FR2755518B1 (fr) Procede de fabrication d&#39;un afficheur a cristal liquide
FR2746195B1 (fr) Dispositif d&#39;affichage a cristal liquide et procede de fabrication d&#39;un tel dispositif
FR2880141B1 (fr) Dispositif d&#39;affichage a cristaux liquides et son procede de fabrication
GB2372869B (en) Array substrate for a liquid crystal display device and method of fabricating thereof
FR2878981B1 (fr) Dispositif d&#39;affichage a cristaux liquides et procede de fabrication de ce dernier
FR2864640B1 (fr) Dispositif d&#39;affichage a cristaux liquides de type trans-reflecteur et procede de fabrication de celui-ci
FR2756665B1 (fr) Afficheur a cristal liquide et son procede de fabrication
FR2737938B1 (fr) Dispositif d&#39;affichage a cristaux liquides et un procede de fabrication d&#39;un tel dispositif
FR2872595B1 (fr) Dispositif d&#39;affichage a cristaux liquides et son procede de fabrication
FR2859287B1 (fr) Procede de fabrication d&#39;un dispositif d&#39;affichage a cristaux liquides
FR2856484B1 (fr) Dispositif d&#39;affichage a cristaux liquides et procede de fabrication de celui-ci
FR2847043B1 (fr) Substrat de matrice d&#39;un dispositif d&#39;affichage a cristal liquide et son procede de fabrication
FR2842311B1 (fr) Afficheur a cristaux liquides transflectif et procede de fabrication de celui-ci
FR2862769B1 (fr) Substrat inferieur, dispositif d&#39;affichage a cristal liquide a mode ips et son procede de fabrication
FR2790584B1 (fr) Procede de pilotage d&#39;un afficheur a cristal liquide

Legal Events

Date Code Title Description
CD Change of name or company name
PLFP Fee payment

Year of fee payment: 14

PLFP Fee payment

Year of fee payment: 15

PLFP Fee payment

Year of fee payment: 16

PLFP Fee payment

Year of fee payment: 18

PLFP Fee payment

Year of fee payment: 19

ST Notification of lapse

Effective date: 20221205