FR2829507B1 - Appareil et procede de depot en phase gazeuse par processus chimique - Google Patents
Appareil et procede de depot en phase gazeuse par processus chimiqueInfo
- Publication number
- FR2829507B1 FR2829507B1 FR0211137A FR0211137A FR2829507B1 FR 2829507 B1 FR2829507 B1 FR 2829507B1 FR 0211137 A FR0211137 A FR 0211137A FR 0211137 A FR0211137 A FR 0211137A FR 2829507 B1 FR2829507 B1 FR 2829507B1
- Authority
- FR
- France
- Prior art keywords
- gas phase
- chemical process
- phase deposition
- deposition
- chemical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001311 chemical methods and process Methods 0.000 title 1
- 230000008021 deposition Effects 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/4557—Heated nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/950,013 US6793966B2 (en) | 2001-09-10 | 2001-09-10 | Chemical vapor deposition apparatus and method |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2829507A1 FR2829507A1 (fr) | 2003-03-14 |
FR2829507B1 true FR2829507B1 (fr) | 2006-06-09 |
Family
ID=25489831
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0211137A Expired - Lifetime FR2829507B1 (fr) | 2001-09-10 | 2002-09-09 | Appareil et procede de depot en phase gazeuse par processus chimique |
Country Status (6)
Country | Link |
---|---|
US (2) | US6793966B2 (fr) |
JP (1) | JP4327427B2 (fr) |
CA (1) | CA2402040C (fr) |
DE (1) | DE10241964B4 (fr) |
FR (1) | FR2829507B1 (fr) |
GB (1) | GB2379450B (fr) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6986814B2 (en) * | 2001-12-20 | 2006-01-17 | General Electric Company | Gas distributor for vapor coating method and container |
US7390535B2 (en) | 2003-07-03 | 2008-06-24 | Aeromet Technologies, Inc. | Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings |
US7153586B2 (en) * | 2003-08-01 | 2006-12-26 | Vapor Technologies, Inc. | Article with scandium compound decorative coating |
FR2882064B1 (fr) * | 2005-02-17 | 2007-05-11 | Snecma Propulsion Solide Sa | Procede de densification de substrats poreux minces par infiltration chimique en phase vapeur et dispositif de chargement de tels substrats |
US20070026205A1 (en) | 2005-08-01 | 2007-02-01 | Vapor Technologies Inc. | Article having patterned decorative coating |
US7597797B2 (en) * | 2006-01-09 | 2009-10-06 | Alliance Process Partners, Llc | System and method for on-line spalling of a coker |
US20090136664A1 (en) * | 2007-08-02 | 2009-05-28 | United Technologies Corporation | Method for forming aluminide diffusion coatings |
US20090134035A1 (en) * | 2007-08-02 | 2009-05-28 | United Technologies Corporation | Method for forming platinum aluminide diffusion coatings |
US20090035485A1 (en) * | 2007-08-02 | 2009-02-05 | United Technologies Corporation | Method for forming active-element aluminide diffusion coatings |
US20090317547A1 (en) * | 2008-06-18 | 2009-12-24 | Honeywell International Inc. | Chemical vapor deposition systems and methods for coating a substrate |
DE102008034330A1 (de) * | 2008-07-23 | 2010-01-28 | Ionbond Ag Olten | CVD-Reaktor zur Abscheidung von Schichten aus einem Reaktionsgasgemisch auf Werkstücken |
US9353625B2 (en) * | 2009-01-13 | 2016-05-31 | General Electric Technology Gmbh | Device for cleaning oxidized or corroded components in the presence of a halogenous gas mixture |
US10689753B1 (en) * | 2009-04-21 | 2020-06-23 | Goodrich Corporation | System having a cooling element for densifying a substrate |
CN102292465B (zh) | 2009-05-20 | 2014-04-09 | 豪梅特公司 | Pt-Al-Hf/Zr涂层及方法 |
CN102485953B (zh) * | 2010-12-01 | 2014-07-30 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 托盘装置及结晶膜生长设备 |
US8541069B2 (en) | 2011-04-11 | 2013-09-24 | United Technologies Corporation | Method of guided non-line of sight coating |
US9068260B2 (en) | 2012-03-14 | 2015-06-30 | Andritz Iggesund Tools Inc. | Knife for wood processing and methods for plating and surface treating a knife for wood processing |
ES2859572T3 (es) | 2013-04-26 | 2021-10-04 | Howmet Corp | Electrodeposición del componente del perfil alar interno |
CA2866479C (fr) | 2013-12-20 | 2021-08-17 | Will N. Kirkendall | Electroplacage de composant de turbine interne |
US11427904B2 (en) | 2014-10-20 | 2022-08-30 | Raytheon Technologies Corporation | Coating system for internally-cooled component and process therefor |
MY190445A (en) | 2015-08-21 | 2022-04-21 | Flisom Ag | Homogeneous linear evaporation source |
TWI624554B (zh) * | 2015-08-21 | 2018-05-21 | 弗里松股份有限公司 | 蒸發源 |
US20200291523A1 (en) * | 2016-06-02 | 2020-09-17 | Applied Materials, Inc. | Continuous chemical vapor deposition (cvd) multi-zone process kit |
DE102018202297A1 (de) * | 2018-02-15 | 2019-08-22 | MTU Aero Engines AG | Vorrichtung und Verfahren zum Gasphasenbeschichten von Werkstücken |
EP3870734A1 (fr) * | 2018-10-26 | 2021-09-01 | LPE S.p.A. | Réacteur de dépôt doté de bobines d'induction et de blindages électromagnétiques |
DE102018130139A1 (de) * | 2018-11-28 | 2020-05-28 | Aixtron Se | Gaseinlassvorrichtung für einen CVD-Reaktor |
DE102018221579A1 (de) * | 2018-12-13 | 2020-06-18 | MTU Aero Engines AG | Vorrichtung und Verfahren zum Gasphasenbeschichten von Werkstücken |
DE102018133362A1 (de) * | 2018-12-21 | 2020-06-25 | Eisenmann Se | Injektionseinrichtung zum Abgeben eines Gases, Prozessgassystem zum Zuführen eines Prozessgases, sowie Vorrichtung und Verfahren zum thermischen oder thermo-chemischen Behandeln von Material |
Family Cites Families (71)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US989733A (en) | 1910-09-12 | 1911-04-18 | Jaburg Bros | Mixer. |
US2567932A (en) * | 1948-04-30 | 1951-09-18 | Hydrocarbon Research Inc | Stagewise process for the hydrogenation of carbon monoxide |
US2849293A (en) | 1954-11-26 | 1958-08-26 | Cabot Godfrey L Inc | Metal halide generator |
NL294879A (fr) * | 1962-07-11 | 1900-01-01 | ||
US3492097A (en) | 1966-10-14 | 1970-01-27 | Nat Lead Co | Metal halide generator |
US3764371A (en) | 1970-11-18 | 1973-10-09 | Alloy Surfaces Co Inc | Formation of diffusion coatings on nickel containing dispersed thoria |
US4108106A (en) | 1975-12-29 | 1978-08-22 | Tylan Corporation | Cross-flow reactor |
US4132816A (en) | 1976-02-25 | 1979-01-02 | United Technologies Corporation | Gas phase deposition of aluminum using a complex aluminum halide of an alkali metal or an alkaline earth metal as an activator |
US4052530A (en) * | 1976-08-09 | 1977-10-04 | Materials Technology Corporation | Co-deposited coating of aluminum oxide and titanium oxide and method of making same |
GB1586959A (en) | 1976-08-11 | 1981-03-25 | Dunlop Ltd | Method and apparatus for the production of carbon/carbon composite material |
US4264682A (en) * | 1978-10-27 | 1981-04-28 | Hitachi Metals, Ltd. | Surface hafnium-titanium compound coated hard alloy material and method of producing the same |
US4401689A (en) | 1980-01-31 | 1983-08-30 | Rca Corporation | Radiation heated reactor process for chemical vapor deposition on substrates |
US4421786A (en) | 1981-01-23 | 1983-12-20 | Western Electric Co. | Chemical vapor deposition reactor for silicon epitaxial processes |
FR2508063A1 (fr) | 1981-06-18 | 1982-12-24 | Snecma | Procede, en phase vapeur, pour le depot d'un revetement protecteur sur une piece metallique, dispositif pour sa mise en oeuvre et pieces obtenues selon ledit procede |
FR2526141B1 (fr) * | 1982-04-30 | 1988-02-26 | Electricite De France | Procede et installation de chauffage d'un lit fluidise par injection de plasma |
US4468283A (en) | 1982-12-17 | 1984-08-28 | Irfan Ahmed | Method for etching and controlled chemical vapor deposition |
JPS60110475A (ja) | 1983-11-21 | 1985-06-15 | Konishiroku Photo Ind Co Ltd | 感熱記録ヘッド |
WO1985003460A1 (fr) | 1984-02-13 | 1985-08-15 | Schmitt Jerome J Iii | Procede et appareil pour le depot par jet de gaz de minces films solides conducteurs et dielectriques et produits fabriques de la sorte |
US4580524A (en) | 1984-09-07 | 1986-04-08 | The United States Of America As Represented By The United States Department Of Energy | Process for the preparation of fiber-reinforced ceramic composites by chemical vapor deposition |
JPS61191015A (ja) * | 1985-02-20 | 1986-08-25 | Hitachi Ltd | 半導体の気相成長方法及びその装置 |
CA1251100A (fr) | 1985-05-17 | 1989-03-14 | Richard Cloutier | Systeme de distribution et de depot de vapeurs chimiques |
US4698244A (en) * | 1985-10-31 | 1987-10-06 | Air Products And Chemicals, Inc. | Deposition of titanium aluminides |
JPS62290121A (ja) | 1986-06-09 | 1987-12-17 | Nippon Telegr & Teleph Corp <Ntt> | 分子線エピタキシ装置 |
US5154907A (en) * | 1986-10-15 | 1992-10-13 | The Carborundum Company | Process for the continuous production of high purity, ultra-fine, aluminum nitride powder by the carbo-nitridization of alumina |
US4926793A (en) * | 1986-12-15 | 1990-05-22 | Shin-Etsu Handotai Co., Ltd. | Method of forming thin film and apparatus therefor |
US4890574A (en) | 1987-01-20 | 1990-01-02 | Gte Laboratories Incorporated | Internal reactor for chemical vapor deposition |
US5062386A (en) * | 1987-07-27 | 1991-11-05 | Epitaxy Systems, Inc. | Induction heated pancake epitaxial reactor |
US4895108A (en) | 1988-06-22 | 1990-01-23 | The Babcock & Wilcox Company | CVD apparatus and process for the preparation of fiber-reinforced ceramic composites |
US5227195A (en) * | 1989-04-04 | 1993-07-13 | Sri International | Low temperature method of forming materials using one or more metal reactants and a halogen-containing reactant to form one or more reactive intermediates |
JPH03107635A (ja) | 1989-09-22 | 1991-05-08 | Kayaba Ind Co Ltd | 油圧緩衝器のクツシヨン装置 |
HU207670B (en) | 1989-10-02 | 1993-05-28 | Richter Gedeon Vegyeszet | Method and apparatus for controlling the temperature of chemical reactions |
US5250323A (en) | 1989-10-30 | 1993-10-05 | Kabushiki Kaisha Toshiba | Chemical vapor growth apparatus having an exhaust device including trap |
US5279670A (en) | 1990-03-31 | 1994-01-18 | Tokyo Electron Sagami Limited | Vertical type diffusion apparatus |
US5146869A (en) * | 1990-06-11 | 1992-09-15 | National Semiconductor Corporation | Tube and injector for preheating gases in a chemical vapor deposition reactor |
US5071678A (en) * | 1990-10-09 | 1991-12-10 | United Technologies Corporation | Process for applying gas phase diffusion aluminide coatings |
DE4119967C1 (fr) * | 1991-06-18 | 1992-09-17 | Mtu Muenchen Gmbh | |
US5263530A (en) | 1991-09-11 | 1993-11-23 | Howmet Corporation | Method of making a composite casting |
US5362228A (en) | 1991-11-04 | 1994-11-08 | Societe Europeenne De Propulsion | Apparatus for preheating a flow of gas in an installation for chemical vapor infiltration, and a densification method using the apparatus |
US5221354A (en) | 1991-11-04 | 1993-06-22 | General Electric Company | Apparatus and method for gas phase coating of hollow articles |
US5264245A (en) | 1991-12-04 | 1993-11-23 | Howmet Corporation | CVD method for forming uniform coatings |
US5261963A (en) * | 1991-12-04 | 1993-11-16 | Howmet Corporation | CVD apparatus comprising exhaust gas condensation means |
EP0572150A3 (fr) | 1992-05-26 | 1993-12-29 | General Electric Company | Dépôt chimique en phase vapeur des revêtements d'alumine |
US5385689A (en) * | 1993-06-29 | 1995-01-31 | Novapure Corporation | Process and composition for purifying semiconductor process gases to remove Lewis acid and oxidant impurities therefrom |
JP3024449B2 (ja) * | 1993-07-24 | 2000-03-21 | ヤマハ株式会社 | 縦型熱処理炉及び熱処理方法 |
US5348774A (en) | 1993-08-11 | 1994-09-20 | Alliedsignal Inc. | Method of rapidly densifying a porous structure |
US6689422B1 (en) | 1994-02-16 | 2004-02-10 | Howmet Research Corporation | CVD codeposition of A1 and one or more reactive (gettering) elements to form protective aluminide coating |
US5976919A (en) | 1994-06-10 | 1999-11-02 | Matsushita Electric Industrial Co., Ltd. | Apparatus and method of manufacturing semiconductor element |
US5658614A (en) | 1994-10-28 | 1997-08-19 | Howmet Research Corporation | Platinum aluminide CVD coating method |
US5480678A (en) | 1994-11-16 | 1996-01-02 | The B. F. Goodrich Company | Apparatus for use with CVI/CVD processes |
FR2733254B1 (fr) | 1995-04-18 | 1997-07-18 | Europ Propulsion | Procede d'infiltration chimique en phase vapeur pour la densification de substrats poreux disposes en piles annulaires |
DE19514663A1 (de) * | 1995-04-20 | 1996-10-24 | Kronos Titan Gmbh | Metallchloridgenerator |
US5916633A (en) | 1995-05-19 | 1999-06-29 | Georgia Tech Research Corporation | Fabrication of carbon/carbon composites by forced flow-thermal gradient chemical vapor infiltration |
US5837320A (en) | 1996-02-27 | 1998-11-17 | The University Of New Mexico | Chemical vapor deposition of metal sulfide films from metal thiocarboxylate complexes with monodenate or multidentate ligands |
US5741363A (en) | 1996-03-22 | 1998-04-21 | Advanced Technology Materials, Inc. | Interiorly partitioned vapor injector for delivery of source reagent vapor mixtures for chemical vapor deposition |
JPH09330884A (ja) * | 1996-06-07 | 1997-12-22 | Sony Corp | エピタキシャル成長装置 |
TW336333B (en) | 1996-06-24 | 1998-07-11 | Nat Denki Kk | A substrate processing apparatus |
US5989733A (en) | 1996-07-23 | 1999-11-23 | Howmet Research Corporation | Active element modified platinum aluminide diffusion coating and CVD coating method |
DE19730007C1 (de) * | 1997-07-12 | 1999-03-25 | Mtu Muenchen Gmbh | Verfahren und Vorrichtung zur Gasphasendiffusionsbeschichtung von Werkstücken aus warmfestem Material mit einem Beschichtungsmaterial |
US5928725A (en) | 1997-07-18 | 1999-07-27 | Chromalloy Gas Turbine Corporation | Method and apparatus for gas phase coating complex internal surfaces of hollow articles |
US5948300A (en) | 1997-09-12 | 1999-09-07 | Kokusai Bti Corporation | Process tube with in-situ gas preheating |
US5993599A (en) * | 1998-05-13 | 1999-11-30 | Sony Corporation | Easy access chemical chamber window and frame |
US6302964B1 (en) * | 1998-06-16 | 2001-10-16 | Applied Materials, Inc. | One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing system |
US6143361A (en) | 1998-10-19 | 2000-11-07 | Howmet Research Corporation | Method of reacting excess CVD gas reactant |
US6224941B1 (en) | 1998-12-22 | 2001-05-01 | General Electric Company | Pulsed-vapor phase aluminide process for high temperature oxidation-resistant coating applications |
US6144802A (en) * | 1999-06-29 | 2000-11-07 | Hyundai Electronics Industries Co., Ltd. | Fluid heater for semiconductor device |
WO2001034871A1 (fr) | 1999-11-12 | 2001-05-17 | Far West Electrochemical, Inc. | Dispositif et procede permettant d'effectuer un depot chimique en phase vapeur simple |
DE60131698T2 (de) | 2000-05-31 | 2008-10-30 | Tokyo Electron Ltd. | Thermische Behandlungsvorrichtung und Verfahren |
US7458974B1 (en) | 2000-07-25 | 2008-12-02 | Endovascular Technologies, Inc. | Apparatus and method for electrically induced thrombosis |
US6451692B1 (en) * | 2000-08-18 | 2002-09-17 | Micron Technology, Inc. | Preheating of chemical vapor deposition precursors |
US6602356B1 (en) | 2000-09-20 | 2003-08-05 | General Electric Company | CVD aluminiding process for producing a modified platinum aluminide bond coat for improved high temperature performance |
AU2006262498B2 (en) | 2005-06-20 | 2011-11-03 | Nobles Medical Technologies, Inc. | Method and apparatus for applying a knot to a suture |
-
2001
- 2001-09-10 US US09/950,013 patent/US6793966B2/en not_active Expired - Lifetime
-
2002
- 2002-09-09 GB GB0220898A patent/GB2379450B/en not_active Expired - Lifetime
- 2002-09-09 JP JP2002262406A patent/JP4327427B2/ja not_active Expired - Lifetime
- 2002-09-09 CA CA2402040A patent/CA2402040C/fr not_active Expired - Lifetime
- 2002-09-09 FR FR0211137A patent/FR2829507B1/fr not_active Expired - Lifetime
- 2002-09-10 DE DE10241964.7A patent/DE10241964B4/de not_active Expired - Lifetime
-
2004
- 2004-05-24 US US10/852,079 patent/US6911234B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CA2402040A1 (fr) | 2003-03-10 |
US20030049374A1 (en) | 2003-03-13 |
GB0220898D0 (en) | 2002-10-16 |
GB2379450B (en) | 2005-06-15 |
DE10241964A1 (de) | 2003-03-27 |
US6793966B2 (en) | 2004-09-21 |
JP4327427B2 (ja) | 2009-09-09 |
CA2402040C (fr) | 2011-05-10 |
DE10241964B4 (de) | 2019-06-27 |
US20050000439A1 (en) | 2005-01-06 |
US6911234B2 (en) | 2005-06-28 |
JP2003113473A (ja) | 2003-04-18 |
FR2829507A1 (fr) | 2003-03-14 |
GB2379450A (en) | 2003-03-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2829507B1 (fr) | Appareil et procede de depot en phase gazeuse par processus chimique | |
NO20014304D0 (no) | Apparat for samtidig avsetning ved fysisk pådampning og kjemisk pådampning, og tilsvarende fremgangsmåte | |
DE60310291D1 (de) | Verfahren und Vorrichtung zur Gasphasenbeschichtung | |
NO20024319D0 (no) | Fremgangsmåte og anordning for syretilsetning av hydrokarbonkilder | |
FR2804618B1 (fr) | Procede de decarbonation de gaz brules, et appareil de decarbonation | |
FR2848121B1 (fr) | Procede de traitement d'un gaz naturel acide | |
NO20001150D0 (no) | FremgangsmÕte og apparatur for gassfase-polymerisasjon | |
FR2861403B1 (fr) | Procede de purification d'un gaz naturel par adsorption des mercaptans | |
DE60230242D1 (de) | Verfahren und Vorrichtung zur Diamantsynthese durch chemische Dampfabscheidung | |
NO20043512L (no) | Fjerning av syrer fra kjemiske reaksjonsblandinger ved hjelp av ioniske vaesker | |
PT958496E (pt) | Dispositivo e processo para cromatografia em aparelho | |
FR2856219B1 (fr) | Procede et appareil pour accomplir un processus de telecinema inverse | |
AU2003217530A1 (en) | Apparatus and method for depositing organic matter of vapor phase | |
DE60232696D1 (de) | Verfahren und Vorrichtung zur Behandlung von Synthesegas und verwandten Gasen | |
FR2834052B1 (fr) | Procede pour le suivi du deroulement d'un processus utilisant un gaz reactif contenant un ou plusieurs hydrocarbures gazeux | |
BR0208664B1 (pt) | aparelho e método para remover um gás de um lìquido. | |
DE60028636D1 (de) | Verfahren zur mehrstufigen Gasphasenpolymerisation und dafür geeignete Vorrichtung | |
FR2860591B1 (fr) | Procede d'identification de composants d'un gaz naturel par chromatographie en phase gazeuse. | |
FR2868962B1 (fr) | Procede de purification d'un gaz naturel par adsorption des mercaptans. | |
FR2864214B1 (fr) | Appareil de separation d'air, appareil integre de separation d'air et de production d'un metal et procede de demarrage d'un tel appareil de separation d'air | |
EP1693100A4 (fr) | Methode de restauration des caracteristiques de marche d'un dispositif de traitement des gaz d'echappement | |
AU2002325219A1 (en) | Colloid-catalysed gas transfer in supercritical phases | |
FR2732363B1 (fr) | Procede et appareil de depot chimique en phase vapeur, assiste par plasma micro-ondes, de couches minces de silice a basse temperature, utilisant des chlorures | |
KR970005381A (ko) | 반응 증류 방법을 이용한 화학 반응 열 펌프 장치 | |
FR2863172B1 (fr) | Procede de purification du corail |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
TP | Transmission of property | ||
PLFP | Fee payment |
Year of fee payment: 15 |
|
PLFP | Fee payment |
Year of fee payment: 16 |
|
PLFP | Fee payment |
Year of fee payment: 17 |
|
PLFP | Fee payment |
Year of fee payment: 18 |
|
PLFP | Fee payment |
Year of fee payment: 19 |
|
PLFP | Fee payment |
Year of fee payment: 20 |