FR2691834B1 - Procede pour produire et pour amorcer une decharge basse tension, installation de traitement sous vide et chambre a cathode pour celle-ci, et utilisations du procede. - Google Patents

Procede pour produire et pour amorcer une decharge basse tension, installation de traitement sous vide et chambre a cathode pour celle-ci, et utilisations du procede.

Info

Publication number
FR2691834B1
FR2691834B1 FR9305689A FR9305689A FR2691834B1 FR 2691834 B1 FR2691834 B1 FR 2691834B1 FR 9305689 A FR9305689 A FR 9305689A FR 9305689 A FR9305689 A FR 9305689A FR 2691834 B1 FR2691834 B1 FR 2691834B1
Authority
FR
France
Prior art keywords
producing
low voltage
vacuum processing
cathode chamber
processing plant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
FR9305689A
Other languages
English (en)
Other versions
FR2691834A1 (fr
Inventor
Jurgen Ramm
Eugen Beck
Hugo Frei
Albert Zueger
Gunter Peter
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers AG filed Critical Balzers AG
Publication of FR2691834A1 publication Critical patent/FR2691834A1/fr
Application granted granted Critical
Publication of FR2691834B1 publication Critical patent/FR2691834B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • ing And Chemical Polishing (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
FR9305689A 1992-05-26 1993-05-12 Procede pour produire et pour amorcer une decharge basse tension, installation de traitement sous vide et chambre a cathode pour celle-ci, et utilisations du procede. Expired - Lifetime FR2691834B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH01696/92A CH687111A5 (de) 1992-05-26 1992-05-26 Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.

Publications (2)

Publication Number Publication Date
FR2691834A1 FR2691834A1 (fr) 1993-12-03
FR2691834B1 true FR2691834B1 (fr) 1995-12-08

Family

ID=4216464

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9305689A Expired - Lifetime FR2691834B1 (fr) 1992-05-26 1993-05-12 Procede pour produire et pour amorcer une decharge basse tension, installation de traitement sous vide et chambre a cathode pour celle-ci, et utilisations du procede.

Country Status (7)

Country Link
US (1) US5384018A (fr)
JP (1) JP3158158B2 (fr)
KR (1) KR100299158B1 (fr)
CH (1) CH687111A5 (fr)
DE (2) DE4345602B4 (fr)
FR (1) FR2691834B1 (fr)
GB (1) GB2267387B (fr)

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US5662770A (en) * 1993-04-16 1997-09-02 Micron Technology, Inc. Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks
DE4437269C1 (de) * 1994-10-18 1996-02-22 Balzers Hochvakuum Verfahren zum Reinigen einer Werkstückoberfläche und seine Verwendung
CH692446A5 (de) * 1996-04-15 2002-06-28 Esec Sa Verfahren zur Herstellung von Werkstücken und von Teilen hierfür
DE19705884A1 (de) * 1997-02-15 1998-08-20 Leybold Ag Plasma-Zündvorrichtung
JP2868120B2 (ja) * 1997-06-11 1999-03-10 川崎重工業株式会社 電子ビーム励起プラズマ発生装置
JP4906169B2 (ja) * 1997-06-13 2012-03-28 エリコン・トレーディング・アクチェンゲゼルシャフト，トリュープバッハ 被覆工作物を製造するための方法、その方法の利用およびそのための装置
DE19725930C2 (de) * 1997-06-16 2002-07-18 Eberhard Moll Gmbh Dr Verfahren und Anlage zum Behandeln von Substraten mittels Ionen aus einer Niedervoltbogenentladung
US6368678B1 (en) * 1998-05-13 2002-04-09 Terry Bluck Plasma processing system and method
TW455912B (en) 1999-01-22 2001-09-21 Sony Corp Method and apparatus for film deposition
US6605175B1 (en) * 1999-02-19 2003-08-12 Unaxis Balzers Aktiengesellschaft Process for manufacturing component parts, use of same, with air bearing supported workpieces and vacuum processing chamber
US6365016B1 (en) * 1999-03-17 2002-04-02 General Electric Company Method and apparatus for arc plasma deposition with evaporation of reagents
US6426125B1 (en) * 1999-03-17 2002-07-30 General Electric Company Multilayer article and method of making by ARC plasma deposition
TW512181B (en) * 2000-02-03 2002-12-01 Cosmos Vacuum Technology Corp A process for covering a film on the surface of the micro cutting router by coating super micro atomized multi-elements
DE10058768C2 (de) * 2000-11-27 2003-08-21 Singulus Technologies Ag Verfahren zum Zünden eines Plasmas
US7033679B2 (en) * 2001-01-25 2006-04-25 Kyocera Optec Co., Ltd. Metal film and metal film-coated member, metal oxide film and metal oxide film-coated member, thin film forming apparatus and thin film forming method for producing metal film and metal oxide film
US20020160620A1 (en) * 2001-02-26 2002-10-31 Rudolf Wagner Method for producing coated workpieces, uses and installation for the method
DE10224991A1 (de) * 2002-06-05 2004-01-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Einrichtung zur Reduzierung der Zündspannung von Plasmen
US6902774B2 (en) 2002-07-25 2005-06-07 Inficon Gmbh Method of manufacturing a device
JP2004119430A (ja) * 2002-09-24 2004-04-15 Tadatomo Suga 接合装置および方法
ES2380699T3 (es) * 2004-06-08 2012-05-17 Dichroic Cell S.R.L. Sistema para la deposición química en fase de vapor asistida por plasma de baja energía
EP2039799A4 (fr) * 2006-04-18 2015-09-30 Ulvac Inc Appareil de formation de film et procede de fabrication d'un film barriere
US20080029197A1 (en) * 2006-07-04 2008-02-07 Matsushita Electric Industrial Co., Ltd. Surface treating apparatus using atomic hydrogen
DE102011112759A1 (de) 2011-09-08 2013-03-14 Oerlikon Trading Ag, Trübbach Plasmaquelle
DE102012024340A1 (de) * 2012-12-13 2014-06-18 Oerlikon Trading Ag, Trübbach Plasmaquelle
GB201420935D0 (en) 2014-11-25 2015-01-07 Spts Technologies Ltd Plasma etching apparatus

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FR1502647A (fr) * 1965-12-17 1968-02-07
CH551497A (de) * 1971-10-06 1974-07-15 Balzers Patent Beteilig Ag Anordnung zur zerstaeubung von stoffen mittels einer elektrischen niederspannungsentladung.
DE2241229C2 (de) * 1972-08-22 1983-01-20 Leybold-Heraeus GmbH, 5000 Köln Vorrichtung zum Ätzen von Substraten durch eine Glimmentladung
GB1454196A (en) * 1974-07-04 1976-10-27 Sokolov B G Electron beam apparatus
GB1550853A (en) * 1975-10-06 1979-08-22 Hitachi Ltd Apparatus and process for plasma treatment
CH631743A5 (de) * 1977-06-01 1982-08-31 Balzers Hochvakuum Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage.
CH640886A5 (de) * 1979-08-02 1984-01-31 Balzers Hochvakuum Verfahren zum aufbringen harter verschleissfester ueberzuege auf unterlagen.
CH645137A5 (de) * 1981-03-13 1984-09-14 Balzers Hochvakuum Verfahren und vorrichtung zum verdampfen von material unter vakuum.
GB2101638B (en) * 1981-07-16 1985-07-24 Ampex Moveable cathodes/targets for high rate sputtering system
US4362611A (en) * 1981-07-27 1982-12-07 International Business Machines Corporation Quadrupole R.F. sputtering system having an anode/cathode shield and a floating target shield
CH658545A5 (de) * 1982-09-10 1986-11-14 Balzers Hochvakuum Verfahren zum gleichmaessigen erwaermen von heizgut in einem vakuumrezipienten.
US5096558A (en) * 1984-04-12 1992-03-17 Plasco Dr. Ehrich Plasma - Coating Gmbh Method and apparatus for evaporating material in vacuum
CH664768A5 (de) * 1985-06-20 1988-03-31 Balzers Hochvakuum Verfahren zur beschichtung von substraten in einer vakuumkammer.
DE3614398A1 (de) * 1985-07-01 1987-01-08 Balzers Hochvakuum Anordnung zum behandeln von werkstuecken mit einer evakuierbaren kammer
DE3615361C2 (de) * 1986-05-06 1994-09-01 Santos Pereira Ribeiro Car Dos Vorrichtung zur Oberflächenbehandlung von Werkstücken
ES2022946T5 (es) * 1987-08-26 1996-04-16 Balzers Hochvakuum Procedimiento para la aportacion de capas sobre sustratos.
GB2230644B (en) * 1989-02-16 1994-03-23 Tokyo Electron Ltd Electron beam excitation ion source
CH680369A5 (fr) * 1989-11-22 1992-08-14 Balzers Hochvakuum
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DE4035131C2 (de) * 1990-11-05 1995-09-21 Balzers Hochvakuum Verfahren und Vorrichtung zum gleichmäßigen Erwärmen von Heizgut, insbes. von zu beschichtenden Substraten, in einer Vakuumkammer
US5250779A (en) * 1990-11-05 1993-10-05 Balzers Aktiengesellschaft Method and apparatus for heating-up a substrate by means of a low voltage arc discharge and variable magnetic field
DE4109619C1 (fr) * 1991-03-23 1992-08-06 Leybold Ag, 6450 Hanau, De
DE4210284A1 (de) * 1992-03-28 1993-09-30 Leybold Ag Vorrichtung zum Erzeugen eines Plasmas mittels Kathodenzerstäubung und Mikrowelleneinstrahlung
DE202004006140U1 (de) * 2004-04-15 2004-06-09 Tilo Gmbh Paneele für Zweischichtparkett

Also Published As

Publication number Publication date
FR2691834A1 (fr) 1993-12-03
JP3158158B2 (ja) 2001-04-23
DE4345602B4 (de) 2010-11-25
US5384018A (en) 1995-01-24
KR930024049A (ko) 1993-12-21
CH687111A5 (de) 1996-09-13
GB2267387A (en) 1993-12-01
DE4310941A1 (de) 1993-12-02
KR100299158B1 (ko) 2001-10-22
GB9310269D0 (en) 1993-06-30
DE4310941B4 (de) 2005-12-01
GB2267387B (en) 1996-08-21
JPH0676773A (ja) 1994-03-18

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