FR2686624B1 - Structure d'electrode insoluble comportant des elements d'electrode amovibles et une plaque de base. - Google Patents

Structure d'electrode insoluble comportant des elements d'electrode amovibles et une plaque de base.

Info

Publication number
FR2686624B1
FR2686624B1 FR9300816A FR9300816A FR2686624B1 FR 2686624 B1 FR2686624 B1 FR 2686624B1 FR 9300816 A FR9300816 A FR 9300816A FR 9300816 A FR9300816 A FR 9300816A FR 2686624 B1 FR2686624 B1 FR 2686624B1
Authority
FR
France
Prior art keywords
base plate
removable
insoluble
electrode structure
elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9300816A
Other languages
English (en)
Other versions
FR2686624A1 (fr
Inventor
Suitsu Akihiro
Hayashi Ryuji
Ozaki Kenichi
Shimamune Takayuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
De Nora Permelec Ltd
Original Assignee
Permelec Electrode Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Permelec Electrode Ltd filed Critical Permelec Electrode Ltd
Publication of FR2686624A1 publication Critical patent/FR2686624A1/fr
Application granted granted Critical
Publication of FR2686624B1 publication Critical patent/FR2686624B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
FR9300816A 1992-01-28 1993-01-27 Structure d'electrode insoluble comportant des elements d'electrode amovibles et une plaque de base. Expired - Fee Related FR2686624B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4013427A JP2963266B2 (ja) 1992-01-28 1992-01-28 不溶性電極構造体

Publications (2)

Publication Number Publication Date
FR2686624A1 FR2686624A1 (fr) 1993-07-30
FR2686624B1 true FR2686624B1 (fr) 1995-07-21

Family

ID=11832843

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9300816A Expired - Fee Related FR2686624B1 (fr) 1992-01-28 1993-01-27 Structure d'electrode insoluble comportant des elements d'electrode amovibles et une plaque de base.

Country Status (7)

Country Link
US (1) US5489368A (fr)
JP (1) JP2963266B2 (fr)
KR (1) KR100253607B1 (fr)
BE (1) BE1005928A5 (fr)
FR (1) FR2686624B1 (fr)
MY (1) MY109920A (fr)
TW (1) TW273578B (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07316861A (ja) * 1994-05-24 1995-12-05 Permelec Electrode Ltd 電極構造体
TW318320B (fr) * 1995-08-07 1997-10-21 Eltech Systems Corp
WO1999067448A1 (fr) * 1998-06-22 1999-12-29 Daiso Co., Ltd. Anode insoluble pouvant se detacher librement
US6527939B1 (en) 1999-06-28 2003-03-04 Eltech Systems Corporation Method of producing copper foil with an anode having multiple coating layers
JP2002038291A (ja) * 2001-09-03 2002-02-06 Daiso Co Ltd 金属箔製造用陽極
JP4532093B2 (ja) * 2003-04-18 2010-08-25 日本ステンレス工材株式会社 金属箔製造用不溶性電極
JP4460590B2 (ja) * 2007-06-22 2010-05-12 ペルメレック電極株式会社 導電性ダイヤモンド電極構造体及びフッ素含有物質の電解合成方法
JP4642120B2 (ja) 2009-04-01 2011-03-02 三井金属鉱業株式会社 電解金属箔製造装置並びに電解金属箔製造装置に用いる薄板状不溶性金属電極の製造方法及びその電解金属箔製造装置を用いて得られた電解金属箔
TWI433964B (zh) 2010-10-08 2014-04-11 Water Star Inc 複數層之混合金屬氧化物電極及其製法
KR101569185B1 (ko) 2013-09-13 2015-11-17 (주)테크윈 불용성 전극 및 이를 구비하는 전해동박장치
JP6946911B2 (ja) * 2017-09-29 2021-10-13 株式会社大阪ソーダ めっき用電極および電解金属箔の製造装置
CN108660488A (zh) * 2018-05-29 2018-10-16 江阴安诺电极有限公司 电解铜箔阳极板的制备方法
US11668017B2 (en) 2018-07-30 2023-06-06 Water Star, Inc. Current reversal tolerant multilayer material, method of making the same, use as an electrode, and use in electrochemical processes
CN109735879A (zh) * 2019-03-11 2019-05-10 江阴安诺电极有限公司 电解铜箔阳极板的制备方法
KR102519062B1 (ko) * 2021-04-07 2023-04-10 주식회사 엔원테크 전해동박 제조용 애노드전극 조립체
CN115418684B (zh) * 2022-10-09 2023-06-02 安徽华创新材料股份有限公司 一种电解铜箔所需钛材阳极槽结构及制造工艺

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4318794A (en) * 1980-11-17 1982-03-09 Edward Adler Anode for production of electrodeposited foil
JPH0342043Y2 (fr) * 1987-02-20 1991-09-03
US4936971A (en) * 1988-03-31 1990-06-26 Eltech Systems Corporation Massive anode as a mosaic of modular anodes
US4956053A (en) * 1988-05-26 1990-09-11 Olin Corporation Apparatus and process for the production of micro-pore free high ductility metal foil
JPH0730690Y2 (ja) * 1989-04-13 1995-07-12 日本鋼管株式会社 電気めっき用分割型不溶性電極
JPH0730689Y2 (ja) * 1989-04-13 1995-07-12 日本鋼管株式会社 不溶性電極
JPH1176100A (ja) * 1997-09-12 1999-03-23 Raijingu Farm:Kk 仮設便所

Also Published As

Publication number Publication date
KR930016566A (ko) 1993-08-26
KR100253607B1 (ko) 2000-04-15
JP2963266B2 (ja) 1999-10-18
TW273578B (fr) 1996-04-01
MY109920A (en) 1997-09-30
FR2686624A1 (fr) 1993-07-30
BE1005928A5 (fr) 1994-03-15
JPH05202498A (ja) 1993-08-10
US5489368A (en) 1996-02-06

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Effective date: 20081029