FR2630458A1 - Procede de protection superficielle contre la corrosion et l'abrasion d'objets metalliques ou en composite a matrice metallique par depot de carbure de silicium - Google Patents
Procede de protection superficielle contre la corrosion et l'abrasion d'objets metalliques ou en composite a matrice metallique par depot de carbure de silicium Download PDFInfo
- Publication number
- FR2630458A1 FR2630458A1 FR8805713A FR8805713A FR2630458A1 FR 2630458 A1 FR2630458 A1 FR 2630458A1 FR 8805713 A FR8805713 A FR 8805713A FR 8805713 A FR8805713 A FR 8805713A FR 2630458 A1 FR2630458 A1 FR 2630458A1
- Authority
- FR
- France
- Prior art keywords
- silicon carbide
- deposition
- based alloys
- magnesium
- titanium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical group [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 229910010271 silicon carbide Inorganic materials 0.000 title claims abstract description 27
- 238000000034 method Methods 0.000 title claims abstract description 21
- 238000005260 corrosion Methods 0.000 title claims abstract description 18
- 230000007797 corrosion Effects 0.000 title claims abstract description 18
- 238000005299 abrasion Methods 0.000 title claims abstract description 15
- 230000008021 deposition Effects 0.000 title claims abstract description 8
- 239000002131 composite material Substances 0.000 title claims abstract description 7
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 31
- 239000000956 alloy Substances 0.000 claims abstract description 31
- 239000011777 magnesium Substances 0.000 claims abstract description 25
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 23
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims abstract description 22
- 239000010936 titanium Substances 0.000 claims abstract description 19
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 18
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 17
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 17
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 16
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 14
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052751 metal Inorganic materials 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims abstract description 13
- 238000000151 deposition Methods 0.000 claims abstract description 8
- 239000011159 matrix material Substances 0.000 claims abstract description 5
- 239000000835 fiber Substances 0.000 claims abstract description 4
- 239000012808 vapor phase Substances 0.000 claims abstract 2
- 238000000576 coating method Methods 0.000 claims description 14
- 238000004544 sputter deposition Methods 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- 238000005234 chemical deposition Methods 0.000 claims 1
- 239000011261 inert gas Substances 0.000 claims 1
- 238000001947 vapour-phase growth Methods 0.000 claims 1
- 239000004411 aluminium Substances 0.000 abstract 2
- 238000005289 physical deposition Methods 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 description 10
- 239000000758 substrate Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 8
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N argon Substances [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 5
- 238000005507 spraying Methods 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000007921 spray Substances 0.000 description 4
- 229920000049 Carbon (fiber) Polymers 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- 239000004917 carbon fiber Substances 0.000 description 3
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- -1 low density Chemical compound 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000002048 anodisation reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000008030 elimination Effects 0.000 description 2
- 238000003379 elimination reaction Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000003365 glass fiber Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000004626 scanning electron microscopy Methods 0.000 description 2
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 2
- GDTSJMKGXGJFGQ-UHFFFAOYSA-N 3,7-dioxido-2,4,6,8,9-pentaoxa-1,3,5,7-tetraborabicyclo[3.3.1]nonane Chemical compound O1B([O-])OB2OB([O-])OB1O2 GDTSJMKGXGJFGQ-UHFFFAOYSA-N 0.000 description 1
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- UDHXJZHVNHGCEC-UHFFFAOYSA-N Chlorophacinone Chemical compound C1=CC(Cl)=CC=C1C(C=1C=CC=CC=1)C(=O)C1C(=O)C2=CC=CC=C2C1=O UDHXJZHVNHGCEC-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- HHKAIBPQUSDPAW-UHFFFAOYSA-N Cl.B(O)(O)O.B(O)(O)O.B(O)(O)O.B(O)(O)O Chemical compound Cl.B(O)(O)O.B(O)(O)O.B(O)(O)O.B(O)(O)O HHKAIBPQUSDPAW-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000004959 Rilsan Substances 0.000 description 1
- 241000212342 Sium Species 0.000 description 1
- 229910001093 Zr alloy Inorganic materials 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- AIPNSHNRCQOTRI-UHFFFAOYSA-N aluminon Chemical compound [NH4+].[NH4+].[NH4+].C1=C(C([O-])=O)C(O)=CC=C1C(C=1C=C(C(O)=CC=1)C([O-])=O)=C1C=C(C([O-])=O)C(=O)C=C1 AIPNSHNRCQOTRI-UHFFFAOYSA-N 0.000 description 1
- JOSWYUNQBRPBDN-UHFFFAOYSA-P ammonium dichromate Chemical compound [NH4+].[NH4+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O JOSWYUNQBRPBDN-UHFFFAOYSA-P 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 235000015241 bacon Nutrition 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000011156 metal matrix composite Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 238000000399 optical microscopy Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000000053 physical method Methods 0.000 description 1
- 238000011197 physicochemical method Methods 0.000 description 1
- 239000006223 plastic coating Substances 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8805713A FR2630458A1 (fr) | 1988-04-20 | 1988-04-20 | Procede de protection superficielle contre la corrosion et l'abrasion d'objets metalliques ou en composite a matrice metallique par depot de carbure de silicium |
| EP19890905129 EP0376998A1 (de) | 1988-04-20 | 1989-04-18 | Verfahren zum oberflächenschutz von metallischen gegenständen oder verbundwerkstoffen mit metall-matrix gegen korrosion und abrieb durch abscheidung von siliziumkarbid |
| PCT/FR1989/000177 WO1989010425A1 (fr) | 1988-04-20 | 1989-04-18 | Procede de protection superficielle contre la corrosion et l'abrasion d'objets metalliques ou en composite a matrice metallique par depot de carbure de silicium |
| JP50491189A JPH02504169A (ja) | 1988-04-20 | 1989-04-18 | 炭化ケイ素の堆積による金属物体又は金属マトリックスを有する複合材料から成る物体の腐食及び摩耗に対する表面保護方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8805713A FR2630458A1 (fr) | 1988-04-20 | 1988-04-20 | Procede de protection superficielle contre la corrosion et l'abrasion d'objets metalliques ou en composite a matrice metallique par depot de carbure de silicium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR2630458A1 true FR2630458A1 (fr) | 1989-10-27 |
Family
ID=9365802
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8805713A Withdrawn FR2630458A1 (fr) | 1988-04-20 | 1988-04-20 | Procede de protection superficielle contre la corrosion et l'abrasion d'objets metalliques ou en composite a matrice metallique par depot de carbure de silicium |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0376998A1 (de) |
| JP (1) | JPH02504169A (de) |
| FR (1) | FR2630458A1 (de) |
| WO (1) | WO1989010425A1 (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001046487A1 (en) * | 1999-12-20 | 2001-06-28 | Centro Sviluppo Materiali S.P.A. | Process for the manufacture of low-density components, having a polymer or metal matrix substrate and ceramics and/or metal-ceramics coating and low density components of high surface strength thus obtained |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3103376B2 (ja) * | 1990-09-14 | 2000-10-30 | ジョン マイクル マーフィー、マーティン | 金属マトリックス複合物コンポーネント |
| US7651732B2 (en) * | 2007-09-07 | 2010-01-26 | Gm Global Technology Operations, Inc. | Magnesium-titanium solid solution alloys |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4532150A (en) * | 1982-12-29 | 1985-07-30 | Shin-Etsu Chemical Co., Ltd. | Method for providing a coating layer of silicon carbide on the surface of a substrate |
| JPS6280270A (ja) * | 1985-10-03 | 1987-04-13 | Sumitomo Electric Ind Ltd | ジルコニウムおよびその合金のセラミツクス被覆法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3121469B2 (ja) * | 1993-03-31 | 2000-12-25 | 積水ハウス株式会社 | 一体基礎用の樹脂製ベース枠 |
-
1988
- 1988-04-20 FR FR8805713A patent/FR2630458A1/fr not_active Withdrawn
-
1989
- 1989-04-18 WO PCT/FR1989/000177 patent/WO1989010425A1/fr not_active Application Discontinuation
- 1989-04-18 JP JP50491189A patent/JPH02504169A/ja active Pending
- 1989-04-18 EP EP19890905129 patent/EP0376998A1/de not_active Withdrawn
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4532150A (en) * | 1982-12-29 | 1985-07-30 | Shin-Etsu Chemical Co., Ltd. | Method for providing a coating layer of silicon carbide on the surface of a substrate |
| JPS6280270A (ja) * | 1985-10-03 | 1987-04-13 | Sumitomo Electric Ind Ltd | ジルコニウムおよびその合金のセラミツクス被覆法 |
Non-Patent Citations (4)
| Title |
|---|
| CHEMICAL ABSTRACTS, vol. 100, no. 16, 16 avril 1984, page 280, no. 125715b, Columbus, Ohio, US; A.GANNOUNI et al.: "Preparation and oxygen behavior of silicon carbide coating on titanium" & ANN. CHIM. (PARIS) 1983, 8(7-8), 541-50 * |
| PATENT ABSTRACTS OF JAPAN, vol. 11, no. 282 (C-446)[2729], 11 septembre 1987; & JP-A-62 80 270 (SUMITOMO ELECTRIC IND. LTD) 13-04-1987 * |
| THIN SOLID FILMS, vol. 151, no. 3, 17 août 1987, pages 403-412, Elsevier Sequoia, Lausanne, CH; S.INOUE et al.: "Crystallization behaviour of amorphous SiC films prepared by R.F. sputtering" * |
| THIN SOLID FILMS, vol. 31, no. 3, février 1976, pages 235-241, Elsevier Sequoia S.A., Lausanne, CH; K.WASA et al.: "Structure and mechanical properties of R.F. sputtered SiC films" * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001046487A1 (en) * | 1999-12-20 | 2001-06-28 | Centro Sviluppo Materiali S.P.A. | Process for the manufacture of low-density components, having a polymer or metal matrix substrate and ceramics and/or metal-ceramics coating and low density components of high surface strength thus obtained |
| US6727005B2 (en) | 1999-12-20 | 2004-04-27 | Centro Sviluppo Materiali S.P.A. | Process for the manufacture of low-density components, having a polymer or metal matrix substrate and ceramics and/or metal-ceramics coating and low density components of high surface strength thus obtained |
Also Published As
| Publication number | Publication date |
|---|---|
| WO1989010425A1 (fr) | 1989-11-02 |
| EP0376998A1 (de) | 1990-07-11 |
| JPH02504169A (ja) | 1990-11-29 |
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