FR2554132B1 - Procede de depot de siliciure metallique par depot de vapeur chimique, exalte par du plasma - Google Patents

Procede de depot de siliciure metallique par depot de vapeur chimique, exalte par du plasma

Info

Publication number
FR2554132B1
FR2554132B1 FR8416908A FR8416908A FR2554132B1 FR 2554132 B1 FR2554132 B1 FR 2554132B1 FR 8416908 A FR8416908 A FR 8416908A FR 8416908 A FR8416908 A FR 8416908A FR 2554132 B1 FR2554132 B1 FR 2554132B1
Authority
FR
France
Prior art keywords
deposition
exalted
plasma
chemical vapor
metal silicide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8416908A
Other languages
English (en)
Other versions
FR2554132A1 (fr
Inventor
Richard S Rosler
George M Engle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Semiconductor Materials America Inc
Original Assignee
Advanced Semiconductor Materials America Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Semiconductor Materials America Inc filed Critical Advanced Semiconductor Materials America Inc
Publication of FR2554132A1 publication Critical patent/FR2554132A1/fr
Application granted granted Critical
Publication of FR2554132B1 publication Critical patent/FR2554132B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/42—Silicides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/28008—Making conductor-insulator-semiconductor electrodes
    • H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
    • H01L21/28026—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
    • H01L21/28035—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities
    • H01L21/28044—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer
    • H01L21/28061—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer the conductor comprising a metal or metal silicide formed by deposition, e.g. sputter deposition, i.e. without a silicidation reaction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28512—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
    • H01L21/28518—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table the conductive layers comprising silicides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Chemical Vapour Deposition (AREA)
FR8416908A 1983-10-31 1984-10-30 Procede de depot de siliciure metallique par depot de vapeur chimique, exalte par du plasma Expired FR2554132B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/547,050 US4557943A (en) 1983-10-31 1983-10-31 Metal-silicide deposition using plasma-enhanced chemical vapor deposition

Publications (2)

Publication Number Publication Date
FR2554132A1 FR2554132A1 (fr) 1985-05-03
FR2554132B1 true FR2554132B1 (fr) 1988-09-23

Family

ID=24183136

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8416908A Expired FR2554132B1 (fr) 1983-10-31 1984-10-30 Procede de depot de siliciure metallique par depot de vapeur chimique, exalte par du plasma

Country Status (6)

Country Link
US (1) US4557943A (fr)
JP (1) JPS6096763A (fr)
DE (1) DE3439853A1 (fr)
FR (1) FR2554132B1 (fr)
GB (1) GB2148946B (fr)
NL (1) NL8403011A (fr)

Families Citing this family (67)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2505736B2 (ja) * 1985-06-18 1996-06-12 キヤノン株式会社 半導体装置の製造方法
US4668530A (en) * 1985-07-23 1987-05-26 Massachusetts Institute Of Technology Low pressure chemical vapor deposition of refractory metal silicides
US4709655A (en) * 1985-12-03 1987-12-01 Varian Associates, Inc. Chemical vapor deposition apparatus
US4796562A (en) * 1985-12-03 1989-01-10 Varian Associates, Inc. Rapid thermal cvd apparatus
US4732801A (en) * 1986-04-30 1988-03-22 International Business Machines Corporation Graded oxide/nitride via structure and method of fabrication therefor
US4766006A (en) * 1986-05-15 1988-08-23 Varian Associates, Inc. Low pressure chemical vapor deposition of metal silicide
US4800105A (en) * 1986-07-22 1989-01-24 Nihon Shinku Gijutsu Kabushiki Kaisha Method of forming a thin film by chemical vapor deposition
NL8700820A (nl) * 1987-04-08 1988-11-01 Philips Nv Werkwijze voor het vervaardigen van een halfgeleiderinrichting.
US4908548A (en) * 1987-05-09 1990-03-13 Futaba Denshi Kogyo Kabushiki Kaisha Fluorescent display device
FR2622052B1 (fr) * 1987-10-19 1990-02-16 Air Liquide Procede de depot de siliciure de metal refractaire pour la fabrication de circuits integres
FR2623014B1 (fr) * 1987-11-09 1990-03-23 France Etat Procede de depot selectif d'un siliciure de metal refractaire sur des zones de silicium
US5167986A (en) * 1988-04-15 1992-12-01 Gordon Roy G Titanium silicide-coated glass windows
US5057375A (en) * 1988-04-15 1991-10-15 Gordon Roy G Titanium silicide-coated glass windows
US4957777A (en) * 1988-07-28 1990-09-18 Massachusetts Institute Of Technology Very low pressure chemical vapor deposition process for deposition of titanium silicide films
US5104694A (en) * 1989-04-21 1992-04-14 Nippon Telephone & Telegraph Corporation Selective chemical vapor deposition of a metallic film on the silicon surface
KR930011413B1 (ko) * 1990-09-25 1993-12-06 가부시키가이샤 한도오따이 에네루기 겐큐쇼 펄스형 전자파를 사용한 플라즈마 cvd 법
JPH06101462B2 (ja) * 1991-04-30 1994-12-12 インターナショナル・ビジネス・マシーンズ・コーポレイション 過フッ化炭化水素ポリマ膜を基板に接着する方法および 基板
KR970009274B1 (ko) * 1991-11-11 1997-06-09 미쓰비시덴키 가부시키가이샤 반도체장치의 도전층접속구조 및 그 제조방법
US5320880A (en) * 1992-10-20 1994-06-14 Micron Technology, Inc. Method of providing a silicon film having a roughened outer surface
US5814599A (en) * 1995-08-04 1998-09-29 Massachusetts Insitiute Of Technology Transdermal delivery of encapsulated drugs
US5426003A (en) * 1994-02-14 1995-06-20 Westinghouse Electric Corporation Method of forming a plasma sprayed interconnection layer on an electrode of an electrochemical cell
US5628829A (en) * 1994-06-03 1997-05-13 Materials Research Corporation Method and apparatus for low temperature deposition of CVD and PECVD films
US5975912A (en) * 1994-06-03 1999-11-02 Materials Research Corporation Low temperature plasma-enhanced formation of integrated circuits
WO1995034092A1 (fr) * 1994-06-03 1995-12-14 Materials Research Corporation Procede de nitruration de couches minces de titane
US5665640A (en) 1994-06-03 1997-09-09 Sony Corporation Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor
US5972790A (en) * 1995-06-09 1999-10-26 Tokyo Electron Limited Method for forming salicides
US5780050A (en) 1995-07-20 1998-07-14 Theratech, Inc. Drug delivery compositions for improved stability of steroids
US6041253A (en) * 1995-12-18 2000-03-21 Massachusetts Institute Of Technology Effect of electric field and ultrasound for transdermal drug delivery
US6002961A (en) * 1995-07-25 1999-12-14 Massachusetts Institute Of Technology Transdermal protein delivery using low-frequency sonophoresis
US5947921A (en) * 1995-12-18 1999-09-07 Massachusetts Institute Of Technology Chemical and physical enhancers and ultrasound for transdermal drug delivery
DK1563788T3 (da) 1995-08-29 2015-05-11 Nitto Denko Corp Mikroperforering af human hud til stofindgift og overvågningsformål
JPH09111460A (ja) * 1995-10-11 1997-04-28 Anelva Corp チタン系導電性薄膜の作製方法
JP2002515786A (ja) 1996-06-28 2002-05-28 ソントラ メディカル，エル．ピー． 経皮輸送の超音波増強
US5908659A (en) * 1997-01-03 1999-06-01 Mosel Vitelic Inc. Method for reducing the reflectivity of a silicide layer
US6432479B2 (en) 1997-12-02 2002-08-13 Applied Materials, Inc. Method for in-situ, post deposition surface passivation of a chemical vapor deposited film
EP1045714A1 (fr) 1998-01-08 2000-10-25 Sontra Medical, L.P. Transport transdermique par sonophorese ameliore
US7066884B2 (en) 1998-01-08 2006-06-27 Sontra Medical, Inc. System, method, and device for non-invasive body fluid sampling and analysis
US8287483B2 (en) * 1998-01-08 2012-10-16 Echo Therapeutics, Inc. Method and apparatus for enhancement of transdermal transport
US6046098A (en) * 1998-02-23 2000-04-04 Micron Technology, Inc. Process of forming metal silicide interconnects
US20040171980A1 (en) 1998-12-18 2004-09-02 Sontra Medical, Inc. Method and apparatus for enhancement of transdermal transport
US6821571B2 (en) 1999-06-18 2004-11-23 Applied Materials Inc. Plasma treatment to enhance adhesion and to minimize oxidation of carbon-containing layers
US20030078499A1 (en) 1999-08-12 2003-04-24 Eppstein Jonathan A. Microporation of tissue for delivery of bioactive agents
US6541369B2 (en) 1999-12-07 2003-04-01 Applied Materials, Inc. Method and apparatus for reducing fixed charges in a semiconductor device
US6795727B2 (en) 2001-10-17 2004-09-21 Pedro Giammarusti Devices and methods for promoting transcutaneous movement of substances
WO2003077970A2 (fr) 2002-03-11 2003-09-25 Altea Therapeutics Corporation Dispositif transdermique a actionneur integre, procedes de fabrication et d'utilisation de celui-ci
US8116860B2 (en) * 2002-03-11 2012-02-14 Altea Therapeutics Corporation Transdermal porator and patch system and method for using same
US9918665B2 (en) 2002-03-11 2018-03-20 Nitto Denko Corporation Transdermal porator and patch system and method for using same
US8016811B2 (en) 2003-10-24 2011-09-13 Altea Therapeutics Corporation Method for transdermal delivery of permeant substances
US20060094944A1 (en) 2004-10-28 2006-05-04 Sontra Medical Corporation System and method for analyte sampling and analysis with error correction
WO2006089082A2 (fr) 2005-02-17 2006-08-24 Velcera Pharmaceuticals Administration par voie transmuqueuse de compositions medicamenteuses pour le traitement et la prevention de troubles chez les animaux
US7432069B2 (en) 2005-12-05 2008-10-07 Sontra Medical Corporation Biocompatible chemically crosslinked hydrogels for glucose sensing
EP2124723A1 (fr) 2007-03-07 2009-12-02 Echo Therapeutics, Inc. Systèmes et procédés de contrôle d'analyte transdermique pour une détection d'analyte
SI2152358T1 (sl) 2007-04-27 2011-08-31 Echo Therapeutics Inc Naprava za prodiranje skozi koĺ˝o za analizno merjenje ali za transdermalni prenos zdravil
WO2010101625A2 (fr) 2009-03-02 2010-09-10 Seventh Sense Biosystems, Inc. Capteur de mesure d'oxygène
WO2010101620A2 (fr) 2009-03-02 2010-09-10 Seventh Sense Biosystems, Inc. Systèmes et procédés permettant de créer et d'utiliser des bulles de succion ou d'autres régions groupées de fluide dans la peau
US9033898B2 (en) 2010-06-23 2015-05-19 Seventh Sense Biosystems, Inc. Sampling devices and methods involving relatively little pain
US9041541B2 (en) 2010-01-28 2015-05-26 Seventh Sense Biosystems, Inc. Monitoring or feedback systems and methods
US9295417B2 (en) 2011-04-29 2016-03-29 Seventh Sense Biosystems, Inc. Systems and methods for collecting fluid from a subject
EP2593014B1 (fr) 2010-07-16 2015-11-04 Seventh Sense Biosystems, Inc. Environnement basse pression pour dispositifs à transfert de fluide
US20130158482A1 (en) 2010-07-26 2013-06-20 Seventh Sense Biosystems, Inc. Rapid delivery and/or receiving of fluids
US20120039809A1 (en) 2010-08-13 2012-02-16 Seventh Sense Biosystems, Inc. Systems and techniques for monitoring subjects
WO2012064802A1 (fr) 2010-11-09 2012-05-18 Seventh Sense Biosystems, Inc. Systèmes et interfaces pour prélèvement sanguin
US20130158468A1 (en) 2011-12-19 2013-06-20 Seventh Sense Biosystems, Inc. Delivering and/or receiving material with respect to a subject surface
WO2012149143A1 (fr) 2011-04-29 2012-11-01 Seventh Sense Biosystems, Inc. Acheminement et/ou réception de fluides
EP3236259A1 (fr) 2011-04-29 2017-10-25 Seventh Sense Biosystems, Inc. Production de plasma ou de sérum et élimination de fluides sous pression réduite
US20140066837A1 (en) 2012-07-26 2014-03-06 Ronald L. Moy Skin care compositions and methods
US10204764B2 (en) * 2014-10-28 2019-02-12 Applied Materials, Inc. Methods for forming a metal silicide interconnection nanowire structure

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3540920A (en) * 1967-08-24 1970-11-17 Texas Instruments Inc Process of simultaneously vapor depositing silicides of chromium and titanium
US3658577A (en) * 1969-10-01 1972-04-25 Gene F Wakefield Vapor phase deposition of silicide refractory coatings
US4180596A (en) * 1977-06-30 1979-12-25 International Business Machines Corporation Method for providing a metal silicide layer on a substrate
US4218291A (en) * 1978-02-28 1980-08-19 Vlsi Technology Research Association Process for forming metal and metal silicide films
US4239819A (en) * 1978-12-11 1980-12-16 Chemetal Corporation Deposition method and products
JPS5644765A (en) * 1979-09-20 1981-04-24 Daijietsuto Kogyo Kk Covered hard metal tool
JPS584975A (ja) * 1981-06-30 1983-01-12 Fujitsu Ltd 半導体装置の製造方法
US4359490A (en) * 1981-07-13 1982-11-16 Fairchild Camera & Instrument Corp. Method for LPCVD co-deposition of metal and silicon to form metal silicide
JPS57147431A (en) * 1981-10-06 1982-09-11 Semiconductor Energy Lab Co Ltd Plasma gas phase method
DE3211752C2 (de) * 1982-03-30 1985-09-26 Siemens AG, 1000 Berlin und 8000 München Verfahren zum selektiven Abscheiden von aus Siliziden hochschmelzender Metalle bestehenden Schichtstrukturen auf im wesentlichen aus Silizium bestehenden Substraten und deren Verwendung
JPS5956574A (ja) * 1982-09-24 1984-04-02 Fujitsu Ltd チタン・シリサイド膜の形成方法

Also Published As

Publication number Publication date
FR2554132A1 (fr) 1985-05-03
GB8426071D0 (en) 1984-11-21
US4557943A (en) 1985-12-10
NL8403011A (nl) 1985-05-17
JPS6096763A (ja) 1985-05-30
DE3439853A1 (de) 1985-05-09
GB2148946A (en) 1985-06-05
GB2148946B (en) 1986-02-26
JPS643949B2 (fr) 1989-01-24

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