FR2530638B1 - - Google Patents
Info
- Publication number
- FR2530638B1 FR2530638B1 FR8212971A FR8212971A FR2530638B1 FR 2530638 B1 FR2530638 B1 FR 2530638B1 FR 8212971 A FR8212971 A FR 8212971A FR 8212971 A FR8212971 A FR 8212971A FR 2530638 B1 FR2530638 B1 FR 2530638B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S423/00—Chemistry of inorganic compounds
- Y10S423/09—Reaction techniques
- Y10S423/10—Plasma energized
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8212971A FR2530638A1 (fr) | 1982-07-26 | 1982-07-26 | Procede de preparation d'un melange a base de trichlorosilane utilisable pour la preparation de silicium de haute purete |
| EP83401454A EP0100266B1 (fr) | 1982-07-26 | 1983-07-13 | Procédé de préparation d'un mélange à base de trichlorosilane utilisable pour la préparation de silicium de haute pureté |
| DE8383401454T DE3371190D1 (en) | 1982-07-26 | 1983-07-13 | Process for the manufacture of a mixture based on trichlorosilane for use in the manufacture of high purity silicon |
| US06/516,843 US4836997A (en) | 1982-07-26 | 1983-07-25 | Plasma production of trichorosilane, SiHCl3 |
| JP58134511A JPS5945920A (ja) | 1982-07-26 | 1983-07-25 | 高純度けい素の製造に有用なトリクロルシランを主体とした混合物の製造方法 |
| CA000433086A CA1210221A (fr) | 1982-07-26 | 1983-07-25 | Procede de preparation d'un melange a base de trichlorosilane utilisable pour la preparation de silicium de haute purete |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8212971A FR2530638A1 (fr) | 1982-07-26 | 1982-07-26 | Procede de preparation d'un melange a base de trichlorosilane utilisable pour la preparation de silicium de haute purete |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2530638A1 FR2530638A1 (fr) | 1984-01-27 |
| FR2530638B1 true FR2530638B1 (en:Method) | 1985-02-22 |
Family
ID=9276302
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8212971A Granted FR2530638A1 (fr) | 1982-07-26 | 1982-07-26 | Procede de preparation d'un melange a base de trichlorosilane utilisable pour la preparation de silicium de haute purete |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4836997A (en:Method) |
| EP (1) | EP0100266B1 (en:Method) |
| JP (1) | JPS5945920A (en:Method) |
| CA (1) | CA1210221A (en:Method) |
| DE (1) | DE3371190D1 (en:Method) |
| FR (1) | FR2530638A1 (en:Method) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5422088A (en) * | 1994-01-28 | 1995-06-06 | Hemlock Semiconductor Corporation | Process for hydrogenation of tetrachlorosilane |
| US5869017A (en) * | 1997-05-12 | 1999-02-09 | Tokuyama Corporation | Method of producing trichlorosilane having a reduced content of dichlorosilane |
| RU2142909C1 (ru) * | 1998-07-30 | 1999-12-20 | Институт химии высокочистых веществ РАН | Способ получения высокочистого трихлорсилана и устройство для его осуществления |
| KR100385947B1 (ko) * | 2000-12-06 | 2003-06-02 | 삼성전자주식회사 | 원자층 증착 방법에 의한 박막 형성 방법 |
| DE102005005044A1 (de) * | 2005-02-03 | 2006-08-10 | Consortium für elektrochemische Industrie GmbH | Verfahren zur Herstellung von Trichlorsilan mittels thermischer Hydrierung von Siliciumtetrachlorid |
| DE102005024041A1 (de) | 2005-05-25 | 2006-11-30 | City Solar Ag | Verfahren zur Herstellung von Silicium aus Halogensilanen |
| DE102005041137A1 (de) * | 2005-08-30 | 2007-03-01 | Degussa Ag | Reaktor, Anlage und großtechnisches Verfahren zur kontinuierlichen Herstellung von hochreinem Siliciumtetrachlorid oder hochreinem Germaniumtetrachlorid |
| DE102006043929B4 (de) * | 2006-09-14 | 2016-10-06 | Spawnt Private S.À.R.L. | Verfahren zur Herstellung von festen Polysilanmischungen |
| JP5601438B2 (ja) * | 2006-11-07 | 2014-10-08 | 三菱マテリアル株式会社 | トリクロロシランの製造方法およびトリクロロシラン製造装置 |
| RU2350558C2 (ru) * | 2007-05-02 | 2009-03-27 | Федеральное государственное унитарное предприятие "Горно-химический комбинат" | Способ получения трихлорсилана плазмохимическим гидрированием тетрахлорида кремния и устройство для его осуществления |
| DE102007041803A1 (de) * | 2007-08-30 | 2009-03-05 | Pv Silicon Forschungs Und Produktions Gmbh | Verfahren zur Herstellung von polykristallinen Siliziumstäben und polykristalliner Siliziumstab |
| TW201113391A (en) * | 2009-03-19 | 2011-04-16 | Ae Polysilicon Corp | Silicide-coated metal surfaces and methods of utilizing same |
| EP2421640A1 (en) * | 2009-04-20 | 2012-02-29 | Ae Polysilicon Corporation | Methods and system for cooling a reaction effluent gas |
| TWI498165B (zh) * | 2009-04-20 | 2015-09-01 | Jiangsu Zhongneng Polysilicon Technology Dev Co Ltd | 具有經矽化物塗覆的金屬表面之反應器 |
| WO2010123875A1 (en) * | 2009-04-20 | 2010-10-28 | Ae Polysilicon Corporation | Processes and an apparatus for manufacturing high purity polysilicon |
| KR20100117025A (ko) * | 2009-04-23 | 2010-11-02 | 스미또모 가가꾸 가부시키가이샤 | 포토레지스트 패턴 형성 방법 |
| DE102009037155B3 (de) * | 2009-08-04 | 2010-11-04 | Schmid Silicon Technology Gmbh | Verfahren und Anlage zur Herstellung von Trichlorsilan |
| EP2528928A2 (en) | 2010-01-26 | 2012-12-05 | Dow Corning Corporation | Method of preparing an organohalosilane |
| US8722915B2 (en) | 2010-05-28 | 2014-05-13 | Dow Corning Corporation | Preparation of organohalosilanes |
| JP5726294B2 (ja) | 2010-05-28 | 2015-05-27 | ダウ コーニング コーポレーションDow Corning Corporation | ジオルガノジハロシランの調製方法 |
| CN103052595A (zh) | 2010-09-08 | 2013-04-17 | 道康宁公司 | 制备三卤代硅烷的方法 |
| DE102010044755A1 (de) | 2010-09-08 | 2012-03-08 | Spawnt Private S.À.R.L. | Verfahren zur Herstellung von Silicium hoher Reinheit |
| AU2011341476A1 (en) | 2010-12-17 | 2013-05-23 | Dow Corning Corporation | Method of making a diorganodihalosilane |
| EP2651954B1 (en) | 2010-12-17 | 2015-09-16 | Dow Corning Corporation | Method of making a trihalosilane |
| AU2012209345A1 (en) | 2011-01-25 | 2013-06-13 | Dow Corning Corporation | Method of preparing a diorganodihalosilane |
| KR101987396B1 (ko) * | 2011-10-20 | 2019-06-10 | 알이씨 실리콘 인코포레이티드 | 하이드로클로로실란 제조시 파울링의 감소 |
| WO2013138461A1 (en) * | 2012-03-14 | 2013-09-19 | Centrotherm Photovoltaics Usa, Inc. | Trichlorosilane production |
| FR2991988B1 (fr) | 2012-06-15 | 2015-08-07 | Laurent Laroche | Procede de preparation d'objets en hydrogel biocompatible pour leur application dans le domaine medical, et plus particulierement en ophtalmologie |
| US9296765B2 (en) | 2012-08-13 | 2016-03-29 | Dow Corning Corporation | Method of preparing an organohalosilane |
| CN104583221B (zh) | 2012-10-16 | 2018-05-01 | 道康宁公司 | 制备卤化硅杂亚烃的方法 |
| DE102013207444A1 (de) * | 2013-04-24 | 2014-10-30 | Evonik Degussa Gmbh | Verfahren und Vorrichtung zur Herstellung von Polychlorsilanen |
| KR102299593B1 (ko) | 2013-11-12 | 2021-09-09 | 다우 실리콘즈 코포레이션 | 할로실란의 제조 방법 |
| US10081643B2 (en) | 2014-12-18 | 2018-09-25 | Dow Silicones Corporation | Method for producing aryl-functional silanes |
| CN112573522B (zh) * | 2020-12-14 | 2022-07-26 | 亚洲硅业(青海)股份有限公司 | 硅基电子特气的制备方法及硅基电子特气的生产系统 |
| CN113072074A (zh) * | 2021-04-25 | 2021-07-06 | 森松(江苏)重工有限公司 | 还原炉的炉筒冷却方法、装置及多晶硅还原生产方法 |
| CN113912066A (zh) * | 2021-09-09 | 2022-01-11 | 全椒亚格泰电子新材料科技有限公司 | 一种制备氯代硅烷的方法 |
| CN116835599A (zh) * | 2023-07-03 | 2023-10-03 | 四川永祥能源科技有限公司 | 一种高沸物回收方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3069239A (en) * | 1958-10-28 | 1962-12-18 | Westinghouse Electric Corp | Purification of halogenated silicon compounds |
| GB883326A (en) * | 1959-04-08 | 1961-11-29 | Bbc Brown Boveri & Cie | Method of producing trichlorsilane |
| FR1239350A (fr) * | 1959-06-24 | 1960-12-16 | Pechiney | Perfectionnement à la fabrication industrielle du trichlorosilane |
| DE1129145B (de) * | 1960-07-07 | 1962-05-10 | Knapsack Ag | Verfahren zur Herstellung von hochreinem Silicium |
| FR1292508A (fr) * | 1960-07-07 | 1962-05-04 | Knapsack Ag | Procédé de fabrication de silicium de grande pureté |
| US3899573A (en) * | 1971-10-18 | 1975-08-12 | Exxon Research Engineering Co | Production of fine powders |
| US4321246A (en) * | 1980-05-09 | 1982-03-23 | Motorola, Inc. | Polycrystalline silicon production |
| US4309259A (en) * | 1980-05-09 | 1982-01-05 | Motorola, Inc. | High pressure plasma hydrogenation of silicon tetrachloride |
| DE3024319C2 (de) * | 1980-06-27 | 1983-07-21 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Kontinuierliches Verfahren zur Herstellung von Trichlorsilan |
| JPS57156318A (en) * | 1981-03-16 | 1982-09-27 | Koujiyundo Silicon Kk | Production of trichlorosilane |
| US4451436A (en) * | 1983-02-01 | 1984-05-29 | Hare Louis R O | Nitrogen fixation by plasma and catalyst |
-
1982
- 1982-07-26 FR FR8212971A patent/FR2530638A1/fr active Granted
-
1983
- 1983-07-13 EP EP83401454A patent/EP0100266B1/fr not_active Expired
- 1983-07-13 DE DE8383401454T patent/DE3371190D1/de not_active Expired
- 1983-07-25 CA CA000433086A patent/CA1210221A/fr not_active Expired
- 1983-07-25 US US06/516,843 patent/US4836997A/en not_active Expired - Fee Related
- 1983-07-25 JP JP58134511A patent/JPS5945920A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| FR2530638A1 (fr) | 1984-01-27 |
| EP0100266B1 (fr) | 1987-04-29 |
| JPS6261530B2 (en:Method) | 1987-12-22 |
| CA1210221A (fr) | 1986-08-26 |
| US4836997A (en) | 1989-06-06 |
| EP0100266A1 (fr) | 1984-02-08 |
| DE3371190D1 (en) | 1987-06-04 |
| JPS5945920A (ja) | 1984-03-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |