FR1292508A - Procédé de fabrication de silicium de grande pureté - Google Patents

Procédé de fabrication de silicium de grande pureté

Info

Publication number
FR1292508A
FR1292508A FR864579A FR864579A FR1292508A FR 1292508 A FR1292508 A FR 1292508A FR 864579 A FR864579 A FR 864579A FR 864579 A FR864579 A FR 864579A FR 1292508 A FR1292508 A FR 1292508A
Authority
FR
France
Prior art keywords
manufacturing process
high purity
purity silicon
silicon manufacturing
silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR864579A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Knapsack AG
Knapsack Griesheim AG
Original Assignee
Knapsack AG
Knapsack Griesheim AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DEK41130A external-priority patent/DE1129145B/de
Application filed by Knapsack AG, Knapsack Griesheim AG filed Critical Knapsack AG
Priority to FR864579A priority Critical patent/FR1292508A/fr
Application granted granted Critical
Publication of FR1292508A publication Critical patent/FR1292508A/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02524—Group 14 semiconducting materials
    • H01L21/02532—Silicon, silicon germanium, germanium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
FR864579A 1960-07-07 1961-06-12 Procédé de fabrication de silicium de grande pureté Expired FR1292508A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR864579A FR1292508A (fr) 1960-07-07 1961-06-12 Procédé de fabrication de silicium de grande pureté

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEK41130A DE1129145B (de) 1960-07-07 1960-07-07 Verfahren zur Herstellung von hochreinem Silicium
FR864579A FR1292508A (fr) 1960-07-07 1961-06-12 Procédé de fabrication de silicium de grande pureté

Publications (1)

Publication Number Publication Date
FR1292508A true FR1292508A (fr) 1962-05-04

Family

ID=25983286

Family Applications (1)

Application Number Title Priority Date Filing Date
FR864579A Expired FR1292508A (fr) 1960-07-07 1961-06-12 Procédé de fabrication de silicium de grande pureté

Country Status (1)

Country Link
FR (1) FR1292508A (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4117094A (en) * 1977-06-13 1978-09-26 Texas Instruments Incorporated Process for silicon and trichlorosilane production
FR2530638A1 (fr) * 1982-07-26 1984-01-27 Rhone Poulenc Spec Chim Procede de preparation d'un melange a base de trichlorosilane utilisable pour la preparation de silicium de haute purete

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4117094A (en) * 1977-06-13 1978-09-26 Texas Instruments Incorporated Process for silicon and trichlorosilane production
FR2530638A1 (fr) * 1982-07-26 1984-01-27 Rhone Poulenc Spec Chim Procede de preparation d'un melange a base de trichlorosilane utilisable pour la preparation de silicium de haute purete
EP0100266A1 (fr) * 1982-07-26 1984-02-08 Rhone-Poulenc Chimie Procédé de préparation d'un mélange à base de trichlorosilane utilisable pour la préparation de silicium de haute pureté

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