FR2515425B1 - Procede de definition d'elements de taille inferieure au micron dans des dispositifs semi-conducteurs - Google Patents
Procede de definition d'elements de taille inferieure au micron dans des dispositifs semi-conducteursInfo
- Publication number
- FR2515425B1 FR2515425B1 FR8217540A FR8217540A FR2515425B1 FR 2515425 B1 FR2515425 B1 FR 2515425B1 FR 8217540 A FR8217540 A FR 8217540A FR 8217540 A FR8217540 A FR 8217540A FR 2515425 B1 FR2515425 B1 FR 2515425B1
- Authority
- FR
- France
- Prior art keywords
- semiconductor devices
- micron size
- elements under
- defining elements
- under micron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
- H01L21/26513—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors of electrically active species
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/266—Bombardment with radiation with high-energy radiation producing ion implantation using masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/872—Schottky diodes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/944—Shadow
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/947—Subphotolithographic processing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- High Energy & Nuclear Physics (AREA)
- Manufacturing & Machinery (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/315,757 US4441931A (en) | 1981-10-28 | 1981-10-28 | Method of making self-aligned guard regions for semiconductor device elements |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2515425A1 FR2515425A1 (fr) | 1983-04-29 |
FR2515425B1 true FR2515425B1 (fr) | 1986-01-17 |
Family
ID=23225928
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8217540A Expired FR2515425B1 (fr) | 1981-10-28 | 1982-10-20 | Procede de definition d'elements de taille inferieure au micron dans des dispositifs semi-conducteurs |
Country Status (9)
Country | Link |
---|---|
US (1) | US4441931A (fr) |
JP (1) | JPS5884432A (fr) |
BE (1) | BE894797A (fr) |
CA (1) | CA1186809A (fr) |
DE (1) | DE3239819A1 (fr) |
FR (1) | FR2515425B1 (fr) |
GB (1) | GB2108759B (fr) |
IT (1) | IT1153577B (fr) |
NL (1) | NL8204152A (fr) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5950567A (ja) * | 1982-09-16 | 1984-03-23 | Hitachi Ltd | 電界効果トランジスタの製造方法 |
JPS60201666A (ja) * | 1984-03-27 | 1985-10-12 | Nec Corp | 半導体装置 |
EP0182088B1 (fr) * | 1984-10-26 | 1990-03-21 | Siemens Aktiengesellschaft | Contact Schottky à la surface d'un semi-conducteur et son procédé de réalisatioN |
US4655875A (en) * | 1985-03-04 | 1987-04-07 | Hitachi, Ltd. | Ion implantation process |
US4712291A (en) * | 1985-06-06 | 1987-12-15 | The United States Of America As Represented By The Secretary Of The Air Force | Process of fabricating TiW/Si self-aligned gate for GaAs MESFETs |
US4669178A (en) * | 1986-05-23 | 1987-06-02 | International Business Machines Corporation | Process for forming a self-aligned low resistance path in semiconductor devices |
US5141891A (en) * | 1988-11-09 | 1992-08-25 | Mitsubishi Denki Kabushiki Kaisha | MIS-type semiconductor device of LDD structure and manufacturing method thereof |
US5120668A (en) * | 1991-07-10 | 1992-06-09 | Ibm Corporation | Method of forming an inverse T-gate FET transistor |
US6040222A (en) * | 1999-02-02 | 2000-03-21 | United Microelectronics Corp. | Method for fabricating an electrostatistic discharge protection device to protect an integrated circuit |
US6514840B2 (en) * | 1999-04-13 | 2003-02-04 | International Business Machines Corporation | Micro heating of selective regions |
US6699775B2 (en) * | 2000-02-22 | 2004-03-02 | International Rectifier Corporation | Manufacturing process for fast recovery diode |
US20060022291A1 (en) * | 2004-07-28 | 2006-02-02 | Vladimir Drobny | Unguarded schottky diodes with sidewall spacer at the perimeter of the diode |
US8901699B2 (en) | 2005-05-11 | 2014-12-02 | Cree, Inc. | Silicon carbide junction barrier Schottky diodes with suppressed minority carrier injection |
JP2011129619A (ja) * | 2009-12-16 | 2011-06-30 | Toyota Motor Corp | 半導体装置の製造方法 |
WO2012093275A1 (fr) * | 2011-01-07 | 2012-07-12 | University Of Calcutta | Procédés et systèmes configurés pour calculer une zone de garde d'un objet tridimensionnel |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3920861A (en) * | 1972-12-18 | 1975-11-18 | Rca Corp | Method of making a semiconductor device |
DE2432719B2 (de) * | 1974-07-08 | 1977-06-02 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum erzeugen von feinen strukturen aus aufdampfbaren materialien auf einer unterlage und anwendung des verfahrens |
US4037307A (en) * | 1975-03-21 | 1977-07-26 | Bell Telephone Laboratories, Incorporated | Methods for making transistor structures |
US4026740A (en) * | 1975-10-29 | 1977-05-31 | Intel Corporation | Process for fabricating narrow polycrystalline silicon members |
JPS5263680A (en) * | 1975-11-19 | 1977-05-26 | Matsushita Electric Ind Co Ltd | Production of semiconductor device |
JPS5819129B2 (ja) * | 1975-12-10 | 1983-04-16 | 株式会社東芝 | ハンドウタイソウチノ セイゾウホウホウ |
JPS52147063A (en) * | 1976-06-02 | 1977-12-07 | Toshiba Corp | Semiconductor electrode forming method |
DE2641334C2 (de) * | 1976-09-14 | 1985-06-27 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur Herstellung integrierter MIS-Schaltungen |
US4145459A (en) * | 1978-02-02 | 1979-03-20 | Rca Corporation | Method of making a short gate field effect transistor |
DE2842589A1 (de) * | 1978-09-29 | 1980-05-08 | Siemens Ag | Feldeffekttransistor mit verringerter substratsteuerung der kanalbreite |
US4261095A (en) * | 1978-12-11 | 1981-04-14 | International Business Machines Corporation | Self aligned schottky guard ring |
JPS56125843A (en) * | 1980-03-07 | 1981-10-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Forming method of fine pattern |
JPS56131933A (en) * | 1980-03-19 | 1981-10-15 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Forming method of pattern of metallic film |
-
1981
- 1981-10-28 US US06/315,757 patent/US4441931A/en not_active Expired - Fee Related
-
1982
- 1982-09-28 CA CA000412389A patent/CA1186809A/fr not_active Expired
- 1982-10-20 FR FR8217540A patent/FR2515425B1/fr not_active Expired
- 1982-10-25 BE BE0/209320A patent/BE894797A/fr not_active IP Right Cessation
- 1982-10-25 GB GB08230444A patent/GB2108759B/en not_active Expired
- 1982-10-25 IT IT23909/82A patent/IT1153577B/it active
- 1982-10-27 NL NL8204152A patent/NL8204152A/nl not_active Application Discontinuation
- 1982-10-27 DE DE19823239819 patent/DE3239819A1/de not_active Ceased
- 1982-10-28 JP JP57188287A patent/JPS5884432A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
FR2515425A1 (fr) | 1983-04-29 |
IT1153577B (it) | 1987-01-14 |
US4441931A (en) | 1984-04-10 |
GB2108759B (en) | 1985-07-17 |
JPS5884432A (ja) | 1983-05-20 |
DE3239819A1 (de) | 1983-05-05 |
IT8223909A0 (it) | 1982-10-25 |
CA1186809A (fr) | 1985-05-07 |
GB2108759A (en) | 1983-05-18 |
BE894797A (fr) | 1983-02-14 |
NL8204152A (nl) | 1983-05-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2517881B1 (fr) | Procede de formation d'elements de taille inferieure au micron dans des dispositifs a semi-conducteur | |
FR2551583B1 (fr) | Procede d'attaque selective de materiaux dans les dispositifs semi-conducteurs | |
IT8221194A0 (it) | Procedimento e dispositivo per la deformazione dei corpi di lattine e dispositivo per l'esecuzione di questo procedimento. | |
FR2557245B1 (fr) | Procede et dispositif d'etancheification pour arbres | |
FR2515425B1 (fr) | Procede de definition d'elements de taille inferieure au micron dans des dispositifs semi-conducteurs | |
FR2544647B1 (fr) | Procede et dispositif pour fabriquer des pieces d'usinage | |
FR2585921B1 (fr) | Procede et dispositif pour la fabrication de fourrage concentre | |
FR2595165B1 (fr) | Dispositif a semi-conducteurs du type tridimensionnel et procede pour sa production | |
IT8222292A0 (it) | Dispositivo per la rivelazione di radiazioni e dispositivo semiconduttore per l'impiego in tale dispositivo. | |
FR2601397B1 (fr) | Procede et dispositif de battage pour enfoncer des outils dans le sol. | |
IT8247636A0 (it) | Dispositivo di fissaggio per pezzi in lavorazione in blocco | |
FR2529456B1 (fr) | Dispositif elevateur pour fauteuil roulant et fauteuil roulant en faisant application | |
FR2498966B1 (fr) | Procede et dispositif d'usinage par electro-erosion | |
FR2572202B1 (fr) | Procede et dispositif pour faciliter la desolidarisation d'organes entre lesquels s'exercent des contraintes elevees | |
FR2601848B1 (fr) | Dispositif et procede pour l'application de plaque d'oreilles sur du betail. | |
FR2615616B1 (fr) | Procede et dispositif pour determiner le passage a l'apogee | |
FR2536860B1 (fr) | Procede et dispositif pour l'analyse d'heterogeneites dans un materiau transparent | |
FR2511706B1 (fr) | Procede et dispositif d'electrodeposition | |
FR2565643B1 (fr) | Dispositif d'etancheite pour roulements | |
IT8520173A0 (it) | Dispositivo per l'elaborazione disegnali elettrooculografici. | |
ES508968A0 (es) | "dispositivo transistor perfeccionado". | |
FR2559051B1 (fr) | Procede et dispositifs pour capter le pouls arteriel | |
FR2561062B3 (fr) | Dispositif pour extirper des souches d'arbres | |
FR2596466B1 (fr) | Dispositif d'assistance hydraulique | |
FR2634969B1 (fr) | Procede pour l'arrosage de grandes surfaces et dispositif pour la mise en oeuvre de ce procede |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |