FR2481718A1 - Procede de pretraitement de substrats sensiblement non conducteurs pour les rendre receptifs a des revetements electrolytiques - Google Patents

Procede de pretraitement de substrats sensiblement non conducteurs pour les rendre receptifs a des revetements electrolytiques Download PDF

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Publication number
FR2481718A1
FR2481718A1 FR8108047A FR8108047A FR2481718A1 FR 2481718 A1 FR2481718 A1 FR 2481718A1 FR 8108047 A FR8108047 A FR 8108047A FR 8108047 A FR8108047 A FR 8108047A FR 2481718 A1 FR2481718 A1 FR 2481718A1
Authority
FR
France
Prior art keywords
copper
acid
substrate
coating
deposit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR8108047A
Other languages
English (en)
French (fr)
Other versions
FR2481718B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Daniel Joseph Combs
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Occidental Chemical Corp
Original Assignee
Hooker Chemicals and Plastics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hooker Chemicals and Plastics Corp filed Critical Hooker Chemicals and Plastics Corp
Publication of FR2481718A1 publication Critical patent/FR2481718A1/fr
Application granted granted Critical
Publication of FR2481718B1 publication Critical patent/FR2481718B1/fr
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54Electroplating of non-metallic surfaces
    • C25D5/56Electroplating of non-metallic surfaces of plastics
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Chemically Coating (AREA)
FR8108047A 1980-05-01 1981-04-22 Procede de pretraitement de substrats sensiblement non conducteurs pour les rendre receptifs a des revetements electrolytiques Granted FR2481718A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/145,534 US4374709A (en) 1980-05-01 1980-05-01 Process for plating polymeric substrates

Publications (2)

Publication Number Publication Date
FR2481718A1 true FR2481718A1 (fr) 1981-11-06
FR2481718B1 FR2481718B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1985-05-03

Family

ID=22513544

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8108047A Granted FR2481718A1 (fr) 1980-05-01 1981-04-22 Procede de pretraitement de substrats sensiblement non conducteurs pour les rendre receptifs a des revetements electrolytiques

Country Status (12)

Country Link
US (1) US4374709A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS56169793A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
AU (1) AU526075B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BR (1) BR8102678A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1192858A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3116743A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
ES (1) ES8205021A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2481718A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2075063B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
IT (1) IT1142499B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
MX (1) MX163920B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL8102169A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

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DE3240643A1 (de) * 1982-11-04 1984-05-30 LPW-Chemie GmbH, 4040 Neuss Erzeugung von leiterbahnbeschichtungen und leitenden lochwandbeschichtungen auf bzw. in leiterplatten
EP0137912B1 (en) * 1983-06-24 1990-05-16 American Cyanamid Company Apparatus and process for continuously plating fiber
JPS60258494A (ja) * 1984-06-01 1985-12-20 Nippon Sanmou Senshoku Kk 導電性高分子材料
US4673469A (en) * 1984-06-08 1987-06-16 Mcgean-Rohco, Inc. Method of plating plastics
US5004525A (en) * 1988-08-23 1991-04-02 Shipley Company Inc. Copper electroplating composition
US5849171A (en) * 1990-10-13 1998-12-15 Atotech Deutschland Gmbh Acid bath for copper plating and process with the use of this combination
DE4032864A1 (de) * 1990-10-13 1992-04-16 Schering Ag Saures bad zur galvanischen abscheidung von kupferueberzuegen und verfahren unter verwendung dieser kombination
US5328589A (en) * 1992-12-23 1994-07-12 Enthone-Omi, Inc. Functional fluid additives for acid copper electroplating baths
US5336370A (en) * 1993-12-09 1994-08-09 Chipalkatti Makarand H Pre-treatment for plating technique
EP0795802A1 (en) * 1996-03-15 1997-09-17 Agfa-Gevaert N.V. A printhead structure made from an electroless plated plastic substrate
US6203582B1 (en) * 1996-07-15 2001-03-20 Semitool, Inc. Modular semiconductor workpiece processing tool
US6454926B1 (en) 1997-09-30 2002-09-24 Semitool Inc. Semiconductor plating system workpiece support having workpiece-engaging electrode with submerged conductive current transfer areas
US6936153B1 (en) 1997-09-30 2005-08-30 Semitool, Inc. Semiconductor plating system workpiece support having workpiece-engaging electrode with pre-conditioned contact face
US6258241B1 (en) 1997-12-10 2001-07-10 Lucent Technologies, Inc. Process for electroplating metals
US20040045832A1 (en) * 1999-10-14 2004-03-11 Nicholas Martyak Electrolytic copper plating solutions
KR100760337B1 (ko) * 1999-12-15 2007-09-20 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 시드층 보수방법
US6468672B1 (en) 2000-06-29 2002-10-22 Lacks Enterprises, Inc. Decorative chrome electroplate on plastics
GB0020414D0 (en) * 2000-08-18 2000-10-04 Avecia Ltd Dispersions containing polyether dispersants
US20040000488A1 (en) * 2002-06-28 2004-01-01 Applied Materials, Inc. CU ECP planarization by insertion of polymer treatment step between gap fill and bulk fill steps
US8465469B2 (en) * 2002-09-12 2013-06-18 Medtronic Vascular, Inc. Reinforced catheter and methods of making
US20040211657A1 (en) * 2003-04-11 2004-10-28 Ingelbrecht Hugo Gerard Eduard Method of purifying 2,6-xylenol and method of producing poly(arylene ether) therefrom
US9399618B2 (en) * 2003-05-12 2016-07-26 Arkema Inc. High purity electrolytic sulfonic acid solutions
US20050230262A1 (en) * 2004-04-20 2005-10-20 Semitool, Inc. Electrochemical methods for the formation of protective features on metallized features
US20060086620A1 (en) * 2004-10-21 2006-04-27 Chase Lee A Textured decorative plating on plastic components
TW200632147A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2004-11-12 2006-09-16
US7354354B2 (en) * 2004-12-17 2008-04-08 Integran Technologies Inc. Article comprising a fine-grained metallic material and a polymeric material
JP2007023361A (ja) * 2005-07-20 2007-02-01 Mitsubishi Engineering Plastics Corp 芳香族ポリカーボネート系樹脂成形品のメッキ方法およびメッキ成形品
US20070158199A1 (en) * 2005-12-30 2007-07-12 Haight Scott M Method to modulate the surface roughness of a plated deposit and create fine-grained flat bumps
US20070178697A1 (en) * 2006-02-02 2007-08-02 Enthone Inc. Copper electrodeposition in microelectronics
JP2009041097A (ja) * 2007-08-10 2009-02-26 Rohm & Haas Electronic Materials Llc 銅めっき方法
US20090056991A1 (en) * 2007-08-31 2009-03-05 Kuhr Werner G Methods of Treating a Surface to Promote Binding of Molecule(s) of Interest, Coatings and Devices Formed Therefrom
US20090056994A1 (en) * 2007-08-31 2009-03-05 Kuhr Werner G Methods of Treating a Surface to Promote Metal Plating and Devices Formed
US7905994B2 (en) * 2007-10-03 2011-03-15 Moses Lake Industries, Inc. Substrate holder and electroplating system
US20090188553A1 (en) * 2008-01-25 2009-07-30 Emat Technology, Llc Methods of fabricating solar-cell structures and resulting solar-cell structures
US8262894B2 (en) 2009-04-30 2012-09-11 Moses Lake Industries, Inc. High speed copper plating bath
KR101730983B1 (ko) 2010-07-06 2017-04-27 나믹스 코포레이션 인쇄회로기판에서 사용하기 위한 유기 기판에의 접착을 향상시키는 구리 표면의 처리 방법
JP2011068995A (ja) * 2010-11-15 2011-04-07 Mitsubishi Engineering Plastics Corp 芳香族ポリカーボネート系樹脂成形品のメッキ方法およびメッキ成形品
US8747643B2 (en) * 2011-08-22 2014-06-10 Rohm And Haas Electronic Materials Llc Plating bath and method
CN103009708A (zh) * 2011-09-21 2013-04-03 深圳富泰宏精密工业有限公司 镀膜件及其制造方法
US9243339B2 (en) 2012-05-25 2016-01-26 Trevor Pearson Additives for producing copper electrodeposits having low oxygen content
ITUD20130108A1 (it) 2013-08-13 2015-02-14 New Technology Consultants N T C Dispositivo di controllo del funzionamento di uno scambiatore di calore, scambiatore di calore comprendente detto dispositivo e relativo procedimento di controllo
US9809891B2 (en) 2014-06-30 2017-11-07 Rohm And Haas Electronic Materials Llc Plating method
US10988852B2 (en) 2015-10-27 2021-04-27 Rohm And Haas Electronic Materials Llc Method of electroplating copper into a via on a substrate from an acid copper electroplating bath
PT3497267T (pt) 2016-08-15 2020-07-28 Atotech Deutschland Gmbh Composição aquosa acídica para galvanização eletrolítica de cobre
US10986738B2 (en) * 2018-05-08 2021-04-20 Macdermid Enthone Inc. Carbon-based direct plating process

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2243429A (en) * 1937-01-13 1941-05-27 Langbein Pfanhauser Werke Ag Electroplating of nonconductive surfaces
US3099608A (en) * 1959-12-30 1963-07-30 Ibm Method of electroplating on a dielectric base

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3328273A (en) * 1966-08-15 1967-06-27 Udylite Corp Electro-deposition of copper from acidic baths
US3682788A (en) * 1970-07-28 1972-08-08 M & T Chemicals Inc Copper electroplating
US3751289A (en) * 1971-08-20 1973-08-07 M & T Chemicals Inc Method of preparing surfaces for electroplating
US3954570A (en) * 1974-11-11 1976-05-04 Amp Incorporated Sensitized polyimides and circuit elements thereof

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2243429A (en) * 1937-01-13 1941-05-27 Langbein Pfanhauser Werke Ag Electroplating of nonconductive surfaces
US3099608A (en) * 1959-12-30 1963-07-30 Ibm Method of electroplating on a dielectric base

Also Published As

Publication number Publication date
ES501765A0 (es) 1982-05-16
BR8102678A (pt) 1982-01-26
DE3116743A1 (de) 1982-02-25
GB2075063B (en) 1983-04-07
IT8148365A0 (it) 1981-04-29
US4374709A (en) 1983-02-22
IT1142499B (it) 1986-10-08
NL8102169A (nl) 1981-12-01
AU526075B2 (en) 1982-12-16
CA1192858A (en) 1985-09-03
GB2075063A (en) 1981-11-11
FR2481718B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1985-05-03
JPH0224919B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-05-31
ES8205021A1 (es) 1982-05-16
MX163920B (es) 1992-06-30
AU7001881A (en) 1981-11-05
JPS56169793A (en) 1981-12-26

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ST Notification of lapse