FR2429270A1 - Appareil pour realiser dans une enceinte sous vide, le depot d'une couche mince sur un substrat ou l'erosion de la surface d'une piece - Google Patents

Appareil pour realiser dans une enceinte sous vide, le depot d'une couche mince sur un substrat ou l'erosion de la surface d'une piece

Info

Publication number
FR2429270A1
FR2429270A1 FR7818808A FR7818808A FR2429270A1 FR 2429270 A1 FR2429270 A1 FR 2429270A1 FR 7818808 A FR7818808 A FR 7818808A FR 7818808 A FR7818808 A FR 7818808A FR 2429270 A1 FR2429270 A1 FR 2429270A1
Authority
FR
France
Prior art keywords
substrates
trolley
substrate
mfg
integrated circuits
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7818808A
Other languages
English (en)
Other versions
FR2429270B3 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to FR7818808A priority Critical patent/FR2429270A1/fr
Publication of FR2429270A1 publication Critical patent/FR2429270A1/fr
Application granted granted Critical
Publication of FR2429270B3 publication Critical patent/FR2429270B3/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

a. Appareil pour réaliser, dans une enceinte sous vide, le dépôt d'une couche mince sur un substrat ou l'érosion de la surface d'une pièce et ce, par pulvérisation de particules de la matière à déposer, ou projection de particules d'érosion. b. Dans cet appareil, la pièce à traiter est placée sur un chariot 18 pourvu de moyens pour le montage rotatif de celle-ci, des moyens appropriés étant prévus pour entraîner cette pièce en rotation à vitesse constante, pendant son déplacement à l'intérieur de l'enceinte de traitement 8. Quant au chariot, son déplacement est assuré par des moyens d'entraînement aptes à le faire avancer pas à pas devant la source 14 d'émission de particules ou à lui imprimer un mouvement continu mais de vitesse variable. Des moyens de commande permettant, dans le premier cas, de faire varier à volonté la duree de stationnement du chariot dans chacune de ses positions successives et, dans le second cas, de faire varier la vitesse de déplacement du chariot au cours de son passage en regard de la source d'émission. c. Grâce à une variation appropriée des conditions de déplacement du chariot pendant la rotation continue de la pièce, il est possible d'obtenir une parfaite uniformité du traitement réalisé.
FR7818808A 1978-06-23 1978-06-23 Appareil pour realiser dans une enceinte sous vide, le depot d'une couche mince sur un substrat ou l'erosion de la surface d'une piece Granted FR2429270A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7818808A FR2429270A1 (fr) 1978-06-23 1978-06-23 Appareil pour realiser dans une enceinte sous vide, le depot d'une couche mince sur un substrat ou l'erosion de la surface d'une piece

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7818808A FR2429270A1 (fr) 1978-06-23 1978-06-23 Appareil pour realiser dans une enceinte sous vide, le depot d'une couche mince sur un substrat ou l'erosion de la surface d'une piece

Publications (2)

Publication Number Publication Date
FR2429270A1 true FR2429270A1 (fr) 1980-01-18
FR2429270B3 FR2429270B3 (fr) 1981-03-20

Family

ID=9209896

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7818808A Granted FR2429270A1 (fr) 1978-06-23 1978-06-23 Appareil pour realiser dans une enceinte sous vide, le depot d'une couche mince sur un substrat ou l'erosion de la surface d'une piece

Country Status (1)

Country Link
FR (1) FR2429270A1 (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2475579A1 (fr) * 1979-12-21 1981-08-14 Varian Associates Machine de traintement de substrats minces et ses dispositifs de transport et de transmission de chaleur
US4511194A (en) * 1982-03-26 1985-04-16 U.S. Philips Corporation Magazine and disc holders for supporting discs in the magazine
WO2002002841A1 (fr) * 2000-06-30 2002-01-10 Forschungszentrum Karlsruhe Gmbh Roue de support de plaquettes comprenant un dispositif de pression
DE10211827C1 (de) * 2002-03-16 2003-10-30 Karlsruhe Forschzent Lagerung eines Substrathalterrades mit darin eingebautem/verankertem Substrathalter
CN107155262A (zh) * 2016-03-03 2017-09-12 深圳光启高等理工研究院 一种铜箔基材制备方法及应用其的超材料加工方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2475579A1 (fr) * 1979-12-21 1981-08-14 Varian Associates Machine de traintement de substrats minces et ses dispositifs de transport et de transmission de chaleur
US4511194A (en) * 1982-03-26 1985-04-16 U.S. Philips Corporation Magazine and disc holders for supporting discs in the magazine
WO2002002841A1 (fr) * 2000-06-30 2002-01-10 Forschungszentrum Karlsruhe Gmbh Roue de support de plaquettes comprenant un dispositif de pression
DE10032005B4 (de) * 2000-06-30 2004-01-15 Forschungszentrum Karlsruhe Gmbh Waferhalterad mit einer Andrückvorrichtung in einer Waferbeschichtungsanlage
DE10211827C1 (de) * 2002-03-16 2003-10-30 Karlsruhe Forschzent Lagerung eines Substrathalterrades mit darin eingebautem/verankertem Substrathalter
CN107155262A (zh) * 2016-03-03 2017-09-12 深圳光启高等理工研究院 一种铜箔基材制备方法及应用其的超材料加工方法

Also Published As

Publication number Publication date
FR2429270B3 (fr) 1981-03-20

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