FR2305021A1 - Procede pour l'application de glacures sur la surface des parties actives d'elements a semi-conducteurs, dispositif de serrage pour la mise en oeuvre du procede et application de celui-ci a la passivation des jonctions pn - Google Patents
Procede pour l'application de glacures sur la surface des parties actives d'elements a semi-conducteurs, dispositif de serrage pour la mise en oeuvre du procede et application de celui-ci a la passivation des jonctions pnInfo
- Publication number
- FR2305021A1 FR2305021A1 FR7607634A FR7607634A FR2305021A1 FR 2305021 A1 FR2305021 A1 FR 2305021A1 FR 7607634 A FR7607634 A FR 7607634A FR 7607634 A FR7607634 A FR 7607634A FR 2305021 A1 FR2305021 A1 FR 2305021A1
- Authority
- FR
- France
- Prior art keywords
- fusing
- glass powder
- semiconductor devices
- active semiconductor
- spraying dry
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000011521 glass Substances 0.000 title abstract 5
- 239000000843 powder Substances 0.000 title abstract 3
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 238000005507 spraying Methods 0.000 title abstract 2
- 238000002161 passivation Methods 0.000 title 1
- 238000000034 method Methods 0.000 abstract 3
- 239000004809 Teflon Substances 0.000 abstract 1
- 229920006362 Teflon® Polymers 0.000 abstract 1
- 239000007767 bonding agent Substances 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000011109 contamination Methods 0.000 abstract 1
- 238000001962 electrophoresis Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 239000000375 suspending agent Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/10155—Shape being other than a cuboid
- H01L2924/10156—Shape being other than a cuboid at the periphery
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/10155—Shape being other than a cuboid
- H01L2924/10157—Shape being other than a cuboid at the active surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/10155—Shape being other than a cuboid
- H01L2924/10158—Shape being other than a cuboid at the passive surface
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Formation Of Insulating Films (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Casings For Electric Apparatus (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH355275A CH591762A5 (enrdf_load_stackoverflow) | 1975-03-20 | 1975-03-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR2305021A1 true FR2305021A1 (fr) | 1976-10-15 |
Family
ID=4258446
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7607634A Withdrawn FR2305021A1 (fr) | 1975-03-20 | 1976-03-17 | Procede pour l'application de glacures sur la surface des parties actives d'elements a semi-conducteurs, dispositif de serrage pour la mise en oeuvre du procede et application de celui-ci a la passivation des jonctions pn |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS51118966A (enrdf_load_stackoverflow) |
| CH (1) | CH591762A5 (enrdf_load_stackoverflow) |
| DE (2) | DE7513490U (enrdf_load_stackoverflow) |
| FR (1) | FR2305021A1 (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2469000A1 (fr) * | 1979-10-30 | 1981-05-08 | Silicium Semiconducteur Ssc | Structure de thyristor tres haute tension glassive et son procede de fabrication |
| FR2515874A1 (fr) * | 1981-11-05 | 1983-05-06 | Comp Generale Electricite | Procede d'encapsulation plastique de cellules solaires |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5367363A (en) * | 1976-11-27 | 1978-06-15 | Mitsubishi Electric Corp | Semiconductor device |
| DE3832732A1 (de) * | 1988-09-27 | 1990-03-29 | Asea Brown Boveri | Leistungshalbleiterdiode |
| DE3832750A1 (de) * | 1988-09-27 | 1990-03-29 | Asea Brown Boveri | Leistungshalbleiterbauelement |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1438826A (fr) * | 1964-06-30 | 1966-05-13 | Ibm | Formation de films de verre par pulvérisation réactive |
| FR1485806A (fr) * | 1965-06-28 | 1967-06-23 | Ibm | Procédé et appareil permettant de déposer des particules sur un objet |
| US3473959A (en) * | 1964-08-10 | 1969-10-21 | Licentia Gmbh | Method for coating semiconductors and apparatus |
| DE2037524A1 (de) * | 1969-07-30 | 1971-02-11 | General Electric Co , Schenectady NY (V St A ) | Verfahren zur Herstellung eines in Glas gekapselten Halbleiterbauelements |
-
1975
- 1975-03-20 CH CH355275A patent/CH591762A5/xx not_active IP Right Cessation
- 1975-04-26 DE DE19757513490 patent/DE7513490U/de not_active Expired
- 1975-04-26 DE DE19752518666 patent/DE2518666A1/de not_active Withdrawn
-
1976
- 1976-03-17 FR FR7607634A patent/FR2305021A1/fr not_active Withdrawn
- 1976-03-18 JP JP2976776A patent/JPS51118966A/ja active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1438826A (fr) * | 1964-06-30 | 1966-05-13 | Ibm | Formation de films de verre par pulvérisation réactive |
| US3473959A (en) * | 1964-08-10 | 1969-10-21 | Licentia Gmbh | Method for coating semiconductors and apparatus |
| FR1485806A (fr) * | 1965-06-28 | 1967-06-23 | Ibm | Procédé et appareil permettant de déposer des particules sur un objet |
| DE2037524A1 (de) * | 1969-07-30 | 1971-02-11 | General Electric Co , Schenectady NY (V St A ) | Verfahren zur Herstellung eines in Glas gekapselten Halbleiterbauelements |
Non-Patent Citations (2)
| Title |
|---|
| NV8021/69 * |
| NV8137/73 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2469000A1 (fr) * | 1979-10-30 | 1981-05-08 | Silicium Semiconducteur Ssc | Structure de thyristor tres haute tension glassive et son procede de fabrication |
| FR2515874A1 (fr) * | 1981-11-05 | 1983-05-06 | Comp Generale Electricite | Procede d'encapsulation plastique de cellules solaires |
Also Published As
| Publication number | Publication date |
|---|---|
| CH591762A5 (enrdf_load_stackoverflow) | 1977-09-30 |
| JPS51118966A (en) | 1976-10-19 |
| DE2518666A1 (de) | 1976-09-30 |
| DE7513490U (de) | 1977-05-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB1273197A (en) | Improvements in or relating to the manufacture of semiconductor devices | |
| JPS6421441A (en) | Applicating method | |
| FR2305021A1 (fr) | Procede pour l'application de glacures sur la surface des parties actives d'elements a semi-conducteurs, dispositif de serrage pour la mise en oeuvre du procede et application de celui-ci a la passivation des jonctions pn | |
| ES2083154T3 (es) | Procedimiento de deposito de una capa de oxido de silicio unida a un sustrato de material polimero. | |
| JPS5267353A (en) | Electrostatic chuck | |
| IT1057683B (it) | Procedimento per la produzione di pellicole anodiche sigillate di ossido sull alluminio e sueleghe in preparazione al rivestimento o verniciatura | |
| JPS5241654A (en) | Formation of roughened coating layer by electro-phoresis and coating c omposition for the same | |
| JPS5226214A (en) | Method for coating resist | |
| JPS52155494A (en) | Process for w orking parallel plane of wafer | |
| JPS57104851A (en) | Semiconductor sensor | |
| JPH06504877A (ja) | 電場−援助接着 | |
| JPS51112182A (en) | Method and apparatus for generating plasma acted by magnetism to form thin film on surface of solid substrate | |
| JPS5350979A (en) | Method of treatment of thin oxide layer on silicon substrate | |
| JPS55146419A (en) | Display device | |
| JPS5278939A (en) | Application of thin coating film | |
| JPS5780647A (en) | Pulverized sample supporting method | |
| JPS5769737A (en) | Coating method and device for resist on both side surfaces of wafer | |
| JPS562872A (en) | Processing method of fluorine contained resin | |
| JPS56107564A (en) | Amorphous silicon thin film element | |
| JPS5541702A (en) | Glass film coating method for semiconductor | |
| SU632930A1 (ru) | Способ изготовлени образца дл испытани на сцепл емость покрыти с металлической подложкой | |
| JPS5651829A (en) | Glassivating method for bevel-type semiconductor element | |
| JPS5651830A (en) | Glassivating method for bevel-type semiconductor element | |
| JPS57100768A (en) | Manufacture of field effect semiconductor device | |
| JPS51126384A (en) | A method of forming a thin film by sputtering |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |