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GB1516352A
(en)
|
1974-05-02 |
1978-07-05 |
Gen Electric |
Halonium salts
|
|
GB2013208B
(en)
*
|
1977-12-16 |
1982-11-24 |
Gen Electric |
Heat curable compositions
|
|
GB2027435B
(en)
*
|
1977-12-16 |
1982-11-24 |
Gen Electric |
Curable resin compositions
|
|
CA1164710A
(en)
*
|
1978-05-09 |
1984-04-03 |
Edward J. Reardon, Jr. |
Phototropic photosensitive compositions containing fluoran colorformer
|
|
ATE6002T1
(de)
*
|
1978-10-27 |
1984-02-15 |
Imperial Chemical Industries Plc |
Polymerisierbare zusammensetzungen, daraus hergestellte beschichtungen und andere polymerisierte produkte.
|
|
DE2854011C2
(de)
*
|
1978-12-14 |
1983-04-21 |
General Electric Co., Schenectady, N.Y. |
Hitzehärtbare Masse und Verfahren zu deren Herstellung
|
|
US4279717A
(en)
*
|
1979-08-03 |
1981-07-21 |
General Electric Company |
Ultraviolet curable epoxy silicone coating compositions
|
|
DE3029247C2
(de)
*
|
1979-08-03 |
1996-04-11 |
Gen Electric |
UV-härtbare Siliconüberzugsmassen, Verfahren zu deren Herstellung und deren Verwendung
|
|
DE3107087A1
(de)
*
|
1980-02-29 |
1981-12-24 |
CIBA-GEIGY AG, 4002 Basel |
"photopolymerisierbare gemische und verfahren zur photopolymerisation von kationisch polymerisierbaren verbindungen"
|
|
US4351708A
(en)
*
|
1980-02-29 |
1982-09-28 |
Ciba-Geigy Corporation |
Photochemically or thermally polymerizable mixtures
|
|
US4336366A
(en)
*
|
1980-02-29 |
1982-06-22 |
Ciba-Geigy Corporation |
Thermally polymerizable mixtures and processes for the thermally-initiated polymerization of cationically polymerizable compounds
|
|
US4439517A
(en)
*
|
1982-01-21 |
1984-03-27 |
Ciba-Geigy Corporation |
Process for the formation of images with epoxide resin
|
|
US4518676A
(en)
*
|
1982-09-18 |
1985-05-21 |
Ciba Geigy Corporation |
Photopolymerizable compositions containing diaryliodosyl salts
|
|
US4482679A
(en)
*
|
1982-09-18 |
1984-11-13 |
Ciba-Geigy Corporation |
Heat-curable epoxy compositions containing diaryliodosyl salts
|
|
US4537725A
(en)
*
|
1982-09-18 |
1985-08-27 |
Ciba-Geigy Corporation |
Diaryliodosyl salts
|
|
JPS6078442A
(ja)
*
|
1983-10-04 |
1985-05-04 |
Agency Of Ind Science & Technol |
光硬化性樹脂組成物
|
|
JPS6076735A
(ja)
*
|
1983-10-04 |
1985-05-01 |
Agency Of Ind Science & Technol |
光硬化樹脂組成物
|
|
JPS6078443A
(ja)
*
|
1983-10-05 |
1985-05-04 |
Agency Of Ind Science & Technol |
光不溶性樹脂組成物
|
|
JPS60206328A
(ja)
*
|
1984-03-30 |
1985-10-17 |
Matsushita Electric Ind Co Ltd |
高周波回路装置
|
|
CA1289803C
(en)
*
|
1985-10-28 |
1991-10-01 |
Robert J. Cox |
Photoresist composition and printed circuit boards and packages made therewith
|
|
US4689289A
(en)
*
|
1986-04-30 |
1987-08-25 |
General Electric Company |
Block polymer compositions
|
|
US4857437A
(en)
*
|
1986-12-17 |
1989-08-15 |
Ciba-Geigy Corporation |
Process for the formation of an image
|
|
JP2565331B2
(ja)
*
|
1987-04-20 |
1996-12-18 |
富士写真フイルム株式会社 |
感光性組成物
|
|
DE69029104T2
(de)
|
1989-07-12 |
1997-03-20 |
Fuji Photo Film Co Ltd |
Polysiloxane und positiv arbeitende Resistmasse
|
|
DE3940965A1
(de)
*
|
1989-12-12 |
1991-06-13 |
Basf Ag |
Strahlungsempfindliches gemisch und verfahren zur herstellung von reliefstrukturen
|
|
EP0502819A1
(de)
*
|
1991-03-01 |
1992-09-09 |
Ciba-Geigy Ag |
Säurekatalytisch vernetzbare Copolymere
|
|
US5292614A
(en)
*
|
1991-08-02 |
1994-03-08 |
Mitsubishi Kasei Corporation |
Negative photosensitive composition and method for forming a resist pattern
|
|
US5286600A
(en)
*
|
1991-08-27 |
1994-02-15 |
Mitsubishi Kasei Corporation |
Negative photosensitive composition and method for forming a resist pattern by means thereof
|
|
EP0659781A3
(de)
*
|
1993-12-21 |
1995-09-27 |
Ciba Geigy Ag |
Maleinimidcopolymere, insbesonder für Photoresists.
|
|
DE69815073T3
(de)
|
1997-03-14 |
2008-07-03 |
Minnesota Mining And Manufacturing Co., St. Paul |
Auf-anfrage-härtung von feuchtigkeithärtbaren zusammensetzungen mit reaktiven funktionellen silangruppen
|
|
GB9921779D0
(en)
|
1999-09-16 |
1999-11-17 |
Ciba Sc Holding Ag |
UV-Curable compositions
|
|
EP1978408B1
(en)
|
2007-03-29 |
2011-10-12 |
FUJIFILM Corporation |
Negative resist composition and pattern forming method using the same
|
|
JPWO2009063824A1
(ja)
|
2007-11-14 |
2011-03-31 |
富士フイルム株式会社 |
塗布膜の乾燥方法及び平版印刷版原版の製造方法
|
|
JP2009236355A
(ja)
|
2008-03-26 |
2009-10-15 |
Fujifilm Corp |
乾燥方法及び装置
|
|
JP5743783B2
(ja)
|
2011-07-27 |
2015-07-01 |
富士フイルム株式会社 |
感光性組成物、平版印刷版原版、及びポリウレタン
|
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FR3105231B1
(fr)
*
|
2019-12-18 |
2021-12-10 |
Photon Polymers |
Procede photoradicalaire de durcissement d’une resine alkyde
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WO2021124114A1
(en)
|
2019-12-18 |
2021-06-24 |
3M Innovative Properties Company |
Composition including unsaturated polyester resin, epoxy resin, and photoinitiator and method of using the same
|