FR2294610A1 - Procede de formation de conducteurs electriques sur un substrat isolant - Google Patents

Procede de formation de conducteurs electriques sur un substrat isolant

Info

Publication number
FR2294610A1
FR2294610A1 FR7537607A FR7537607A FR2294610A1 FR 2294610 A1 FR2294610 A1 FR 2294610A1 FR 7537607 A FR7537607 A FR 7537607A FR 7537607 A FR7537607 A FR 7537607A FR 2294610 A1 FR2294610 A1 FR 2294610A1
Authority
FR
France
Prior art keywords
insulating substrate
electric conductors
training electric
training
conductors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7537607A
Other languages
English (en)
Other versions
FR2294610B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/531,430 external-priority patent/US4068022A/en
Priority claimed from US05/576,711 external-priority patent/US4016050A/en
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of FR2294610A1 publication Critical patent/FR2294610A1/fr
Application granted granted Critical
Publication of FR2294610B1 publication Critical patent/FR2294610B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/388—Improvement of the adhesion between the insulating substrate and the metal by the use of a metallic or inorganic thin film adhesion layer
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814—Conductive parts
    • H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/702—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof
    • H01L21/707—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof of thin-film circuits or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49866—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/01—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate comprising only passive thin-film or thick-film elements formed on a common insulating substrate
    • H01L27/016—Thin-film circuits
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/243—Reinforcing the conductive pattern characterised by selective plating, e.g. for finish plating of pads
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03—Conductive materials
    • H05K2201/0332—Structure of the conductor
    • H05K2201/0364—Conductor shape
    • H05K2201/0367—Metallic bump or raised conductor not used as solder bump
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703—Plating
    • H05K2203/0723—Electroplating, e.g. finish plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/062—Etching masks consisting of metals or alloys or metallic inorganic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
FR7537607A 1974-12-10 1975-12-09 Procede de formation de conducteurs electriques sur un substrat isolant Granted FR2294610A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US05/531,430 US4068022A (en) 1974-12-10 1974-12-10 Methods of strengthening bonds
US05/576,711 US4016050A (en) 1975-05-12 1975-05-12 Conduction system for thin film and hybrid integrated circuits

Publications (2)

Publication Number Publication Date
FR2294610A1 true FR2294610A1 (fr) 1976-07-09
FR2294610B1 FR2294610B1 (fr) 1980-03-21

Family

ID=27063541

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7537607A Granted FR2294610A1 (fr) 1974-12-10 1975-12-09 Procede de formation de conducteurs electriques sur un substrat isolant

Country Status (8)

Country Link
JP (1) JPS6032311B2 (fr)
DE (1) DE2554691C2 (fr)
ES (1) ES443346A1 (fr)
FR (1) FR2294610A1 (fr)
GB (1) GB1527108A (fr)
IT (1) IT1051461B (fr)
NL (1) NL185249C (fr)
SE (1) SE427400B (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2409603A1 (fr) * 1977-11-18 1979-06-15 Tektronix Inc Circuit hybride a substrat metallise ayant une couche d'arret en film mince, et procede de fabrication de ce circuit
EP0007598A1 (fr) * 1978-08-02 1980-02-06 Siemens Aktiengesellschaft Procédé pour la fabrication d'un circuit électrique en couche sur feuille en matière plastique
EP0016263A1 (fr) * 1979-03-21 1980-10-01 BBC Brown Boveri AG Résistance en couche mince à coefficient de température élevé et procédé pour sa fabrication
FR2542502A1 (fr) * 1983-03-11 1984-09-14 Nec Corp Substrat ayant au moins une couche conductrice fine de cablage
EP0459283A1 (fr) * 1990-05-29 1991-12-04 Daimler-Benz Aerospace Aktiengesellschaft Composant semi-conducteur fixé sur un support céramique

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54127572A (en) * 1978-03-28 1979-10-03 Oki Electric Ind Co Ltd Thin film circuit
JPS5559795A (en) * 1978-10-30 1980-05-06 Nippon Electric Co Printed circuit board and method of manufacturing same
FR2476913B1 (fr) * 1980-02-25 1985-09-13 Nippon Electric Co Circuit a plusieurs couches pour integration a grande echelle et procede de fabrication de ce circuit
DE3029382A1 (de) * 1980-08-01 1982-03-04 Siemens AG, 1000 Berlin und 8000 München Aufbau von metallschichten und verfahren zur herstellung dieses aufbaus
DE3029277C2 (de) * 1980-08-01 1983-10-20 Siemens AG, 1000 Berlin und 8000 München Aufbau von Metallschichten
DE3107943A1 (de) * 1981-03-02 1982-09-16 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von loetbaren und temperfaehigen edelmetallfreien duennschichtleiterbahnen
JPS57198696A (en) * 1981-06-01 1982-12-06 Shimada Rika Kogyo Kk Method of producing thin film circuit
DE3207659A1 (de) * 1982-03-03 1983-09-15 Siemens AG, 1000 Berlin und 8000 München Duennfilmschaltungen mit durchkontaktierungen
US4463059A (en) * 1982-06-30 1984-07-31 International Business Machines Corporation Layered metal film structures for LSI chip carriers adapted for solder bonding and wire bonding
JPS60140897A (ja) * 1983-12-28 1985-07-25 日本電気株式会社 樹脂絶縁多層基板
DE3433251A1 (de) * 1984-08-16 1986-02-27 Robert Bosch Gmbh, 7000 Stuttgart Verfahren zur herstellung von galvanischen lotschichten auf anorganischen substraten
US4808274A (en) * 1986-09-10 1989-02-28 Engelhard Corporation Metallized substrates and process for producing
EP0264648B1 (fr) * 1986-09-25 1993-05-05 Kabushiki Kaisha Toshiba Procédé de fabrication d'une bande de support
JPH03108797A (ja) * 1989-09-22 1991-05-08 Ngk Spark Plug Co Ltd 多層配線基板およびその製造方法
EP0526656B1 (fr) * 1991-02-25 1996-01-10 Sumitomo Electric Industries, Ltd. Tableau de connexions
US5449955A (en) * 1994-04-01 1995-09-12 At&T Corp. Film circuit metal system for use with bumped IC packages
DE10004453B4 (de) * 2000-02-03 2009-08-13 Ust Umweltsensortechnik Gmbh Elektrische Sicherung und Verfahren zu deren Herstellung
JP2003101222A (ja) * 2001-09-21 2003-04-04 Sony Corp 薄膜回路基板装置及びその製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE7106898U (de) * 1970-03-06 1971-05-27 Motorola Inc Integrierter Hybrid Schaltkreis

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2409603A1 (fr) * 1977-11-18 1979-06-15 Tektronix Inc Circuit hybride a substrat metallise ayant une couche d'arret en film mince, et procede de fabrication de ce circuit
EP0007598A1 (fr) * 1978-08-02 1980-02-06 Siemens Aktiengesellschaft Procédé pour la fabrication d'un circuit électrique en couche sur feuille en matière plastique
EP0016263A1 (fr) * 1979-03-21 1980-10-01 BBC Brown Boveri AG Résistance en couche mince à coefficient de température élevé et procédé pour sa fabrication
FR2542502A1 (fr) * 1983-03-11 1984-09-14 Nec Corp Substrat ayant au moins une couche conductrice fine de cablage
EP0459283A1 (fr) * 1990-05-29 1991-12-04 Daimler-Benz Aerospace Aktiengesellschaft Composant semi-conducteur fixé sur un support céramique

Also Published As

Publication number Publication date
IT1051461B (it) 1981-04-21
GB1527108A (en) 1978-10-04
DE2554691C2 (de) 1982-11-18
FR2294610B1 (fr) 1980-03-21
NL7514325A (nl) 1976-06-14
SE427400B (sv) 1983-03-28
ES443346A1 (es) 1977-08-16
DE2554691A1 (de) 1976-06-16
JPS6032311B2 (ja) 1985-07-27
SE7513853L (sv) 1976-06-11
NL185249B (nl) 1989-09-18
NL185249C (nl) 1990-02-16
JPS51101864A (en) 1976-09-08

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