FR2261601A1 - Method of forming conductive layers - uses varying pressures of oxygen during ion bombardment of target - Google Patents

Method of forming conductive layers - uses varying pressures of oxygen during ion bombardment of target

Info

Publication number
FR2261601A1
FR2261601A1 FR7405203A FR7405203A FR2261601A1 FR 2261601 A1 FR2261601 A1 FR 2261601A1 FR 7405203 A FR7405203 A FR 7405203A FR 7405203 A FR7405203 A FR 7405203A FR 2261601 A1 FR2261601 A1 FR 2261601A1
Authority
FR
France
Prior art keywords
target
ion bombardment
conductive layers
forming conductive
oxygen during
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7405203A
Other languages
English (en)
French (fr)
Other versions
FR2261601B1 (esLanguage
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7405203A priority Critical patent/FR2261601A1/fr
Publication of FR2261601A1 publication Critical patent/FR2261601A1/fr
Application granted granted Critical
Publication of FR2261601B1 publication Critical patent/FR2261601B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0084—Producing gradient compositions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physical Vapour Deposition (AREA)
FR7405203A 1974-02-15 1974-02-15 Method of forming conductive layers - uses varying pressures of oxygen during ion bombardment of target Granted FR2261601A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7405203A FR2261601A1 (en) 1974-02-15 1974-02-15 Method of forming conductive layers - uses varying pressures of oxygen during ion bombardment of target

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7405203A FR2261601A1 (en) 1974-02-15 1974-02-15 Method of forming conductive layers - uses varying pressures of oxygen during ion bombardment of target

Publications (2)

Publication Number Publication Date
FR2261601A1 true FR2261601A1 (en) 1975-09-12
FR2261601B1 FR2261601B1 (esLanguage) 1977-09-16

Family

ID=9134971

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7405203A Granted FR2261601A1 (en) 1974-02-15 1974-02-15 Method of forming conductive layers - uses varying pressures of oxygen during ion bombardment of target

Country Status (1)

Country Link
FR (1) FR2261601A1 (esLanguage)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0121625A3 (en) * 1983-04-04 1984-11-21 Borg-Warner Corporation Rapid rate reactive sputtering of metallic compounds
US4885070A (en) * 1988-02-12 1989-12-05 Leybold Aktiengesellschaft Method and apparatus for the application of materials
EP0405304A3 (en) * 1989-06-29 1992-06-03 Siemens Aktiengesellschaft Thin film resistors whose surface resistance values are comprised between 1m-ohms and several g-ohms and process of making it

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0121625A3 (en) * 1983-04-04 1984-11-21 Borg-Warner Corporation Rapid rate reactive sputtering of metallic compounds
US4885070A (en) * 1988-02-12 1989-12-05 Leybold Aktiengesellschaft Method and apparatus for the application of materials
EP0405304A3 (en) * 1989-06-29 1992-06-03 Siemens Aktiengesellschaft Thin film resistors whose surface resistance values are comprised between 1m-ohms and several g-ohms and process of making it

Also Published As

Publication number Publication date
FR2261601B1 (esLanguage) 1977-09-16

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Legal Events

Date Code Title Description
ST Notification of lapse