FR2204709A1 - Deposition of thin layers under vacuum - by ion bombardment of high melting point materials e.g. platinum - Google Patents

Deposition of thin layers under vacuum - by ion bombardment of high melting point materials e.g. platinum

Info

Publication number
FR2204709A1
FR2204709A1 FR7238212A FR7238212A FR2204709A1 FR 2204709 A1 FR2204709 A1 FR 2204709A1 FR 7238212 A FR7238212 A FR 7238212A FR 7238212 A FR7238212 A FR 7238212A FR 2204709 A1 FR2204709 A1 FR 2204709A1
Authority
FR
France
Prior art keywords
platinum
deposition
melting point
under vacuum
high melting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7238212A
Other languages
English (en)
French (fr)
Other versions
FR2204709B1 (enExample
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bpifrance Financement SA
Original Assignee
Agence National de Valorisation de la Recherche ANVAR
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agence National de Valorisation de la Recherche ANVAR filed Critical Agence National de Valorisation de la Recherche ANVAR
Priority to FR7238212A priority Critical patent/FR2204709A1/fr
Publication of FR2204709A1 publication Critical patent/FR2204709A1/fr
Application granted granted Critical
Publication of FR2204709B1 publication Critical patent/FR2204709B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR7238212A 1972-10-27 1972-10-27 Deposition of thin layers under vacuum - by ion bombardment of high melting point materials e.g. platinum Granted FR2204709A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7238212A FR2204709A1 (en) 1972-10-27 1972-10-27 Deposition of thin layers under vacuum - by ion bombardment of high melting point materials e.g. platinum

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7238212A FR2204709A1 (en) 1972-10-27 1972-10-27 Deposition of thin layers under vacuum - by ion bombardment of high melting point materials e.g. platinum

Publications (2)

Publication Number Publication Date
FR2204709A1 true FR2204709A1 (en) 1974-05-24
FR2204709B1 FR2204709B1 (enExample) 1975-03-28

Family

ID=9106337

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7238212A Granted FR2204709A1 (en) 1972-10-27 1972-10-27 Deposition of thin layers under vacuum - by ion bombardment of high melting point materials e.g. platinum

Country Status (1)

Country Link
FR (1) FR2204709A1 (enExample)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE875249C (de) * 1950-12-05 1953-04-30 Sueddeutsche Lab G M B H Bedampfungseinrichtung
FR1422539A (fr) * 1964-12-28 1965-12-24 Hermsdorf Keramik Veb Dispositif pour établir des couches minces sur un support par pulvérisation d'un jet d'ions

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE875249C (de) * 1950-12-05 1953-04-30 Sueddeutsche Lab G M B H Bedampfungseinrichtung
FR1422539A (fr) * 1964-12-28 1965-12-24 Hermsdorf Keramik Veb Dispositif pour établir des couches minces sur un support par pulvérisation d'un jet d'ions

Also Published As

Publication number Publication date
FR2204709B1 (enExample) 1975-03-28

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Legal Events

Date Code Title Description
ST Notification of lapse