FR2171877A1 - Semiconductor coating appts - giving improved uniformity of coating - Google Patents
Semiconductor coating appts - giving improved uniformity of coatingInfo
- Publication number
- FR2171877A1 FR2171877A1 FR7204819A FR7204819A FR2171877A1 FR 2171877 A1 FR2171877 A1 FR 2171877A1 FR 7204819 A FR7204819 A FR 7204819A FR 7204819 A FR7204819 A FR 7204819A FR 2171877 A1 FR2171877 A1 FR 2171877A1
- Authority
- FR
- France
- Prior art keywords
- appts
- coating
- improved uniformity
- gases
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7204819A FR2171877A1 (en) | 1972-02-14 | 1972-02-14 | Semiconductor coating appts - giving improved uniformity of coating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7204819A FR2171877A1 (en) | 1972-02-14 | 1972-02-14 | Semiconductor coating appts - giving improved uniformity of coating |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2171877A1 true FR2171877A1 (en) | 1973-09-28 |
FR2171877B1 FR2171877B1 (fr) | 1976-08-20 |
Family
ID=9093432
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7204819A Granted FR2171877A1 (en) | 1972-02-14 | 1972-02-14 | Semiconductor coating appts - giving improved uniformity of coating |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2171877A1 (fr) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0410706A2 (fr) * | 1989-07-26 | 1991-01-30 | Hitachi, Ltd. | Dispositif de traitement du plasma à basse température |
EP0447031A1 (fr) * | 1990-03-05 | 1991-09-18 | Board Of Governors Of Wayne State University | Suscepteur composite |
EP0451351A1 (fr) * | 1990-04-09 | 1991-10-16 | Leybold Aktiengesellschaft | Méthode pour chauffer directement un porte-substrat |
EP0664346A1 (fr) * | 1993-12-27 | 1995-07-26 | General Electric Company | Dispositif de dépôt de diamant par CVD |
WO1995023428A2 (fr) * | 1994-02-23 | 1995-08-31 | Applied Materials, Inc. | Chambre de depot chimique en phase vapeur |
US5695568A (en) * | 1993-04-05 | 1997-12-09 | Applied Materials, Inc. | Chemical vapor deposition chamber |
US6210483B1 (en) | 1997-12-02 | 2001-04-03 | Applied Materials, Inc. | Anti-notch thinning heater |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6709721B2 (en) | 2001-03-28 | 2004-03-23 | Applied Materials Inc. | Purge heater design and process development for the improvement of low k film properties |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3424628A (en) * | 1966-01-24 | 1969-01-28 | Western Electric Co | Methods and apparatus for treating semi-conductive materials with gases |
-
1972
- 1972-02-14 FR FR7204819A patent/FR2171877A1/fr active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3424628A (en) * | 1966-01-24 | 1969-01-28 | Western Electric Co | Methods and apparatus for treating semi-conductive materials with gases |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0410706A2 (fr) * | 1989-07-26 | 1991-01-30 | Hitachi, Ltd. | Dispositif de traitement du plasma à basse température |
EP0410706A3 (en) * | 1989-07-26 | 1991-04-17 | Hitachi, Ltd. | Low-temperature plasma processor |
EP0447031A1 (fr) * | 1990-03-05 | 1991-09-18 | Board Of Governors Of Wayne State University | Suscepteur composite |
EP0451351A1 (fr) * | 1990-04-09 | 1991-10-16 | Leybold Aktiengesellschaft | Méthode pour chauffer directement un porte-substrat |
US5695568A (en) * | 1993-04-05 | 1997-12-09 | Applied Materials, Inc. | Chemical vapor deposition chamber |
US5800686A (en) * | 1993-04-05 | 1998-09-01 | Applied Materials, Inc. | Chemical vapor deposition chamber with substrate edge protection |
US5856240A (en) * | 1993-04-05 | 1999-01-05 | Applied Materials, Inc. | Chemical vapor deposition of a thin film onto a substrate |
EP0664346A1 (fr) * | 1993-12-27 | 1995-07-26 | General Electric Company | Dispositif de dépôt de diamant par CVD |
WO1995023428A2 (fr) * | 1994-02-23 | 1995-08-31 | Applied Materials, Inc. | Chambre de depot chimique en phase vapeur |
WO1995023428A3 (fr) * | 1994-02-23 | 1995-11-23 | Applied Materials Inc | Chambre de depot chimique en phase vapeur |
US6210483B1 (en) | 1997-12-02 | 2001-04-03 | Applied Materials, Inc. | Anti-notch thinning heater |
Also Published As
Publication number | Publication date |
---|---|
FR2171877B1 (fr) | 1976-08-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |